A self-healing polymer network containing a physical crosslinking agent, a composition therefor, and an optical element comprising the same is provided. The self-healing polymer network comprises a polymer derived from monomers including self-healing monomers each having a first polymerizable functional group and at least one of urethane, urea, or amide group chemically linked to the first polymerizable functional group, wherein the polymer has a backbone formed by polymerizing the first polymerizable functional groups of the self-healing monomers and a plurality of side groups each having at least one of urethane, urea, or amide group chemically linked to the backbone. In addition, the self-healing polymer network comprises a physical crosslinking agent which is an alcohol mixture having at least two of monool, diol, triol, and tetraol or the higher polyol and crosslinking the polymer by physically crosslinking the urethane, urea, or amide group of the side groups.

A self-healing polymer network containing a physical crosslinking agent, a composition therefor, and an optical element comprising the same is provided. The self-healing polymer network comprises a polymer derived from monomers including self-healing monomers each having a first polymerizable functional group and at least one of urethane, urea, or amide group chemically linked to the first polymerizable functional group, wherein the polymer has a backbone formed by polymerizing the first polymerizable functional groups of the self-healing monomers and a plurality of side groups each having at least one of urethane, urea, or amide group chemically linked to the backbone. In addition, the self-healing polymer network comprises a physical crosslinking agent which is an alcohol mixture having at least two of monool, diol, triol, and tetraol or the higher polyol and crosslinking the polymer by physically crosslinking the urethane, urea, or amide group of the side groups.

In one aspect, urethane waxes are described herein comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. In some embodiments, the urethane waxes are combined with other components to provide support materials for use in three-dimensional printing applications. A support material ink, for example, comprises a urethane wax comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. The support material ink, in some embodiments, further comprises monomeric curable material, oligomeric curable material, or mixtures thereof.

In one aspect, urethane waxes are described herein comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. In some embodiments, the urethane waxes are combined with other components to provide support materials for use in three-dimensional printing applications. A support material ink, for example, comprises a urethane wax comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. The support material ink, in some embodiments, further comprises monomeric curable material, oligomeric curable material, or mixtures thereof.

A polymerization reactor for production of a super absorbent polymer according to the present disclosure includes: a composition supply part for supplying a monomer composition solution; a central pipe connected to the composition supply part; a composition distribution part including a water storage tank located at a discharge port of the central pipe; a distribution pipe connected to the water storage tank; and an ultrasonic device installed inside the water storage tank, a conveyor belt located under the composition distribution part and on which the composition solution is dropped, and an energy supply part for supplying polymerization energy to the composition solution on the conveyor belt, wherein the ultrasonic device supplies bubbles to the composition solution flowing into the water storage tank.

The invention relates to a photo-curable liquid resin composition for 3D printing, its preparation process and use, and also to a method of forming a 3D-printed object by using the composition. By using the inventive composition for 3D printing, the improvement of the flexibility and elasticity of the cured composition can be achieved.

The invention relates to a photo-curable liquid resin composition for 3D printing, its preparation process and use, and also to a method of forming a 3D-printed object by using the composition. By using the inventive composition for 3D printing, the improvement of the flexibility and elasticity of the cured composition can be achieved.

An aqueous ink composition includes an aqueous medium and resin microparticles formed from a resin, in which the resin has a structural unit represented by General Formula (1) or (2), and the content of the resin microparticles is 1% to 15% by mass,

##STR00001## R.sup.1, R.sup.2, and R.sup.3 each represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; A.sup.1 represents —O— or —NR.sup.3—; L.sup.1 represents an alkylene group having 6 to 22 carbon atoms; M.sup.1 and M.sup.2 each represent a hydrogen atom, an alkali metal ion, or an ammonium ion; A.sup.2 represents a single bond, —COO—, or —CONH—; and L.sup.2 represents a divalent linking group having 6 to 23 carbon atoms.

There is provided a composition that a resist pattern having a reduced LWR representing variations in line width of the resist pattern, compared to conventional resist patterns, can be formed. A resist underlayer film-forming composition for lithography comprising a polymer, 0.1 to 30 parts by mass of a compound having an amino group protected with a tert-butoxycarbonyl group and an unprotected carboxyl group, or a hydrate of the compound, relative to 100 parts by mass of the polymer, and a solvent.

There is provided a composition that a resist pattern having a reduced LWR representing variations in line width of the resist pattern, compared to conventional resist patterns, can be formed. A resist underlayer film-forming composition for lithography comprising a polymer, 0.1 to 30 parts by mass of a compound having an amino group protected with a tert-butoxycarbonyl group and an unprotected carboxyl group, or a hydrate of the compound, relative to 100 parts by mass of the polymer, and a solvent.