Provided is a compound having one or more halogens and an unsaturated double bond. Provided is a method for producing an iodine-containing vinyl monomer comprising: a) a step of providing an iodine-containing alcohol substrate having a general structure represented by the formula (1-1):

##STR00001##

(the definitions of the variables in the formula (1-1) are as described in the specification); and b) a step of dehydrating the iodine-containing alcohol substrate to obtain the iodine-containing vinyl monomer having a general structure represented by the formula (1):

##STR00002##

(the definitions of the variables in the formula (1) are as described in the specification).

Provided is a compound having one or more halogens and an unsaturated double bond. Provided is a method for producing an iodine-containing vinyl monomer comprising: a) a step of providing an iodine-containing alcohol substrate having a general structure represented by the formula (1-1):

##STR00001##

(the definitions of the variables in the formula (1-1) are as described in the specification); and b) a step of dehydrating the iodine-containing alcohol substrate to obtain the iodine-containing vinyl monomer having a general structure represented by the formula (1):

##STR00002##

(the definitions of the variables in the formula (1) are as described in the specification).

[Problem] To provide a method for efficiently producing a poly(ethylene glycol)-b-poly(halomethylstyrene), a novel poly(ethylene glycol)-b-poly(halomethylstyrene) produced using the method, and a derivative thereof.

[Solution] The target novel copolymer can be provided by introducing a functional group, which enables reversible addition-fragmentation chain transfer (RAFT) polymerization, to the ω terminal of poly(ethylene glycol) and copolymerizing the resulting poly(ethylene glycol) with a halomethylstyrene.

Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained.

A compound represented by the following formula (1):

##STR00001##

wherein R.sup.A is a hydrogen atom, a methyl group, or a trifluoromethyl group; R.sup.X is OR.sup.B or a hydrogen atom; R.sup.B is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; and P is a hydroxy group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate ester group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphine group, a phosphone group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group.

Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained.

A compound represented by the following formula (1):

##STR00001##

wherein R.sup.A is a hydrogen atom, a methyl group, or a trifluoromethyl group; R.sup.X is OR.sup.B or a hydrogen atom; R.sup.B is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; and P is a hydroxy group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate ester group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphine group, a phosphone group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group.

A monomer having formula (A) is provided. R.sup.A is H, methyl or trifluoromethyl, X.sup.1 is a single bond, ether, ester or amide bond, R.sup.a is a C.sub.1-C.sub.20 monovalent hydrocarbon group, R.sup.b is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1n+m4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV. ##STR00001##

Crosslinkable random copolymers comprising atom transfer radical polymerization (ATRP) initiators and crosslinked copolymer films formed from the copolymers are provided. The random copolymers, which are polymerized from one or more alkyl halide functional inimers and one or more monomers having a crosslinkable functionality, are characterized by pendant ATRP initiating groups and pendant crosslinkable groups.

A monomer having formula (A) is provided. R.sup.A is H, methyl or trifluoromethyl, X.sup.1 is a single bond, ether, ester or amide bond, R.sup.a is a C.sub.1-C.sub.20 monovalent hydrocarbon group, R.sup.b is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1n+m4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV.

##STR00001##

A method for efficiently producing a poly(ethylene glycol)-b-poly(halomethylstyrene), a novel poly(ethylene glycol)-b-poly(halomethylstyrene) produced using the method, and a derivative thereof. The target novel copolymer can be provided by introducing a functional group, which enables reversible addition-fragmentation chain transfer (RAFT) polymerization, to the terminal of poly(ethylene glycol) and copolymerizing the resulting poly(ethylene glycol) with a halomethylstyrene.

A method for efficiently producing a poly(ethylene glycol)-b-poly(halomethylstyrene), a novel poly(ethylene glycol)-b-poly(halomethylstyrene) produced using the method, and a derivative thereof. The target novel copolymer can be provided by introducing a functional group, which enables reversible addition-fragmentation chain transfer (RAFT) polymerization, to the terminal of poly(ethylene glycol) and copolymerizing the resulting poly(ethylene glycol) with a halomethylstyrene.