A composition contains at least one siloxane having ethylenically unsaturated, radically-polymerizable groups, and at least one hydrocarbon having 2 to 6 ethylenically-unsaturated, radically-polymerizable groups, and can be used as a release coating, said composition allowing a good degree of release behavior from adhesive compounds while at the same time also achieving a high level of adhesion of the coating to the carrier material.

A composition contains at least one siloxane having ethylenically unsaturated, radically-polymerizable groups, and at least one hydrocarbon having 2 to 6 ethylenically-unsaturated, radically-polymerizable groups, and can be used as a release coating, said composition allowing a good degree of release behavior from adhesive compounds while at the same time also achieving a high level of adhesion of the coating to the carrier material.

Provided is a siloxane resin composition having excellent adhesion and fine patterning properties. The siloxane resin composition contains: a siloxane resin (A) including a structure represented by general formula (1), a structure represented by general formula (2), and a structure represented by general formula (3); a compound (B) having an unsaturated double bond; a photopolymerization initiator (C); and a solvent (D).

Provided is a siloxane resin composition having excellent adhesion and fine patterning properties. The siloxane resin composition contains: a siloxane resin (A) including a structure represented by general formula (1), a structure represented by general formula (2), and a structure represented by general formula (3); a compound (B) having an unsaturated double bond; a photopolymerization initiator (C); and a solvent (D).

The present disclosure relates to a photopolymer composition including a polymer matrix or a precursor thereof having a predetermined chemical structure; a photoreactive monomer; and a photoinitiator, a hologram recording medium, an optical element and a holographic recording method using the same.

Provided is a siloxane resin composition having excellent adhesion and fine patterning properties. The siloxane resin composition contains: a siloxane resin (A) including a structure represented by general formula (1), a structure represented by general formula (2), and a structure represented by general formula (3); a compound (B) having an unsaturated double bond; a photopolymerization initiator (C); and a solvent (D).

Provided is a siloxane resin composition having excellent adhesion and fine patterning properties. The siloxane resin composition contains: a siloxane resin (A) including a structure represented by general formula (1), a structure represented by general formula (2), and a structure represented by general formula (3); a compound (B) having an unsaturated double bond; a photopolymerization initiator (C); and a solvent (D).

The present disclosure relates to a photopolymer composition including a polymer matrix or a precursor thereof having a predetermined chemical structure; a photoreactive monomer; and a photoinitiator, a hologram recording medium, an optical element and a holographic recording method using the same.

A process for preparing SiC-bonded polyethersiloxanes by precious metal-catalysed addition of olefinically unsaturated polyethers onto siloxanes having SiH groups is described, wherein, prior to commencement of reaction, the siloxane having SiH groups is mixed with an olefinically unsaturated polyether and with a polyethersiloxane by stirring, and then contacted with a precious metal catalyst and optionally further additives, and the SiC bond formation reaction is conducted up to an SiH conversion, determined by gas-volumetric means, of at least 97%.

A process for preparing SiC-bonded polyethersiloxanes by precious metal-catalysed addition of olefinically unsaturated polyethers onto siloxanes having SiH groups is described, wherein, prior to commencement of reaction, the siloxane having SiH groups is mixed with an olefinically unsaturated polyether and with a polyethersiloxane by stirring, and then contacted with a precious metal catalyst and optionally further additives, and the SiC bond formation reaction is conducted up to an SiH conversion, determined by gas-volumetric means, of at least 97%.