Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:

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wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, *—O—R.sup.10, *—O-L.sup.10-CO—O—R.sup.10, etc.; L.sup.10 represents an alkanediyl group; R.sup.10 represents an acid-labile group; R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc.; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, —CH.sub.2—, etc.; and Al.sup.− represents an organic anion.

A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar.sup.1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R.sup.1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L.sup.1 represents a divalent linking group; R.sup.2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X.sup.+ represents a monovalent radiation-sensitive onium cation.

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A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar.sup.1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R.sup.1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L.sup.1 represents a divalent linking group; R.sup.2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X.sup.+ represents a monovalent radiation-sensitive onium cation.

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A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Na/K-ATPase ligands are provided that comprise a compound of formula (I) and are capable of binding to the α1 Na/K-ATPase and decreasing the endocytosis of α1 Na/K-ATPase, such that expression of the α1 Na/K-ATPase is restored in the plasma membrane of cells and tumor growth and invasion is reduced. Pharmaceutical compositions are further provided that include a compound of formula (I) and a pharmaceutically-acceptable vehicle, carrier, or excipient. Methods of treating a cancer are further included and comprise administering to a subject an effective amount of a Na/K-ATPase ligand.

Na/K-ATPase ligands are provided that comprise a compound of formula (I) and are capable of binding to the α1 Na/K-ATPase and decreasing the endocytosis of α1 Na/K-ATPase, such that expression of the α1 Na/K-ATPase is restored in the plasma membrane of cells and tumor growth and invasion is reduced. Pharmaceutical compositions are further provided that include a compound of formula (I) and a pharmaceutically-acceptable vehicle, carrier, or excipient. Methods of treating a cancer are further included and comprise administering to a subject an effective amount of a Na/K-ATPase ligand.

A salt represented by formula (I), a resin comprising a structural unit derived from the salt represented by formula (I), a resit composition comprising the salt represented by formula (I) or a resin comprising a structural unit derived from the salt represented by formula (I).

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A salt represented by formula (I), a resin comprising a structural unit derived from the salt represented by formula (I), a resit composition comprising the salt represented by formula (I) or a resin comprising a structural unit derived from the salt represented by formula (I).

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The application discloses an organic compound, an electronic element with the organic compound, and an electronic device including the electronic element. The organic compound of the present application has a fused heteroaromatic group containing fluorenyl or silylfluorenyl as its core structure, which presents a large planar structure in a three-dimensional (3D) space; and an electron-rich arylamine or heteroarylamine substituent is introduced at position 9 of the fluorenyl or silylfluorenyl to make the compound have excellent hole transport performance.