The present invention relates to a ligand-containing conjugated microporous polymer, which is obtained by covalent coupling of a conjugated microporous polymer and a uranium complexing ligand. The conjugated microporous polymer comprises an aromatic ring and/or a heterocyclic ring. The uranium complexing ligand is selected from the group consisting of a compound with a group containing phosphorus, a compound with a group containing nitrogen, and a compound with a group containing sulfur. The invention further provides use of the ligand-containing conjugated microporous polymer as a uranium adsorbent. The ligand-containing conjugated microporous polymer the invention is capable of adsorbing the radioactive element uranium in strongly acidic and strong-radiation environments.

The present invention relates to a ligand-containing conjugated microporous polymer, which is obtained by covalent coupling of a conjugated microporous polymer and a uranium complexing ligand. The conjugated microporous polymer comprises an aromatic ring and/or a heterocyclic ring. The uranium complexing ligand is selected from the group consisting of a compound with a group containing phosphorus, a compound with a group containing nitrogen, and a compound with a group containing sulfur. The invention further provides use of the ligand-containing conjugated microporous polymer as a uranium adsorbent. The ligand-containing conjugated microporous polymer the invention is capable of adsorbing the radioactive element uranium in strongly acidic and strong-radiation environments.

The organic heteropolymer of this invention is useful for forming an organic semiconductor and is a copolymeric heteropolymer having a constitutional unit represented by the formula (1) and a constitutional unit represented by the formula (2):

##STR00001##

wherein M.sup.1 and M.sup.2 each represent a heteroatom selected from a group 8 element, a group 9 element, a group 10 element, a group 14 element, a group 15 element, and a group 16 element of the Periodic Table, and are different in group; M.sup.1 and M.sup.2 each have a valence v of 2 to 6; R.sup.1a and R.sup.1b each represent a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group; R.sup.2a and R.sup.2b each represent a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, a heteroaryl group, a univalent or bivalent heteroatom selected from a group 16 element and a group 11 element of the Periodic Table, or a metal atom forming a complex with a ligand; m1, m2, n1, and n2 each denote 0 or 1; a ring Ar represents an aromatic ring; R.sup.3 represents a straight- or branched-chain alkyl group, a straight- or branched-chain alkoxy group, or a straight- or branched-chain alkylthio group; and p denotes 0 or an integer of 1 to 3.