Patent classifications
C08F212/14
Photoresist composition and method of forming photoresist pattern
Method of forming pattern in photoresist layer includes forming photoresist layer over substrate, selectively exposing photoresist layer to actinic radiation forming latent pattern. Latent pattern is developed by applying developer to form pattern. Photoresist layer includes photoresist composition including polymer: ##STR00001##
A.sub.1, A.sub.2, L are direct bond, C4-C30 aromatic, C4-C30 alkyl, C4-C30 cycloalkyl, C4-C30 hydroxylalkyl, C4-C30 alkoxy, C4-C30 alkoxyl alkyl, C4-C30 acetyl, C4-C30 acetylalkyl, C4-C30 alkyl carboxyl, C4-C30 cycloalkyl carboxyl, C4-C30 hydrocarbon ring, C4-C30 heterocyclic, —COO—, A1 and A2 are not both direct bonds, and are unsubstituted or substituted with a halogen, carbonyl, or hydroxyl; A.sub.3 is C6-C14 aromatic, wherein A.sub.3 is unsubstituted or substituted with halogen, carbonyl, or hydroxyl; R.sub.1 is acid labile group; Ra, Rb are H or C1-C3 alkyl; R.sub.f is direct bond or C1-C5 fluorocarbon; PAG is photoacid generator; 0≤x/(x+y+z)≤1, 0≤y/(x+y+z)≤1, and 0≤z/(x+y+z)≤1.
STYRENE DERIVATIVE AND PREPARATION METHOD THEREOF, AND MODIFIED ORGANIC SILICONE RESIN AND PREPARATION METHOD AND USE THEREOF
The present disclosure provides a styrene derivative and a preparation method thereof, and a modified organic silicone resin and a preparation method and use thereof, and belongs to the technical field of back coating solutions. The styrene derivative is specifically 2,3-difluoro-4-methoxystyrene. A fluorine atom is introduced into a benzene ring structure, and the obtained styrene derivative contains a C—F bond with a relatively high chemical bond energy, such that the styrene derivative has a relatively high thermal stability. The styrene derivative can be introduced into an organic silicone resin to make the obtained modified organic silicone resin have a higher thermal stability. The modified organic silicone resin can be used as a back coating solution to effectively improve a heat resistance of barcode thermal transfer ribbons.
Coating composition, organic light-emitting diode using same, and method for preparing same
A coating composition, an organic light emitting device using the same, and a method for manufacturing the same are disclosed herein. In some embodiments, a coating composition including a compound represented by Formula 1 and a compound represented by Formula 2. In some embodiments, an organic light emitting device includes a first electrode, a second electrode, and an organic material layer having one or more layers provided between the first electrode and the second electrode, wherein the one or more layers comprise the coating composition or a cured product thereof.
Coating composition, organic light-emitting diode using same, and method for preparing same
A coating composition, an organic light emitting device using the same, and a method for manufacturing the same are disclosed herein. In some embodiments, a coating composition including a compound represented by Formula 1 and a compound represented by Formula 2. In some embodiments, an organic light emitting device includes a first electrode, a second electrode, and an organic material layer having one or more layers provided between the first electrode and the second electrode, wherein the one or more layers comprise the coating composition or a cured product thereof.
Cationomeric polyolefin compositions and methods for production and use thereof
Although polyolefin elastomers are widely employed commodity polymers, there are shortcomings of this class of polymers for certain applications. For example, the rheological properties of some polyolefin elastomers may be insufficient to provide the green strength or low shear viscosity necessary to form stable foams, or to provide sufficient viscosity modification effects when present in a solvent. Cationomeric modification of polyolefin elastomers may alleviate these difficulties. Such polyolefin elastomers may feature a random cationomeric polyolefin copolymer comprising at least a first monomer and a second monomer, in which the first monomer is a neutral monomer and the second monomer has a side chain bearing a cationic moiety. The polyolefin elastomers may be present in foamed polyolefin compositions comprising a gas component and/or in liquid compositions comprising a solvent in which the polyolefin elastomer is dissolved.
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process
A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##
AQUEOUS COATING COMPOSITION AND PROCESS FOR PREPARING THE SAME
A storage stable aqueous coating composition comprising a novel combination of an anionic acrylic polymer with a small amount of a specific acetoacetamide functional compound and providing coating films made therefrom with formaldehyde abatement property, yellowing resistance, and scrub resistance.
AQUEOUS COATING COMPOSITION AND PROCESS FOR PREPARING THE SAME
A storage stable aqueous coating composition comprising a novel combination of an anionic acrylic polymer with a small amount of a specific acetoacetamide functional compound and providing coating films made therefrom with formaldehyde abatement property, yellowing resistance, and scrub resistance.
Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process
A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.
Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process
A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.