An m-phenylenediamine compound is represented by the following General Formula (I), (II), or (III). ##STR00001##
R.sup.1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group. R.sup.2, R.sup.3, and R.sup.4 each represent an alkyl group. R.sup.5 and R.sup.6 each represent an alkyl group. X represents a chlorine atom or a bromine atom. A method for producing a polymer compound includes obtaining a polymer compound by using the m-phenylenediamine compound represented by General Formula (I) as a raw material.

An m-phenylenediamine compound is represented by the following General Formula (I), (II), or (III).

##STR00001##

R.sup.1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group. R.sup.2, R.sup.3, and R.sup.4 each represent an alkyl group. R.sup.5 and R.sup.6 each represent an alkyl group. X represents a chlorine atom or a bromine atom. A method for producing a polymer compound includes obtaining a polymer compound by using the m-phenylenediamine compound represented by General Formula (I) as a raw material.

The present disclosure relates to two-part polyurethane coatings having excellent erosion resistance and comprising a compound having a fluorinated segment. Additionally, these two-part polyurethane coatings can be cured under high relative humidity conditions. The present disclosure also relates to articles coated with those two-part polyurethane coatings and to methods of reducing erosion in an article, among other embodiments.

The present disclosure relates to two-part polyurethane coatings having excellent erosion resistance and comprising a compound having a fluorinated segment. Additionally, these two-part polyurethane coatings can be cured under high relative humidity conditions. The present disclosure also relates to articles coated with those two-part polyurethane coatings and to methods of reducing erosion in an article, among other embodiments.

A polythiol composition according to exemplary embodiments includes a first polythiol compound which provides a maximum peak in a high performance liquid chromatography (HPLC) analysis graph obtained at a wavelength of 230 nm, and a second polythiol compound having a molecular weight greater than that of the first polythiol compound and represented by C.sub.9H.sub.20S.sub.6. A ratio of a peak area of the second polythiol compound to a peak area of the first polythiol compound, which are measured through the HPLC analysis graph at the wavelength of 230 nm, is 0.05 to 5.0%.