A storage stable aqueous coating composition comprising a novel combination of an anionic acrylic polymer with a small amount of a specific acetoacetamide functional compound and providing coating films made therefrom with formaldehyde abatement property, yellowing resistance, and scrub resistance.

Polymer fine particles having a number average particle diameter of 50 to 450 nm and a CV value of particle diameter on a number basis of 5% or less, or polymer fine particles having a structural color development property when arranged. An acid value of the polymer fine particles is 5 to 38 mg KOH/g. An emulsion in which the polymer fine particles are dispersed in a medium mainly containing water. In addition, a structure in which the polymer fine particles are arranged and develop color.

Polymer fine particles having a number average particle diameter of 50 to 450 nm and a CV value of particle diameter on a number basis of 5% or less, or polymer fine particles having a structural color development property when arranged. An acid value of the polymer fine particles is 5 to 38 mg KOH/g. An emulsion in which the polymer fine particles are dispersed in a medium mainly containing water. In addition, a structure in which the polymer fine particles are arranged and develop color.

The object of the invention is to provide a novel olefin-based molded product useful for various applications. An olefin-based molded product comprising a polymer including a structural unit of at least one polar olefin monomer represented by the general formula (I) CH.sub.2═CH—R.sup.2—Z(R.sup.1).sub.n is provided. In the formula, Z is a hetero atom selected from the group consisting of nitrogen, oxygen, phosphorus, sulfur, and selenium; R.sup.1 is a substituted or unsubstituted hydrocarbyl group having 1 to 30 carbon atoms; n is an integer of 1 or 2 depending on the atomic species of Z; and R.sup.2 is a substituted or unsubstituted hydrocarbylene group having 2 to 20 carbon atoms.

A photoresist underlayer composition, comprising: a first polymer comprising a crosslinkable group; a second polymer comprising: a first repeating unit comprising a repeating unit comprising a photoacid generator, and a second repeating unit comprising a hydroxy-substituted C.sub.1-30 alkyl group, a hydroxy-substituted C.sub.3-30 cycloalkyl group, or a hydroxy-substituted C.sub.6-30 aryl group; an acid catalyst; and a solvent.

A photoresist underlayer composition, comprising: a first polymer comprising a crosslinkable group; a second polymer comprising: a first repeating unit comprising a repeating unit comprising a photoacid generator, and a second repeating unit comprising a hydroxy-substituted C.sub.1-30 alkyl group, a hydroxy-substituted C.sub.3-30 cycloalkyl group, or a hydroxy-substituted C.sub.6-30 aryl group; an acid catalyst; and a solvent.

Methods for forming latexes are provided. In embodiments, such a method comprises adding a first portion of a monomer emulsion comprising water, a monomer, an acidic monomer, a multifunctional monomer, and a first reactive surfactant to a reactive surfactant solution comprising water and a second reactive surfactant to form a reaction mixture, wherein the reactive surfactant solution does not comprise monomers other than the second reactive surfactant; adding a first portion of an initiator solution to the reaction mixture so that monomers undergo polymerization reactions to form resin seeds in the reaction mixture; adding a second portion of the monomer emulsion to the reaction mixture comprising the resin seeds; and adding a second portion of the initiator solution to the reaction mixture to form a latex comprising resin particles.

Methods for forming latexes are provided. In embodiments, such a method comprises adding a first portion of a monomer emulsion comprising water, a monomer, an acidic monomer, a multifunctional monomer, and a first reactive surfactant to a reactive surfactant solution comprising water and a second reactive surfactant to form a reaction mixture, wherein the reactive surfactant solution does not comprise monomers other than the second reactive surfactant; adding a first portion of an initiator solution to the reaction mixture so that monomers undergo polymerization reactions to form resin seeds in the reaction mixture; adding a second portion of the monomer emulsion to the reaction mixture comprising the resin seeds; and adding a second portion of the initiator solution to the reaction mixture to form a latex comprising resin particles.

A method for producing a resin having a repeating unit that is decomposed by irradiation of an actinic ray or a radiation to generate acid, the method including polymerizing a specific compound represented by General formula (P-1) and a copolymerizable monomer compound, a method for producing an actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a resin corresponding to a reaction intermediate of the resin.

A method for producing a resin having a repeating unit that is decomposed by irradiation of an actinic ray or a radiation to generate acid, the method including polymerizing a specific compound represented by General formula (P-1) and a copolymerizable monomer compound, a method for producing an actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a resin corresponding to a reaction intermediate of the resin.