It is an object of the present invention to provide a method of forming a high-contrast fine pattern onto a resist film. The present invention relates to a pattern forming method, comprising; applying a resist material onto a substrate to form a resist film, introducing a metal into the resist film, exposing, and developing. In addition, the present invention also relates to a resist material and a pattern forming apparatus.

The invention relates to a fatty acid diamide-based rheology additive composition, which is pre-activated and pre-concentrated in fatty acid diamide, comprising: a) from 5% to 30% by weight of at least one fatty acid diamide based on 12 hydroxystearic acid and on a linear, in particular C5, C6 or C7, aliphatic diamine, b) from 70% to 95% by weight of at least one monofunctional (meth)acrylic reactive diluent comprising a cycloaliphatic group or several cycloaliphatic groups, the % being expressed relative to a)+b). It also relates to a process for preparing the composition and to the use thereof as a rheology additive in reactive binder compositions such as coating, moulding, composite material, anchor bolt or sealant compositions or photocrosslinkable compositions for stereolithography or for 3D printing of objects by inkjet.

The invention relates to a fatty acid diamide-based rheology additive composition, which is pre-activated and pre-concentrated in fatty acid diamide, comprising: a) from 5% to 30% by weight of at least one fatty acid diamide based on 12 hydroxystearic acid and on a linear, in particular C5, C6 or C7, aliphatic diamine, b) from 70% to 95% by weight of at least one monofunctional (meth)acrylic reactive diluent comprising a cycloaliphatic group or several cycloaliphatic groups, the % being expressed relative to a)+b). It also relates to a process for preparing the composition and to the use thereof as a rheology additive in reactive binder compositions such as coating, moulding, composite material, anchor bolt or sealant compositions or photocrosslinkable compositions for stereolithography or for 3D printing of objects by inkjet.

A method for forming photoresist patterns and a semiconductor device on which a photoresist pattern manufactured according to the method is formed are disclosed. The method includes forming a preliminary photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer, the acrylic polymer including a structural unit containing a hydroxy group and a fluorine, and an acid compound on the preliminary photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an acetate-based compound on the substrate coated with the topcoat to remove the topcoat.

A method for forming photoresist patterns and a semiconductor device on which a photoresist pattern manufactured according to the method is formed are disclosed. The method includes forming a preliminary photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer, the acrylic polymer including a structural unit containing a hydroxy group and a fluorine, and an acid compound on the preliminary photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an acetate-based compound on the substrate coated with the topcoat to remove the topcoat.

An apparatus and methods for using coatings for metal applications are disclosed. According to one embodiment, an article comprises a cured polymeric film having a first reaction product of a cationic photoinitiator and a compound suitable for cationic polymerization. The article has a second reaction product of a free-radical photoinitiator and a compound suitable for free-radical polymerization; The article has a metal substrate, wherein the cured polymeric film coats the metal substrate.

An apparatus and methods for using coatings for metal applications are disclosed. According to one embodiment, an article comprises a cured polymeric film having a first reaction product of a cationic photoinitiator and a compound suitable for cationic polymerization. The article has a second reaction product of a free-radical photoinitiator and a compound suitable for free-radical polymerization; The article has a metal substrate, wherein the cured polymeric film coats the metal substrate.

Provided is a thermosetting resin composition, from which a cured product having excellent transparency with less yellowing than that in the related art can be obtained, and which is advantageous in cost because a monomer obtained by using an inexpensive raw material is used. An ester compound contains, in one molecule, at least one functional group represented by the following general formula (1) or (2).

##STR00001##

(In both the general formulae (1) and (2), R.sub.1 is an alkyl group having 50 or less carbon atoms.

R.sub.2 is an alkylene group having 50 or less carbon atoms that may contain an oxygen atom and a nitrogen atom as a portion thereof.)

Provided is a thermosetting resin composition, from which a cured product having excellent transparency with less yellowing than that in the related art can be obtained, and which is advantageous in cost because a monomer obtained by using an inexpensive raw material is used. An ester compound contains, in one molecule, at least one functional group represented by the following general formula (1) or (2).

##STR00001##

(In both the general formulae (1) and (2), R.sub.1 is an alkyl group having 50 or less carbon atoms.

R.sub.2 is an alkylene group having 50 or less carbon atoms that may contain an oxygen atom and a nitrogen atom as a portion thereof.)

A method for generating reactive species in a medium in which light irradiates the medium including a nanoparticle. A photoinitiator composed of semiconductor nanoparticles for photo-polymerization and 2D and 3D printing.