C08F212/06

COMPOSITION FOR FORMING EASY-TO-DETACH THIN RESIN FILM, AND EASY-TO-DETACH THIN RESIN FILM
20180010015 · 2018-01-11 · ·

The invention provides a composition for forming an easy-to-detach thin resin film, the composition being characterized by including a urethane (meth)acrylate compound, and a first polymerizable composition containing an ethylenic unsaturated monomer having a tert-butoxy group and a radical polymerization initiator, or a polymer of a second polymerizable composition containing the ethylenic unsaturated monomer having a tert-butoxy group, wherein the amount of the ethylenic unsaturated monomer having a tert-butoxy group is 5 mass % or more and less than 95 mass % with respect to the sum of the amount of the urethane (meth)acrylate compound and the total amount of the monomer(s) contained in the first polymerizable composition or the second polymerizable composition.

COMPOSITION FOR FORMING EASY-TO-DETACH THIN RESIN FILM, AND EASY-TO-DETACH THIN RESIN FILM
20180010015 · 2018-01-11 · ·

The invention provides a composition for forming an easy-to-detach thin resin film, the composition being characterized by including a urethane (meth)acrylate compound, and a first polymerizable composition containing an ethylenic unsaturated monomer having a tert-butoxy group and a radical polymerization initiator, or a polymer of a second polymerizable composition containing the ethylenic unsaturated monomer having a tert-butoxy group, wherein the amount of the ethylenic unsaturated monomer having a tert-butoxy group is 5 mass % or more and less than 95 mass % with respect to the sum of the amount of the urethane (meth)acrylate compound and the total amount of the monomer(s) contained in the first polymerizable composition or the second polymerizable composition.

Block copolymers and uses thereof

A polymer composition comprising a star-branched copolymer having a plurality of arms is disclosed. Each polymer arm has a molecular weight Mp of from 1 kg/mol to 50 kg/mol and comprises polymerized units (i) derived from a first vinyl aromatic monomer comprising a radical-reactive group, wherein from greater than 10 mol % to 100 mol % of the units (i) are unhydrogenated; and optionally, polymerized units (ii) comprising hydrogenated and unhydrogenated forms of polymerized units derived from a high Tg monomer, and hydrogenated form of polymerized units (i) or hydrogenated form of polymerized styrene units; and optionally, polymerized units (iii) comprising (a) hydrogenated form of polymerized units derived from one or more acyclic conjugated dienes, and (b) polymerized units derived from one or more of a second vinyl aromatic monomer; wherein less than 10 wt. % of units (a) are unhydrogenated.

Block copolymers and uses thereof

A polymer composition comprising a star-branched copolymer having a plurality of arms is disclosed. Each polymer arm has a molecular weight Mp of from 1 kg/mol to 50 kg/mol and comprises polymerized units (i) derived from a first vinyl aromatic monomer comprising a radical-reactive group, wherein from greater than 10 mol % to 100 mol % of the units (i) are unhydrogenated; and optionally, polymerized units (ii) comprising hydrogenated and unhydrogenated forms of polymerized units derived from a high Tg monomer, and hydrogenated form of polymerized units (i) or hydrogenated form of polymerized styrene units; and optionally, polymerized units (iii) comprising (a) hydrogenated form of polymerized units derived from one or more acyclic conjugated dienes, and (b) polymerized units derived from one or more of a second vinyl aromatic monomer; wherein less than 10 wt. % of units (a) are unhydrogenated.

Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process

A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process

A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

Production method for polar olefin polymer and copolymer

An object of the present invention is to provide a novel method of producing a nonpolar olefin polymer (e.g., a copolymer of a nonpolar olefin and a polar olefin). The present invention provides a method of producing a polar olefin polymer or copolymer, the method including the polymerization step of polymerizing a polar olefin monomer using, as a catalyst, a polymerization catalyst composition containing: 1) a metallocene complex represented by Formula (I), which contains a central metal M that is scandium (Sc) or yttrium (Y), a ligand Cp* containing a cyclopentadienyl derivative and being bound to the central metal, monoanionic ligands Q.sup.1 and Q.sup.2, and W neutral Lewis bases L wherein W is an integer of 0 to 3; and 2) an ionic compound composed of a non-coordinating anion and a cation. ##STR00001## ##STR00002##

Production method for polar olefin polymer and copolymer

An object of the present invention is to provide a novel method of producing a nonpolar olefin polymer (e.g., a copolymer of a nonpolar olefin and a polar olefin). The present invention provides a method of producing a polar olefin polymer or copolymer, the method including the polymerization step of polymerizing a polar olefin monomer using, as a catalyst, a polymerization catalyst composition containing: 1) a metallocene complex represented by Formula (I), which contains a central metal M that is scandium (Sc) or yttrium (Y), a ligand Cp* containing a cyclopentadienyl derivative and being bound to the central metal, monoanionic ligands Q.sup.1 and Q.sup.2, and W neutral Lewis bases L wherein W is an integer of 0 to 3; and 2) an ionic compound composed of a non-coordinating anion and a cation. ##STR00001## ##STR00002##

Hydrocarbon Resin and Process for Production Thereof

Presented and described is a hydrocarbon resin obtainable by thermal polymerization of a cyclic diolefin component including a cyclic diolefin compound with an aromatic component including indene and/or C.sub.1-4-alkylindene, with the hydrocarbon resin having a polydispersity index (PDI) of 1 to less than 2.3. Further described is a production process for the hydrocarbon resin, wherein a monomer mixture which includes an aromatic component including indene and/or C.sub.1-4-alkylindene and a cyclic diolefin component including a cyclic diolefin compound is polymerized by heating to a polymerization temperature of at least 180° C. to give a product stream including hydrocarbon resin, and oligomers which include units originating from the cyclic diolefin compound and/or units originating from the aromatic component are separated from the product stream and returned to the monomer mixture. Lastly described are a hydrogenated hydrocarbon resin, a process for production thereof, and the use of the hydrocarbon resin and of the hydrogenated hydrocarbon resin.

Hydrocarbon Resin and Process for Production Thereof

Presented and described is a hydrocarbon resin obtainable by thermal polymerization of a cyclic diolefin component including a cyclic diolefin compound with an aromatic component including indene and/or C.sub.1-4-alkylindene, with the hydrocarbon resin having a polydispersity index (PDI) of 1 to less than 2.3. Further described is a production process for the hydrocarbon resin, wherein a monomer mixture which includes an aromatic component including indene and/or C.sub.1-4-alkylindene and a cyclic diolefin component including a cyclic diolefin compound is polymerized by heating to a polymerization temperature of at least 180° C. to give a product stream including hydrocarbon resin, and oligomers which include units originating from the cyclic diolefin compound and/or units originating from the aromatic component are separated from the product stream and returned to the monomer mixture. Lastly described are a hydrogenated hydrocarbon resin, a process for production thereof, and the use of the hydrocarbon resin and of the hydrogenated hydrocarbon resin.