Patent classifications
C08G16/0231
CARBON NANOTUBE FILM STRUCTURE AND METHOD FOR MAKING
A carbon nanotube (CNT)/polymer film or CNT/polymer composite structure containing CNTs, arranged uniformly in a randomly oriented distribution in the polymer matrix. The CNT sheet is manufactured by applying a highly dispersed CNT-polymer-solvent suspension, mixed using ultrasonication, over a carrier, using a coating process, and drying to form the CNT/polymer film. The CNT film is useful in making CNT composite laminates and structures having utility for electro-thermal heating, deicing, shielding for wire & cable, thermal interface pads, energy storage, heat dissipation, conductive composites, antennas, reflectors, and electromagnetic environmental effects (E3), such as lightning strike protection, EMP protection, directed energy protection, and EMI shielding in a variety of form factors such as sheets, roll stocks, and tapes.
POLYHEMIAMINAL AND POLYHEXAHYDROTRIAZINE MATERIALS FROM 1,4 CONJUGATE ADDITION REACTIONS
Polyhemiaminal (PHA) and polyhexahydrotriazine (PHT) materials are modified by 1,4 conjugate addition chemical reactions to produce a variety of molecular architectures comprising pendant groups and bridging segments. The materials are formed by a method that includes heating a mixture comprising solvent(s), paraformaldehyde, aromatic amine groups, aliphatic amine Michael donors, and Michael acceptors, such as acrylates. The reaction mixtures may be used to prepare polymer pre-impregnated materials and composites containing PHT matrix resin.
Polyhemiaminal and polyhexahydrotriazine materials from 1,4 conjugate addition reactions
Polyhemiaminal (PHA) and polyhexahydrotriazine (PHT) materials are modified by 1,4 conjugate addition chemical reactions to produce a variety of molecular architectures comprising pendant groups and bridging segments. The materials are formed by a method that includes heating a mixture comprising solvent(s), paraformaldehyde, aromatic amine groups, aliphatic amine Michael donors, and Michael acceptors, such as acrylates. The reaction mixtures may be used to prepare polymer pre-impregnated materials and composites containing PHT matrix resin.
SILICA-BASED ORGANOGELS VIA HEXAHYDROTRIAZINE-BASED REACTIONS
Silica-based organogels, including aerogels, incorporating hexahydrotriazine and/or hemiaminal species are described. These organo-silica gel materials can have applications as insulating materials. In a particular example, an aerogel includes silica groups and a hexahydrotriazine moiety with at least one nitrogen atom that is covalently linked to a silica group. Methods of making such silica-based organogels are also described.
CYANIC ACID ESTER COMPOUND, METHOD FOR PRODUCING SAME, RESIN COMPOSITION, CURED PRODUCT, PREPREG, MATERIAL FOR ENCAPSULATION, FIBER-REINFORCED COMPOSITE MATERIAL, ADHESIVE, METAL FOIL-CLAD LAMINATE, RESIN SHEET, AND PRINTED CIRCUIT BOARD
The present invention provides a novel cyanic acid ester compound that has excellent solvent solubility and provides a cured product having a low rate of thermal expansion and having excellent flame retardance and heat resistance, and a resin composition containing the compound, etc. The present invention provides a resin composition whose cured product obtained by curing can achieve a printed circuit board excellent in peel strength, glass transition temperature, rate of thermal expansion, rate of water absorption, and thermal conductivity. The present invention provides a resin composition whose cured product obtained by curing can achieve a printed circuit board not only having a high glass transition temperature and low thermal expansibility but being also excellent in flexural modulus and thermal conductivity. The cyanic acid ester compound is represented by the general formula (1):
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High-adaptability viscosity-reducing polycarboxylic acid water reducer, preparation method therefor and use thereof
Disclosed are a highly adaptable viscosity-reducing polycarboxylate water reducer and its preparation method and application. The highly adaptable viscosity-reducing polycarboxylate water reducer is composed of a polymer and water, and the polymer accounts for 30-50 wt %; since the main chain of the polymer contains a hydrophobic benzene ring and hydrophilic amine, the polymer has strong rigidity and good solubility in an aqueous solution, and is rich in two adsorption groups of carboxyl group/phosphono group. The highly adaptable viscosity-reducing polycarboxylate water reducer of the present invention has excellent water-reducing and slump retention properties and is suitable for general construction projects and commercial concrete projects. Compared with the conventional polycarboxylate water reducer, the highly adaptable viscosity-reducing polycarboxylate water reducer of the present invention has strong adaptability to concrete materials and can effectively reduce the viscosity of high-strength concrete (C50-C100), thus having bright application prospects in the high-end water reducer market.
COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
The invention provides a composition for forming an organic film, which generates no by-product even under such a film formation condition in an inert gas to prevent substrate corrosion, which is capable of forming an organic film not only excellent in properties of filling and planarizing a pattern formed on a substrate but also favorable for dry etching resistance during substrate processing, and further which causes no fluctuation in film thickness of the film due to thermal decomposition even when a CVD hard mask is formed on the organic film. The composition for forming an organic film includes (A) a polymer having a repeating unit shown by the following general formula (1) and (B) an organic solvent.
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COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
The invention provides a composition for forming an organic film, which generates no by-product even under such a film formation condition in an inert gas to prevent substrate corrosion, which is capable of forming an organic film not only excellent in properties of filling and planarizing a pattern formed on a substrate but also favorable for dry etching resistance during substrate processing, and further which causes no fluctuation in film thickness of the film due to thermal decomposition even when a CVD hard mask is formed on the organic film. The composition for forming an organic film includes (A) a polymer having a repeating unit shown by the following general formula (1) and (B) an organic solvent.
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RESIN BLENDS OF RESORCINOL DIPHTHALONITRILE ETHER WITH BISPHENOL M DIPHTHALONITRILE ETHER AND/OR BISPHENOL T DIPHTHALONITRILE ETHER
A resin blend is provided including a blend of resorcinol diphthalonitrile ether resin and a bisphenol M diphthalonitrile ether resin. Another resin blend is provided including a blend of resorcinol diphthalonitrile ether resin and a bisphenol T diphthalonitrile ether resin. The resin blends prior to cure have more favorable processing and curing properties compared to the resorcinol diphthalonitrile resin alone, enabling greater ease in manufacturing.
BISPHENOL M DIPHTHALONITRILE ETHER RESIN, BISPHENOL P DIPHTHALONITRILE ETHER RESIN, METHODS OF MAKING SAME, RESIN BLENDS, AND TWO COMPONENT SYSTEMS
Resins are provided including bisphenol M diphthalonitrile ether resin or bisphenol P diphthalonitrile either resin. Compositions are also provided, including a primary amine curative and the bisphenol M diphthalonitrile ether resin or the bisphenol P diphthalonitrile either resin. Further, polymerized products are provided of the bisphenol M diphthalonitrile ether resin or the bisphenol P diphthalonitrile either resin. In addition, a method of making a polymerized network is provided. A two component system is further provided, including a curative in one of the components and the bisphenol M diphthalonitrile ether resin or the bisphenol P diphthalonitrile either resin in the other component. In addition, a resin blend is provided, including a blend of at least two of bisphenol M diphthalonitrile ether resin, bisphenol P diphthalonitrile either resin, or bisphenol T diphthalonitrile ether resin.