C08F216/08

HIGH DIELECTRIC BREAKDOWN STRENGTH RESINS
20180009934 · 2018-01-11 ·

A method to prepare an oligomer which includes a plurality of pendent alkenyl groups, where the method reacts a copolymer formed by copolymerizing styrene and allyl alcohol comprising a polyhydroxy oligomer wherein n is between about 3 and about 50, and having a structure:

##STR00001##

with an isocyanate having a structure:

##STR00002##

to give a urethane-modified copolymer having a structure:

##STR00003##

HIGH DIELECTRIC BREAKDOWN STRENGTH RESINS
20180009934 · 2018-01-11 ·

A method to prepare an oligomer which includes a plurality of pendent alkenyl groups, where the method reacts a copolymer formed by copolymerizing styrene and allyl alcohol comprising a polyhydroxy oligomer wherein n is between about 3 and about 50, and having a structure:

##STR00001##

with an isocyanate having a structure:

##STR00002##

to give a urethane-modified copolymer having a structure:

##STR00003##

HIGH DIELECTRIC BREAKDOWN STRENGTH RESINS
20180009934 · 2018-01-11 ·

A method to prepare an oligomer which includes a plurality of pendent alkenyl groups, where the method reacts a copolymer formed by copolymerizing styrene and allyl alcohol comprising a polyhydroxy oligomer wherein n is between about 3 and about 50, and having a structure:

##STR00001##

with an isocyanate having a structure:

##STR00002##

to give a urethane-modified copolymer having a structure:

##STR00003##

SUPPORT MATERIAL FOR FUSED DEPOSITION MODELING, AND MANUFACTURING METHOD OF FUSED DEPOSITION MODELED STRUCTURE AND THREE-DIMENSIONAL OBJECT USING SAME
20230023495 · 2023-01-26 · ·

Disclosed is a support material for a fused deposition modeling. The support material has excellent adhesion to a variety of model materials and is easily dissolved and removed by washing with water. Also, the waste liquid (PVA-based aqueous solution) generated after the washing operation may be allowed to be drained as it is, in compliance with environmental regulations. The support material comprises (A) PVA-based resin having a group containing sulfonic acid or a salt thereof and (B) biodegradable polyester. The (A) PVA-based resin having a group containing sulfonic acid or a salt thereof and (B) biodegradable polyester have a sea-island structure in which one is dispersed in the other as a matrix.

SUPPORT MATERIAL FOR FUSED DEPOSITION MODELING, AND MANUFACTURING METHOD OF FUSED DEPOSITION MODELED STRUCTURE AND THREE-DIMENSIONAL OBJECT USING SAME
20230023495 · 2023-01-26 · ·

Disclosed is a support material for a fused deposition modeling. The support material has excellent adhesion to a variety of model materials and is easily dissolved and removed by washing with water. Also, the waste liquid (PVA-based aqueous solution) generated after the washing operation may be allowed to be drained as it is, in compliance with environmental regulations. The support material comprises (A) PVA-based resin having a group containing sulfonic acid or a salt thereof and (B) biodegradable polyester. The (A) PVA-based resin having a group containing sulfonic acid or a salt thereof and (B) biodegradable polyester have a sea-island structure in which one is dispersed in the other as a matrix.

Aqueous fracturing fluid composition and fracturing process using the composition

Fracturing fluid comprising, in solution in water, a proppant and an associative amphoteric polymer, the said polymer and comprising: 0.01 to 10 mol % of at least one cationic monomer containing a hydrophobic chain, from 0.09 to 89.99 mol % of at least one anionic monomer, and from 10 to 99.9 mol % of at least one nonionic water-soluble monomer, the total amount of monomer being 100 mol %. Fracturing process using this fluid.

Aqueous fracturing fluid composition and fracturing process using the composition

Fracturing fluid comprising, in solution in water, a proppant and an associative amphoteric polymer, the said polymer and comprising: 0.01 to 10 mol % of at least one cationic monomer containing a hydrophobic chain, from 0.09 to 89.99 mol % of at least one anionic monomer, and from 10 to 99.9 mol % of at least one nonionic water-soluble monomer, the total amount of monomer being 100 mol %. Fracturing process using this fluid.

SURFACTANT COMPOSITION, METHOD FOR PRODUCING AQUEOUS RESIN DISPERSION, PAINT, AND ADHESIVE

Provided is a surfactant composition that can impart good polymerization stability, that can yield an aqueous resin dispersion having good wettability, and that can improve water resistance and water-resistant adhesive strength of a resin film formed from the aqueous resin dispersion. The surfactant composition according to the present invention includes a compound C1 represented by formula (1):

##STR00001##

(in formula (1), A.sup.1 represents an alkylene group having 10 to 14 carbon atoms, A.sup.2 represents an alkylene group having 2 to 4 carbon atoms, n is an average number of moles of an oxyalkylene group A.sup.2O added and is a number of 1 to 100, and X represents a hydrogen atom, a sulfate ester or a salt thereof, a phosphate ester or a salt thereof, or methylcarboxylic acid or a salt thereof); and a compound C2 represented by formula (2):

##STR00002##

(in formula (2), A.sup.1, A.sup.2, n, and X are as defined in formula (1)). A molar ratio C1/C2 of the compound C1 to the compound C2 is 99/1 to 84/16.

Olefin-olefinic alcohol copolymer, and preparation method therefor

The invention provides an olefin-olefinic alcohol copolymer and a preparation method thereof, said copolymer comprising a spherical and/or spherical-like polymer. The copolymer provided by the invention exhibits a good morphology and has good prospects in industrial use.

Light-activated coating and materials

A polymer having a first monomer operatively connected to Rose Bengal, a second monomer, and a surfactant, wherein the surfactant is selected from the group consisting of ionic surfactants, anionic surfactants, cationic surfactants, nonionic surfactants, zwitterionic surfactants, and mixtures thereof. The Rose Bengal in polymer in an amount effective for rendering the polymer antimicrobial or antiviral upon exposure of said polymer to light; and the polymer produces singlet oxygen from air in the presence of light. A substrate have these features is also included.