Patent classifications
C08F291/10
Radically polymerizable compositions
Polymerizable compositions comprising a radically polymerizable resin can be polymerized in the absence of a peroxide initiator and other undesirable components. The polymerizable compositions and methods employ a manganese- or iron-containing salt or organic complex and a 1,3-dioxo compound with one or more other components. The polymerizable compositions have better storage stability and reduced gel time-drift.
Radically polymerizable compositions
Polymerizable compositions comprising a radically polymerizable resin can be polymerized in the absence of a peroxide initiator and other undesirable components. The polymerizable compositions and methods employ a manganese- or iron-containing salt or organic complex and a 1,3-dioxo compound with one or more other components. The polymerizable compositions have better storage stability and reduced gel time-drift.
RADICALLY POLYMERIZABLE COMPOSITIONS
Polymerizable compositions comprising a radically polymerizable resin can be polymerized in the absence of a peroxide initiator and other undesirable components. The polymerizable compositions and methods employ a manganese- or iron-containing salt or organic complex and a 1,3-dioxo compound with one or more other components. The polymerizable compositions have better storage stability and reduced gel time-drift.
RADICALLY POLYMERIZABLE COMPOSITIONS
Polymerizable compositions comprising a radically polymerizable resin can be polymerized in the absence of a peroxide initiator and other undesirable components. The polymerizable compositions and methods employ a manganese- or iron-containing salt or organic complex and a 1,3-dioxo compound with one or more other components. The polymerizable compositions have better storage stability and reduced gel time-drift.
RADICALLY POLYMERIZABLE COMPOSITIONS
Polymerizable compositions comprising a radically polymerizable resin can be polymerized in the absence of a peroxide initiator and other undesirable components. The polymerizable compositions and methods employ a manganese- or iron-containing salt or organic complex and a 1,3-dioxo compound with one or more other components. The polymerizable compositions have better storage stability and reduced gel time-drift.
RADICALLY POLYMERIZABLE COMPOSITIONS
Polymerizable compositions comprising a radically polymerizable resin can be polymerized in the absence of a peroxide initiator and other undesirable components. The polymerizable compositions and methods employ a manganese- or iron-containing salt or organic complex and a 1,3-dioxo compound with one or more other components. The polymerizable compositions have better storage stability and reduced gel time-drift.
Formulations containing mixed resin systems and the use thereof for wafer-level underfill for 3D TSV packages
Provided herein are mixed resin systems and the use thereof for wafer-level underfill (WAUF) for three-dimensional TSV packages. In one aspect, there are provided compositions comprising (1) an epoxy resin, (2) a maleimide, nadimide or itaconamide, (3) an acrylate and (4) a filler. In certain aspects, the epoxy resin is a siloxane-modified resin. In certain aspects, the invention relates to underfill films prepared from invention compositions. In certain aspects, the invention relates to articles comprising the underfill films described herein.
Formulations containing mixed resin systems and the use thereof for wafer-level underfill for 3D TSV packages
Provided herein are mixed resin systems and the use thereof for wafer-level underfill (WAUF) for three-dimensional TSV packages. In one aspect, there are provided compositions comprising (1) an epoxy resin, (2) a maleimide, nadimide or itaconamide, (3) an acrylate and (4) a filler. In certain aspects, the epoxy resin is a siloxane-modified resin. In certain aspects, the invention relates to underfill films prepared from invention compositions. In certain aspects, the invention relates to articles comprising the underfill films described herein.
FORMULATIONS CONTAINING MIXED RESIN SYSTEMS AND THE USE THEREOF FOR WAFER-LEVEL UNDERFILL FOR 3D TSV PACKAGES
Provided herein are mixed resin systems and the use thereof for wafer-level underfill (WAUF) for three-dimensional TSV packages. In one aspect, there are provided compositions comprising (1) an epoxy resin, (2) a maleimide, nadimide or itaconamide, (3) an acrylate and (4) a filler. In certain aspects, the epoxy resin is a siloxane-modified resin. In certain aspects, the invention relates to underfill films prepared from invention compositions. In certain aspects, the invention relates to articles comprising the underfill films described herein.
FORMULATIONS CONTAINING MIXED RESIN SYSTEMS AND THE USE THEREOF FOR WAFER-LEVEL UNDERFILL FOR 3D TSV PACKAGES
Provided herein are mixed resin systems and the use thereof for wafer-level underfill (WAUF) for three-dimensional TSV packages. In one aspect, there are provided compositions comprising (1) an epoxy resin, (2) a maleimide, nadimide or itaconamide, (3) an acrylate and (4) a filler. In certain aspects, the epoxy resin is a siloxane-modified resin. In certain aspects, the invention relates to underfill films prepared from invention compositions. In certain aspects, the invention relates to articles comprising the underfill films described herein.