Patent classifications
C08F12/30
REDOX ACTIVE MATERIALS, PROCESSES AND USES THEREOF
The present disclosure relates to redox active materials, such as the compound of formula (I), comprising at least one 2,5-dithio-7-azabicyclo(2.2.1)heptane unit connected to a surface thereof, as well as processes for making said redox active materials. The present disclosure relates to a method for recovering a metal, comprising reacting a metal in oxidized state with said redox active material. The present disclosure relates to uses of these redox active materials in sensors, electronic materials and for extracting metals.
ORGANICALLY MODIFIED CHALCOGENIDE POLYMERS
A polymer comprising one or more chalcogenide elements and one or more crosslinking moieties. The crosslinking moieties may be organic, inorganic, or both. Also disclosed is the related method for making a polymer comprising purifying a chalcogenide polymer powder comprising one or more chalcogenide elements, melting the purified chalcogenide polymer powder, adding one or more crosslinking moieties to the melted chalcogenide polymer, and curing the modified chalcogenide polymer at a temperature between 150 and 200° C.
Phosphonium-based zwitterionic monomers and polymers, and compositions and methods thereof
The invention provides novel zwitterionic monomers and polymers (including copolymers) with pendent phosphonium-based zwitterionic moieties, and compositions and products comprising same, as well as related methods and uses of the compositions, for example, as surfactants, coatings, and interlayer materials, biomedical materials or agents.
BINDER COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY, SLURRY COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY ELECTRODE, ELECTRODE FOR NON-AQUEOUS SECONDARY BATTERY, AND NON-AQUEOUS SECONDARY BATTERY
Provided is a binder composition that can result in high peel strength in an electrode and excellent cycle characteristics in a secondary battery. A binder composition for a non-aqueous secondary battery contains a water-soluble polymer (A) and a water-soluble polymer (B). The water-soluble polymer (A) is formed of one or more types of units selected from the group consisting of unsaturated carboxylic acid monomer units, unsaturated carboxylic acid amide monomer units, unsaturated carboxylic acid ester monomer units, hydroxyl group-containing vinyl monomer units, and vinyl alcohol structural units, and includes a predetermined amount of unsaturated carboxylic acid monomer units. The water-soluble polymer (B) is formed of one or more types of ethylenically unsaturated monomer units, and includes a predetermined amount of sulfo group-containing aromatic vinyl monomer units. The weight-average molecular weight of the water-soluble polymer (A) is 4 times or more the weight-average molecular weight of the water-soluble polymer (B).
PHOSPHONIUM-BASED ZWITTERIONIC MONOMERS AND POLYMERS, AND COMPOSITIONS AND METHODS THEREOF
The invention provides novel zwitterionic monomers and polymers (including copolymers) with pendent phosphonium-based zwitterionic moieties, and compositions and products comprising same, as well as related methods and uses of the compositions, for example, as surfactants, coatings, and interlayer materials, biomedical materials or agents.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.
Chalcogenide Hybrid Inorganic/organic Polymer (CHIP) materials as improved crosslinking agents for vulcanization
Methods of vulcanization using a high content sulfur polymer, instead of elemental sulfur, have been developed. These high sulfur content polymers are referred to as Chalcogenide Hybrid Inorganic/Organic Polymers (CHIP) materials and have good polymer compatibility in that they are soluble in a number of polymers. Furthermore, CHIP materials may have weaker bonds than the S—S bonds of elemental sulfur and thus provide for a higher crosslinking efficiency vulcanization.
FUNCTIONALIZED HIGHLY SYNDIOTACTIC POLYSTYRENE AND PREPARATION METHOD THEREOF
Compared to the prior art, this invention provides a functionalized highly syndiotactic polystyrene, comprising a repeating unit having a structure represented by formula (I), or comprising a repeating unit having a structure represented by formula (I) and a repeating unit having a structure represented by formula (II). It is indicated by the experimental results that the syndiotacticity selectivity of the highly syndiotactic polymer provided by this invention is no less than 90%, and the proportion of the repeating unit having a structure represented by formula (I) in the polymer may be arbitrarily adjusted and may be up to 100%. Meanwhile, the oxygen- or sulfur-containing groups in the polymer may increase the polarity of the highly syndiotactic polystyrene so as to increase the blendability of the highly syndiotactic polystyrene with other polymers.
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Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates
There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).
Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates
There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).