Patent classifications
C08F20/10
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.
METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPPER LAYER FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
A method for producing a composition for forming a non-photosensitive upper layer film that is disposed on a workpiece and a photosensitive resist film, the production method includes cleaning a production device for a composition X.sub.A for forming a non-photosensitive upper layer film with a cleaning liquid to clean the production device until a concentration of a resin included in the cleaning liquid reaches 10 ppm by mass or less, discharging the cleaning liquid from the production device, and producing the composition X.sub.A for forming a non-photosensitive upper layer film using the production device. The cleaning, the discharging, and the producing are performed in this order.
CURABLE RESIN COMPOSITION, CURED PRODUCT, DIFFRACTIVE OPTICAL ELEMENT, AND MULTILAYER DIFFRACTIVE OPTICAL ELEMENT
Provided are a curable resin composition including a near-ultraviolet light-absorbing organic compound, indium tin oxide particles, and a polymer having a constitutional unit represented by General Formula (P) and having an acidic group at one terminal, in which the near-ultraviolet light-absorbing organic compound is a compound that has a maximal value at 300 to 400 nm in an absorption spectrum in a wavelength region of 300 to 800 nm and does not substantially absorb light at a wavelength of 410 to 800 nm; a cured product formed of the curable resin composition; a diffractive optical element; and a multilayer diffractive optical element.
##STR00001##
Ar.sup.P represents an aryl group and L.sup.P and R.sup.P1 represent a specific group.
CARBON MATERIAL DISPERSION
The present invention provides a carbon material dispersion in which a carbon material is contained at a high concentration in a liquid medium containing an organic solvent but is unlikely to reaggregate and is stably dispersed, and from which various products, such as an ink capable of forming a coating film having excellent electric conductivity, can be formed. This carbon material dispersion contains a carbon material, an organic solvent, and a polymeric dispersant, wherein the polymeric dispersant is a polymer having 3 to 55% by mass of a constituent unit (1) represented by the following formula (1), wherein R represents a hydrogen atom or the like, A represents O or NH, B represents an ethylene group or the like, R.sub.1 and R.sub.2 each independently represent a methyl group or the like, Ar represents a phenyl group or the like, X represents a chlorine atom or the like, and p represents an arbitrary number of repeating units, and the polymeric dispersant has an amine value of 100 mgKOH/g or less and a number average molecular weight of 5,000 to 20,000.
##STR00001##
PHOTORADICAL POLYMERIZABLE COMPOSITION
A photoradical polymerization initiator that is environmentally friendly and composed solely of carbon, hydrogen and oxygen atoms, generating no acid that may cause corrosion during a radical polymerization reaction, and having a high radical polymerization initiation capacity to light having a wavelength of 350 nm to 420 nm. A photoradical polymerizable composition including a radical polymerizable compound and a photoradical polymerization initiator, where the photoradical polymerization initiator is a 1,4-dihydroxy-2-naphthoic acid compound represented by formula (1):
##STR00001##
where R is a hydrogen atom, a C.sub.1-10 alkyl group or a C.sub.6-14 aryl group, and X is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.6-14 aryl group, a hydroxy group, a C.sub.1-10 alkoxy group or a C.sub.6-14 aryloxy group.
PHOTORADICAL POLYMERIZABLE COMPOSITION
A photoradical polymerization initiator that is environmentally friendly and composed solely of carbon, hydrogen and oxygen atoms, generating no acid that may cause corrosion during a radical polymerization reaction, and having a high radical polymerization initiation capacity to light having a wavelength of 350 nm to 420 nm. A photoradical polymerizable composition including a radical polymerizable compound and a photoradical polymerization initiator, where the photoradical polymerization initiator is a 1,4-dihydroxy-2-naphthoic acid compound represented by formula (1):
##STR00001##
where R is a hydrogen atom, a C.sub.1-10 alkyl group or a C.sub.6-14 aryl group, and X is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.6-14 aryl group, a hydroxy group, a C.sub.1-10 alkoxy group or a C.sub.6-14 aryloxy group.
Radiation curable composition for additive manufacturing processes
The invention relates to a radiation curable composition for additive-manufacturing processes, the composition comprising (meth)acrylate component(s) not comprising an urethane moiety having a molecular weight Mw of at least 1,000 as Component A1, photo initiator as Component B, red, yellow or orange dye or combination thereof as Component C, blue dye having a light absorption band in the range of 350 to 420 nm as Component D, and optionally stabilizer as Component E. The invention further relates to a process of producing an elastomeric 3-dim article from the radiation curable composition in an additive-manufacturing process and the obtained elastomeric 3-dim article.
Photopolymerisable composition, material obtained by polymerising such a composition and 3D printing method using such a composition
A photopolymerizable composition comprises at least a polymerizable resin, a photosensitizer, an annihilator, and a photoinitiator. The photosensitizer is formulated to absorb an excitation light signal received in a first range of wavelengths. The annihilator is formulated to emit a light signal in a second range of wavelengths different from the first. During the absorption of light by the photosensitizer in the first range of wavelengths, the annihilator emits a light signal in the second range, a photon energy of the emitted light signal being greater than a photon energy of the light signal received by the photosensitizer. The annihilator is also formulated to implement an energy transfer mechanism to excite the photoinitiator for polymerization of the resin. The excited photoinitiator is formulated to generate at least one polymerizable initiator to cause the polymerization reaction. Related methods, such as three-dimensional printing methods, and materials are also disclosed.
Functional monomer comprising rare earth/metal compound, preparation method thereof, and method of using the same
A composition of matter including a mother solution; an organic ester; an additive agent and deionized water. The mother solution includes a rare earth compound or a metal compound, an organic acid, an organic amine, and deionized water. Also provided is a method of preparing the composition of matter. The method includes: 1) heating deionized water to a temperature of 50-60° C.; adding an organic acid to the deionized water, allowing to dissolve, followed by addition of a rare earth compound or a metal compound, 2-4 hours later, adding an organic amine, heating to a temperature of 70-80° C. and holding; cooling and filtering to yield a mother solution; 2) mixing the mother solution, deionized water, and a catalyst; vacuumizing a resulting mixture, heating the mixture to a temperature of 95-125° C. and holding, following by addition of a polymerization inhibitor and an organic ester; 2-4 hours later, cooling, standing, separating.
SURFACE MODIFICATION SHEET FOR SILICONE RUBBER
A surface modification sheet (X) of the present invention includes a release sheet (10) and a surface modification layer (20) thereon. The surface modification layer (20) contains a polymer having a side chain containing an ethylenic double bond. The side chain of the polymer preferably includes a unit derived from an isocyanate compound containing the ethylenic double bond.