In an approach to improve the field of photoacid generators (PAGs) through a new photoacid generator, in particular to a photoacid generator comprising a new polycyclic aromatic photoacid generator compound anion, and a photoresist composition, comprising said photoacid generator. Embodiments the present invention relate to a method of generating an acid using said photoresist composition and a method of forming a patterned materials feature on a substrate.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

A bismuth compound which is little toxic, insoluble in a monomer, usable for optical purpose and used as a substitute for a lead compound, in which a phosphoric acid ester having a (meth)acrylic group(s) is bonded to bismuth, and a method of producing the bismuth compound by reacting bismuth (meth)acrylate or bismuth subsalicylate with a phosphoric acid ester having a (meth)acrylic group(s) and carrying out dehydration.

A bismuth compound which is little toxic, insoluble in a monomer, usable for optical purpose and used as a substitute for a lead compound, in which a phosphoric acid ester having a (meth)acrylic group(s) is bonded to bismuth, and a method of producing the bismuth compound by reacting bismuth (meth)acrylate or bismuth subsalicylate with a phosphoric acid ester having a (meth)acrylic group(s) and carrying out dehydration.

The present application provides a luminescent material, a method for manufacturing the luminescent material and a luminescent device, the method includes providing a first reactant and a second reactant, reacting the first reactant and the second reactant to generate a mixture containing the luminescent material, separating and purifying the mixture containing the luminescent material to obtain the luminescent material.

The present application provides a luminescent material, a method for manufacturing the luminescent material and a luminescent device, the method includes providing a first reactant and a second reactant, reacting the first reactant and the second reactant to generate a mixture containing the luminescent material, separating and purifying the mixture containing the luminescent material to obtain the luminescent material.

Organometallic photoresists suitable for use in deep ultraviolet (DUV) or extreme ultraviolet (EUV) lithography are provided. The organometallic photoresists contain an organometallic molecule having least a metal element M selected from the group consisting of Bi, Sb, and mixtures thereof, and having an oxidation state of 3+, and at least one polymerizable group R. A method of forming a patterned materials feature on a substrate utilizing the organometallic photoresist compositions is also provided.

Provided is a novel hexacoordinated organoantimony complex which emits blue light, and a blue light-emitting OLED comprising the same. The hexacoordinated organoantimony complex of the present invention has an intramolecular ligand so as to form an antimony-centered hexacoordinated structure, wherein carbons and antimony form one to three carbon-antimony bonds in the intramolecular ligand. The OLED of the present invention has a pair of electrodes and organic layers including a light-emitting layer between the pair of the electrodes. At least one of the organic layers, and preferably the light-emitting layer comprises the hexacoordinated organoantimony complex.

Provided is a novel hexacoordinated organoantimony complex which emits blue light, and a blue light-emitting OLED comprising the same. The hexacoordinated organoantimony complex of the present invention has an intramolecular ligand so as to form an antimony-centered hexacoordinated structure, wherein carbons and antimony form one to three carbon-antimony bonds in the intramolecular ligand. The OLED of the present invention has a pair of electrodes and organic layers including a light-emitting layer between the pair of the electrodes. At least one of the organic layers, and preferably the light-emitting layer comprises the hexacoordinated organoantimony complex.