Patent classifications
C07D321/06
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:
##STR00001##
wherein, in formula (I), R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a haloalkyl group, etc.; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, —CH.sub.2—, —O—, —S—, —CO—, —SO— or —SO.sub.2—; and AI.sup.− represents an organic anion.
Sulfonium compound, chemically amplified resist composition, and patterning process
A novel sulfonium compound of formula (A) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in lithography properties. ##STR00001##
Sulfonium compound, chemically amplified resist composition, and patterning process
A novel sulfonium compound of formula (A) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in lithography properties. ##STR00001##
NOVEL ACETALS OF 1-(3,3-DIMETHYLCYCLOHEX-1-ENYL) ETHANONE, METHOD FOR THE PRODUCTION THEREOF AND USE OF SAME IN PERFUMERY
The present invention concerns new fragrant compounds exhibiting animal or amber notes, without any woody aspect. More particularly, new acetal derivatives of 1-(3,3-dimethylcyclohex-1-enyl)ethanone are disclosed, which correspond to the following general formula I:
##STR00001##
as well as a method of synthesising said compounds, and their use in perfumery.
NOVEL ACETALS OF 1-(3,3-DIMETHYLCYCLOHEX-1-ENYL) ETHANONE, METHOD FOR THE PRODUCTION THEREOF AND USE OF SAME IN PERFUMERY
The present invention concerns new fragrant compounds exhibiting animal or amber notes, without any woody aspect. More particularly, new acetal derivatives of 1-(3,3-dimethylcyclohex-1-enyl)ethanone are disclosed, which correspond to the following general formula I:
##STR00001##
as well as a method of synthesising said compounds, and their use in perfumery.
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
A salt represented by formula (I), a generator and a resist composition:
##STR00001##
wherein R.sup.1 and R.sup.2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R.sup.4, R.sup.5, R.sup.7 and R.sup.8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH.sub.2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO.sub.2−; X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5; and AI.sup.− represents an organic anion.
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
A salt represented by formula (I), a generator and a resist composition:
##STR00001##
wherein R.sup.1 and R.sup.2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R.sup.4, R.sup.5, R.sup.7 and R.sup.8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH.sub.2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO.sub.2−; X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5; and AI.sup.− represents an organic anion.
ELECTROLYTIC SOLUTION FOR LITHIUM-ION SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTERY
A lithium-ion secondary battery includes a positive electrode, a negative electrode, and an electrolytic solution. The electrolytic solution includes a solvent, an electrolyte salt, and at least one of a first dioxane compound or a second dioxane compound.
ELECTROLYTIC SOLUTION FOR LITHIUM-ION SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTERY
A lithium-ion secondary battery includes a positive electrode, a negative electrode, and an electrolytic solution. The electrolytic solution includes a solvent, an electrolyte salt, and at least one of a first dioxane compound or a second dioxane compound.
Salt, acid generator, resist composition and method for producing resist pattern
A salt represented by formula (I), a generator and a resist composition: ##STR00001##
wherein R.sup.1 and R.sup.2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R.sup.4, R.sup.5, R.sup.7 and R.sup.8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH.sub.2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO.sub.2—; X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5; and AI.sup.− represents an organic anion.