In an embodiment, the present disclosure pertains to a method of changing the glass transition temperature of a polymer. In some embodiments, the polymer includes at least one hydrazone-containing compound. In general, the methods of the present disclosure include one or more of the following steps of: (1) applying light to the polymer; and (2) thereby changing the glass transition temperature of the polymer. In another embodiment, the present disclosure pertains to a polymer having a light-adjustable glass transition temperature. In some embodiments, the polymer includes at least one hydrazone-containing compound.

Provided is a cured product of a resin composition including a (meth)acrylate compound and a compound having at least one thiol group, wherein the content of the compound having at least one thiol group in the cured product is 30 mass % or less, and wherein the cured product has a secondary dispersion characteristic of 0.65 or more.

In an embodiment, the present disclosure pertains to a method of changing the glass transition temperature of a polymer. In some embodiments, the polymer includes at least one hydrazone-containing compound. In general, the methods of the present disclosure include one or more of the following steps of: (1) applying light to the polymer; and (2) thereby changing the glass transition temperature of the polymer. In another embodiment, the present disclosure pertains to a polymer having a light-adjustable glass transition temperature. In some embodiments, the polymer includes at least one hydrazone-containing compound.

A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise at least one acrylate monomer including at least one cyano group (CN-acrylate monomer). The presence of a low amount of the CN-acrylate monomer between 10 wt % and not greater than 30 wt % can lower the contact angle of the composition and may improve the etch resistance of a photo-cured layer made from the photocurable composition.

A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise at least one acrylate monomer including at least one cyano group (CN-acrylate monomer). The presence of a low amount of the CN-acrylate monomer between 10 wt % and not greater than 30 wt % can lower the contact angle of the composition and may improve the etch resistance of a photo-cured layer made from the photocurable composition.

The present disclosure relates to an antibacterial polymer composition, and more particularly, to an antibacterial polymer composition that enables the preparation of a coating layer exhibiting excellent antibacterial properties.

The present disclosure relates to an antibacterial polymer composition, and more particularly, to an antibacterial polymer composition that enables the preparation of a coating layer exhibiting excellent antibacterial properties.

The present invention relates to a water-soluble polymer obtained by polymerization of at least a 2-dimethylaminoethyl acrylate monomer and/or its salts, in presence of at least a tocopherol and/or its derivatives, or a tocotrienol and/or its derivatives, and its uses.

The present invention relates to a water-soluble polymer obtained by polymerization of at least a 2-dimethylaminoethyl acrylate monomer and/or its salts, in presence of at least a tocopherol and/or its derivatives, or a tocotrienol and/or its derivatives, and its uses.

Described herein is a latex coating composition comprising particles of of the polymer are of formula I, wherein R.sup.3 is H or CH.sub.3, L is an alkylene group comprising 1-4 carbon atoms, R.sup.1 and R.sup.2 are independently selected from an alkyl group comprising 1 to 3 carbon atoms, n is an integer from 11 to 21, and A is a counter anion.

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