Patent classifications
C08G2261/141
ELECTROCHROMIC POLYMER AND ELECTROCHROMIC DEVICES CONTAINING THE SAME
A method for forming an electrochromic polymer block includes: forming each of reaction units by reacting two or more electron-donor groups, wherein each of the reaction units includes (i) a first backbone formed by the two or more electron-donor groups and (ii) at least one reactive functional group connected to each end of the first backbone; and forming the electrochromic polymer block by reacting at least two of the reaction units with acid-catalyzed cationic polymerization, wherein the electrochromic polymer block includes a second backbone formed by two or more of the first backbones.
Unsymmetrical benzothtadiazole-based random copolymers
A random copolymer comprising the monomer units A and B. In this random copolymer A comprises ##STR00001##
and B comprises ##STR00002##
Additionally, R1 R2, R3 and R4 are side chains independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, alkylthio, ester, ketone and aryl groups. X1 and X2 are independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, ester, ketone, amide and aryl groups.
ORGANIC SEMICONDUCTOR ELEMENT, MANUFACTURING METHOD THEREOF, COMPOUND, COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, AND ORGANIC SEMICONDUCTOR FILM
An object of the invention is to provide an organic semiconductor element having high mobility and excellent temporal stability under high humidity, and a manufacturing method thereof. Another object is to provide a novel compound suitable for an organic semiconductor. Still another object is to provide an organic semiconductor film having high mobility and excellent temporal stability under high humidity and a composition for forming an organic semiconductor film that can suitably form the organic semiconductor film.
The organic semiconductor element according to the invention includes an organic semiconductor layer containing an organic semiconductor having a repeating unit represented by Formula 1.
##STR00001##
CURABLE RESIN, CURABLE RESIN COMPOSITION, AND CURED PRODUCT
An object is to provide a cured product having excellent heat resistance and dielectric properties (low dielectric properties) and prepregs, circuit boards, build-up films, semiconductor sealing materials, and semiconductor devices having these pieces of performance by using a curable resin having a specific structure. Specifically, provided is a curable resin having a structural unit (1) represented by General Formula (1) below and a terminal structure (2) represented by General Formula (2) below. In Formulae (1) and (2) above, the details of R.sub.1, R.sub.2, R.sub.3, k, and X are as described herein.
##STR00001##
Preparation method of polymer
The present application can provide a preparation method that can effectively produce a polymer having desired molecular weight characteristics and solubility in a solvent, and having a monomer composition, which is designed freely and variously according to the purpose, without unnecessary components with excellent polymerization efficiency and conversion rates, and a dispersion comprising the polymer formed by the preparation method.
COATING COMPOSITIONS
This invention relates to compositions suitable for use as coatings. More particularly, this invention relates to compositions suitable for use as industrial coatings such as anti-corrosion coatings, protective coatings and adhesive coatings. This invention relates to compositions and methods for coating substrates. More particularly, the invention relates to coating compositions and methods for coating substrates, where the coating compositions comprise polymerized olefins and cyclic olefins, via different chemical transformations. The invention also relates to methods of applying the coatings to the substrates.
LIQUID COMPOSITION, METALLIC LUSTER FILM, AND ARTICLE
A liquid composition includes a thiophene polymer; and at least one polymerization component selected from the group including a monomer and an oligomer.
Liquid composition, metallic luster film, and article
A liquid composition includes a thiophene polymer; and at least one polymerization component selected from the group including a monomer and an oligomer.
Unsymmetrical benzothtadiazole-based random copolymers
A random copolymer comprising the monomer units A and B. In this random copolymer A comprises ##STR00001##
and B comprises ##STR00002##
Additionally, R1 R2, R3 and R4 are side chains independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, alkylthio, ester, ketone and aryl groups. X1 and X2 are different and at least one is a Cl and the other is selected from the group consisting of: H, F, CN, alkyl, alkoxy, ester, ketone, amide and aryl groups.
PREPARATION METHOD OF POLYMER
The present application can provide a preparation method that can effectively produce a polymer having desired molecular weight characteristics and solubility in a solvent, and having a monomer composition, which is designed freely and variously according to the purpose, without unnecessary components with excellent polymerization efficiency and conversion rates, and a dispersion comprising the polymer formed by the preparation method.