The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

A polymeric molecule having the formula: X—[C(A).sub.2C(B)(B′)].sub.n-Q[CY═C(Z)(Z′)] or [C(A).sub.2=C(B)].sub.n-Q[C(Y)(Y′)—C(Z)(Z′)]—X′, wherein A is either H or F; B and B′ are either H, F, or Cl, and are not necessarily the same; X and X′ are Br, Cl or I (and are not necessarily the same); Y and Y′ are F, Br, Cl or I (and are not necessarily the same); and wherein Z and Z′ are F, Br, Cl or I (and are not necessarily the same); Q is optional and is either oxygen (O) or sulfur (S); and n is at least 1.

A polymeric molecule having the formula: X—[C(A).sub.2C(B)(B′)].sub.n-Q[CY═C(Z)(Z′)] or [C(A).sub.2=C(B)].sub.n-Q[C(Y)(Y′)—C(Z)(Z′)]—X′, wherein A is either H or F; B and B′ are either H, F, or Cl, and are not necessarily the same; X and X′ are Br, Cl or I (and are not necessarily the same); Y and Y′ are F, Br, Cl or I (and are not necessarily the same); and wherein Z and Z′ are F, Br, Cl or I (and are not necessarily the same); Q is optional and is either oxygen (O) or sulfur (S); and n is at least 1.

Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.

Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.

A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.

A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.

There is provided a lithium adsorption molded body including a lithium adsorbent; and a copolymer including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2.

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(In the Chemical Formulas 1 and 2, R1 and R2 are each independently hydrogen or a C1 to C10 alkyl group.)

There is provided a lithium adsorption molded body including a lithium adsorbent; and a copolymer including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2.

##STR00001##

(In the Chemical Formulas 1 and 2, R1 and R2 are each independently hydrogen or a C1 to C10 alkyl group.)