Patent classifications
C08G18/758
POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED PRODUCT, AND METHOD OF PRODUCING OPTICAL MATERIAL
A polymerizable composition for an optical material containing two or more different monomers for an optical material, and a polymerization catalyst, in which at least one of the two or more different monomers for an optical material is an isocyanate compound containing no aromatic rings, a content of the polymerization catalyst with respect to a total of 100 parts by mass of the two or more different monomers for an optical material is from more than 0.05 parts by mass to 2.0 parts by mass, and a viscosity measured by a B-type viscometer at 25° C. and 60 rpm is from 10 mPa.Math.s to 1,000 mPa.Math.s.
AQUEOUS POLYURETHANE RESIN COMPOSITION AND COATING MATERIAL USING THE COMPOSITION
Provided is an aqueous polyurethane resin composition which is excellent in finished appearance as well as excellent in impact resistance, such as chipping resistance, and adhesion.
The aqueous polyurethane resin composition includes a polyurethane resin obtained from at least (a) at least two types of organic diisocyanate compounds and/or polyisocyanate compounds which are different from each other, (b) a polyol compound; (c) an acidic group-containing compounds comprising at least two types of compounds which are a compound containing a carboxyl group as the acid group (a carboxyl group-containing compound) and a compound containing a sulfo group as the acid group (a sulfo group-containing compound); and (d) a chain extender of a polyamine compound, a diamine compound, a polyol compound and/or an alkanolamine compound with a molecular weight of not more than 400, in which the aqueous polyurethane resin composition has a viscosity of not less than 500 Pa.Math.s and not more than 50,000 Pa.Math.s when the polyurethane resin is contained in an amount of 65% by weight.
POLYESTER-URETHANE COMPOSITIONS USEFUL FOR PRODUCING ULTRAVIOLET LIGHT RESISTANT COATINGS
The present invention relates to a polyester-urethane composition. In particular, the invention relates to aliphatic alkyl ring-containing compositions that are useful for producing ultraviolet light resistant coatings. The invention further relates to pigmented and clear coating compositions formulated with the polyester-urethane composition of the present invention. The polyester-urethane compositions may be crosslinked.
CROSSLINKING AGENT COMPOSITION FOR WATER-COMPATIBLE RESIN, AND WATER-COMPATIBLE RESIN COMPOSITION
A crosslinking agent composition for water-compatible resins which comprises a hydrophobic crosslinking agent, a water-soluble organic compound, one or more oily media selected from among hydrocarbon-based solvents and ketone-based solvents having a solubility parameter of 9.0 (cal/cm.sup.−3).sup.1/2 or less, and an aqueous medium. The crosslinking agent composition can improve the storage stability of a water-compatible resin composition. The water-compatible resin composition which contains this crosslinking agent composition can give cured objects satisfactory in terms of water resistance and solvent resistance and is suitable also for use in wet-on-wet coating.
Fiber coating compositions with high cure speed
The present disclosure provides coating compositions and cured products formed from the coating compositions. The cured products can be formed at high cure speeds from the coating compositions and feature low Young's modulus, high tear strength, and/or high tensile toughness. The cured products can be used as primary coatings for optical fibers. The primary coatings provide good microbending performance and are resistant to defect formation during fiber coating processing and handling operations. The coating compositions include an oligomer, an alkoxylated monofunctional acrylate monomer, and preferably, an N-vinyl amide compound.
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM
A method of manufacturing a semiconductor device, includes forming a sacrificial film made of a polymer having a urea bond on a substrate by supplying an amine and an isocyanate to a surface of the substrate, wherein the sacrificial film is provided in a specific region of the substrate; performing a predetermined process on the substrate on which the sacrificial film is formed; and removing the sacrificial film by heating the substrate to depolymerize the polymer, wherein a carbon bonded to a nitrogen atom contained in an isocyanate group of the isocyanate is a secondary or tertiary non-aromatic carbon.
Compressible non-reticulated polyurea polishing pad
The invention provides a polishing pad suitable for polishing at least one of semiconductor, optical, magnetic or electromechanical substrates. It includes a polyurea polishing layer and a polyurea matrix. The polyurea has a soft segment being a copolymer of aliphatic fluorine-free polymer groups and a fluorocarbon having a length of a least six carbons. The polyurea matrix being cured with a curative agent and including gas or liquid-filled polymeric microelements. The polyurea matrix has a bulk region and a transition region adjacent the bulk region that extends to the polishing layer. The polymeric microelements in the transition region decrease in thickness as they approach the polishing layer with thickness of the compressed microelements adjacent the polishing layer being less than fifty percent of a diameter of the polymeric microelements in the bulk region. The polishing layer remains hydrophilic during polishing in shear conditions.
Polycarbodiimide compound, production method therefor, and resin composition
There are provided a carbodiimide compound excellent in storage stability, and performance as a crosslinking agent, and a method for producing the same, and a resin composition excellent in the film forming properties and solvent resistance of a coating made at low temperature. A polycarbodiimide compound derived from an aliphatic diisocyanate compound having at least one primary isocyanate group, the polycarbodiimide compound having a structure in which all ends are capped with an organic compound having a functional group that reacts with an isocyanate group, carbodiimide group concentration A (%) and weight average molecular weight Mw satisfying the following formula (1), and a resin composition comprising the carbodiimide compound and an aqueous resin having a predetermined acid value at a predetermined ratio.
(A/Mw)×1000≥0.55 (1).
AQUEOUS POLYURETHANE-POLYUREA DISPERSION AND AQUEOUS BASE PAINT CONTAINING SAID DISPERSION
The present invention relates to an aqueous polyurethane-polyurea dispersion (PD) having polyurethane-polyurea particles, present in the dispersion, having an average particle size of 40 to 2000 nm, and having a gel fraction of at least 50%, the polyurethane-polyurea particles comprising, in each case in reacted form, (Z.1.1) at least one polyurethane prepolymer containing isocyanate groups and comprising anionic groups and/or groups which can be converted into anionic groups, and (Z.1.2) at least one polyamine comprising two primary amino groups and one or two secondary amino groups, and the dispersion (PD) consisting to an extent of at least 90 wt % of the polyurethane-polyurea particles and water.
The present invention also relates to basecoat materials comprising the dispersion (PD), and to multicoat paint systems produced using the basecoat materials.
PROCESSABLE, TUNABLE THIO-ENE CROSSLINKED POLYURETHANE SHAPE MEMORY POLYMERS
An embodiment includes a platform shape memory polymer system. Such an embodiment exhibits a blend of tunable, high performance mechanical attributes in combination with advanced processing capabilities and good biocompatibility. A post-polymerization crosslinking synthetic approach is employed that combines polyurethane and thiol-ene synthetic processes. Other embodiments are described herein.