Patent classifications
C
CHEMISTRY; METALLURGY
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C08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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C08G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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16/00
Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00
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C08G16/0287
with organometallic or metal-containing organic compounds
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C08G16/0287

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD
20200249573 · 2020-08-06 ·

The present invention provides a composition for resist underlayer film formation comprising a tellurium-containing compound or a tellurium-containing resin.