C08F222/225

Polymer glass transition temperature manipulation via Z/E hydrazone photoswitching

In an embodiment, the present disclosure pertains to a method of changing the glass transition temperature of a polymer. In some embodiments, the polymer includes at least one hydrazone-containing compound. In general, the methods of the present disclosure include one or more of the following steps of: (1) applying light to the polymer; and (2) thereby changing the glass transition temperature of the polymer. In another embodiment, the present disclosure pertains to a polymer having a light-adjustable glass transition temperature. In some embodiments, the polymer includes at least one hydrazone-containing compound.

POLYMER GLASS TRANSITION TEMPERATURE MANIPULATION VIA Z/E HYDRAZONE PHOTOSWITCHING

In an embodiment, the present disclosure pertains to a method of changing the glass transition temperature of a polymer. In some embodiments, the polymer includes at least one hydrazone-containing compound. In general, the methods of the present disclosure include one or more of the following steps of: (1) applying light to the polymer; and (2) thereby changing the glass transition temperature of the polymer. In another embodiment, the present disclosure pertains to a polymer having a light-adjustable glass transition temperature. In some embodiments, the polymer includes at least one hydrazone-containing compound.

D1563 RADIATION CURABLE SECONDARY COATING FOR OPTICAL FIBERS
20170355874 · 2017-12-14 ·

A radiation curable secondary coating composition for optical fiber is described and claimed. This radiation curable secondary coating composition includes component (A) which is a urethane (meth)acrylate and component (B) which is a (meth)acrylate compound with two or more ethylenically unsaturated groups and one or more bisphenol structures; wherein the content of component (B) in the composition is 60-300 mass parts per 100 mass parts of component (A). The liquid secondary coating has a viscosity at 25° C. of from about 0.1 Pa.Math.s to about 15 Pa.Math.s. Films obtained by curing the liquid radiation curable secondary coating composition of the present invention have a Young's modulus of from about 600 MPa to about 500 MPa and the breaking elongation of the cured film is from about to 5% to about 50%.

D1563 RADIATION CURABLE SECONDARY COATING FOR OPTICAL FIBERS
20170355874 · 2017-12-14 ·

A radiation curable secondary coating composition for optical fiber is described and claimed. This radiation curable secondary coating composition includes component (A) which is a urethane (meth)acrylate and component (B) which is a (meth)acrylate compound with two or more ethylenically unsaturated groups and one or more bisphenol structures; wherein the content of component (B) in the composition is 60-300 mass parts per 100 mass parts of component (A). The liquid secondary coating has a viscosity at 25° C. of from about 0.1 Pa.Math.s to about 15 Pa.Math.s. Films obtained by curing the liquid radiation curable secondary coating composition of the present invention have a Young's modulus of from about 600 MPa to about 500 MPa and the breaking elongation of the cured film is from about to 5% to about 50%.

Photopolymerizable dental composites with rapid curing and low shrinkage stress
11673980 · 2023-06-13 · ·

Radically polymerizable material, which contains (a) 0.01 to 5 wt.-% of at least one transfer reagent, (b) 5 to 60 wt.-% of at least one multifunctional (meth)acrylate or a mixture of mono- and multifunctional (meth)acrylates, (c) 0.01 to 3.0 wt.-% of a mixture of at least one monomolecular and at least one bimolecular photoinitiator, (d) 30 to 90 wt.-% of at least one filler, and (e) optionally additive(s), wherein the material contains as transfer reagent (a) at least one allyl sulfone of Formula I and/or a vinyl sulfone ester of Formula II.

Photopolymerizable dental composites with rapid curing and low shrinkage stress
11673980 · 2023-06-13 · ·

Radically polymerizable material, which contains (a) 0.01 to 5 wt.-% of at least one transfer reagent, (b) 5 to 60 wt.-% of at least one multifunctional (meth)acrylate or a mixture of mono- and multifunctional (meth)acrylates, (c) 0.01 to 3.0 wt.-% of a mixture of at least one monomolecular and at least one bimolecular photoinitiator, (d) 30 to 90 wt.-% of at least one filler, and (e) optionally additive(s), wherein the material contains as transfer reagent (a) at least one allyl sulfone of Formula I and/or a vinyl sulfone ester of Formula II.

HARD COATING COMPOSITION, AND HARD COATING FILM, WINDOW FILM AND DISPLAY DEVICE COMPRISING THE SAME
20170313901 · 2017-11-02 · ·

This disclosure relates to a hard coating composition, which includes a silazane compound, a thiol-based compound, a polyfunctional urethane (meth)acrylate having a cyclohexyl group, a photoinitiator, inorganic nanoparticles, and a solvent, and which can also exhibit superior scratch resistance, hardness and flexibility.

HARD COATING COMPOSITION, AND HARD COATING FILM, WINDOW FILM AND DISPLAY DEVICE COMPRISING THE SAME
20170313901 · 2017-11-02 · ·

This disclosure relates to a hard coating composition, which includes a silazane compound, a thiol-based compound, a polyfunctional urethane (meth)acrylate having a cyclohexyl group, a photoinitiator, inorganic nanoparticles, and a solvent, and which can also exhibit superior scratch resistance, hardness and flexibility.

COMPOSITION FOR FORMING INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, METHOD FOR FORMING INTERLAYER INSULATING FILM PATTERN, AND DEVICE
20170285473 · 2017-10-05 ·

A composition for forming an interlayer insulating film including a polymerizable monomer, an imide compound represented by general formula (z-1), a reaction promoter which promotes the polymerization of the polymerizable monomer and the imide compound, and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R.sup.1 and R.sup.2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R.sub.Z.sup.00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, R.sub.z.sup.01 and R.sub.z.sup.02 represent an alkyl group or an alkoxy group, and n.sub.1 and n.sub.2 are 0 or 1.

##STR00001##

COMPOSITION FOR FORMING INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, METHOD FOR FORMING INTERLAYER INSULATING FILM PATTERN, AND DEVICE
20170285473 · 2017-10-05 ·

A composition for forming an interlayer insulating film including a polymerizable monomer, an imide compound represented by general formula (z-1), a reaction promoter which promotes the polymerization of the polymerizable monomer and the imide compound, and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R.sup.1 and R.sup.2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R.sub.Z.sup.00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, R.sub.z.sup.01 and R.sub.z.sup.02 represent an alkyl group or an alkoxy group, and n.sub.1 and n.sub.2 are 0 or 1.

##STR00001##