Described herein are anionic phenylene oligomers and polymers, and devices including these materials. The oligomers and polymers can be prepared in a convenient and well-controlled manner, and can be used in cation exchange membranes. Also described is the controlled synthesis of anionic phenylene monomers and their use in synthesizing anionic oligomers and polymers, with precise control of the position and number of anionic groups.

A photoresist underlayer composition comprising a poly(arylene ether); an additive of formula (14):

D-(L.sup.1-Ar—[X].sub.n).sub.m  (14); and

a solvent, wherein, in formula (14), D is a substituted or unsubstituted C.sub.1-60 organic group, optionally wherein D is an organic acid salt of the substituted or unsubstituted C.sub.1-60 organic group; each L.sup.1 is independently a single bond or a divalent linking group, when L.sup.1 is a single bond, D may be a substituted or unsubstituted C.sub.3-30 cycloalkyl or substituted or unsubstituted C.sub.1-20 heterocycloalkyl that is optionally fused with Ar, each Ar is independently a monocyclic or polycyclic C.sub.5-60 aromatic group, each X is independently —OR.sup.30, —SR.sup.31, or —NR.sup.32R.sup.33, m is an integer of 1 to 6, each n is independently an integer of 0 to 5, provided that a sum of all n is 2 or greater, and R.sup.30 to R.sup.33 are as provided herein.

This is to provide a non-halogen containing compound excellent in proton conductivity and capable of suitably being used for a polymer electrolytic fuel cell The compound of the present invention has a structure represented by the following general formula (I). ##STR00001## (In the above-mentioned general formula (I), “l” and “n” are molar fractions when l+n=1.0, and 0≤l<1.0 and 0<n≤1.0, A represents a structure represented by the following general formula (II) or (III), B represents a structure represented by the following general formula (VII), the respective structural units are random copolymerized, and at least one benzene ring in the formula (I) has at least one sulfo group.) ##STR00002## (In the above-mentioned general formula (II) or (III), R.sup.1 to R.sup.4 are each independently selected from hydrogen and an alkyl group having 1 to 3 carbon atoms, le and R.sup.2 form together with the carbon atom, they are attached to, an aromatic ring or a fused aromatic ring and R.sup.3 and R.sup.4 form together with the carbon atom, they are attached to, an aromatic ring or a fused aromatic ring, or R.sup.1, R.sup.3 and R.sup.4 are hydrogens and R.sup.2 is a single bond and bonded to the carbon of “c”, X is a single bond, or a structure represented by the following formula (IV), the following formula (V) or the following formula (VI), when X is a single bond, bonds “a”s are both bonded at ortho positions or both bonded at meta positions relative to the carbons bonded to X, when X is a structure represented by the following formula (IV), bonds “a”s are both bonded at para positions relative to the carbons bonded to X, and when it is a structure represented by the following formula (V), bonds “a”s are both bonded at para positions or both bonded at meta positions relative to the carbons bonded to x, when X is a structure represented by the following formula (VI), the bonds “a”s in the above-mentioned general formula (II) or (III) exist only one of these, and A binds to other structure or a structural unit by one of the bonds “a”s and the bond “b”.) ##STR00003##

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer that includes a substituted biphenylene structural unit, wherein one phenylene of the biphenylene of the substituted biphenylene structural unit is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group.

Disclosed is a bis-imide compound comprising two or more aryl moieties substituted with ethynyl moieties and the two or more aryl moieties each having one or more polar substituents. Further disclosed is a polymer composition comprising a copolymer polymerized from a monomer mixture of (a) one or more first monomers comprising a bis-imide compound comprising two or more aryl moieties substituted with ethynyl moieties and the two or more aryl moieties each having one or more polar substituents; and (b) one or more second monomers comprising two or more cyclopentadienone moieties. The polymer compositions exhibit favorable properties for use in electronics and displays applications.

Disclosed is a coating comprising a polymeric layer, wherein the polymeric layer comprises a reaction product of a first monomer comprising two or more aromatic acetylene groups and a second monomer comprising two or more cyclopentadienone groups, or a cured product of the reaction product. The coating may or may not additionally contain a crosslinker and/or a thermal acid generator. Optical thin films made from the coatings exhibit refractive indices that make them useful as interlayers for matching refractive indices between adjacent layers of display devices; thereby improving device output efficiency.

Described herein are anionic phenylene oligomers and polymers, and devices including these materials. The oligomers and polymers can be prepared in a convenient and well-controlled manner, and can be used in cation exchange 5 membranes. Also described is the controlled synthesis of anionic phenylene monomers and their use in synthesizing anionic oligomers and polymers, with precise control of the position and number of anionic groups.

Provided is a mixture which can be subjected to a Diels-Alder reaction, comprising polymer (I) and polymer (II), wherein the structures of the polymer (I) and the polymer (II) are as shown in (I), ##STR00001## wherein x1, y1, x2, y2, z1 and z2 are percentage molar contents; said x1 is >0, x2 is >0, y1 is >0, y2 is >0, z1 is ≥0, and z2 is ≥0; x1+y1+z1=1, and x2+y2+z2=1; Ar1, Ar2, Ar2-1, Ar3, Ar4 and Ar4-1 are each independently selected from: an aryl, or heteroaryl group containing 5-40 ring atoms; R1 and R2 are each independently a linking group; D is a conjugated diene functional group, and A is a dienophilic functional group; and n1 is greater than 0, and n2 is greater than 0. The mixture for a Diels-Alder reaction has a very good optical performance.

Described herein are compositions and methods for generating dental products or orthodontic products. The compositions and methods comprise latent ruthenium complexes and photoacids and/or photoacid generators.

A method of manufacturing a semiconductor device comprising: providing a semiconductor device substrate having a relief image on a surface of the substrate, the relief image having a plurality of gaps to be filled; applying a coating composition to the relief image to provide a coating layer, wherein the coating composition comprises (i) a polyarylene oligomer comprising as polymerized units one or more first monomers having two or more cyclopentadienone moieties and one or more second monomers having an aromatic moiety and two or more alkynyl moieties; wherein the polyarylene oligomer has a M.sub.w of 1000 to 6000 Da, a PDI of 1 to 2, and a molar ratio of total first monomers to total second monomers of 1:>1; and (ii) one or more organic solvents; curing the coating layer to form a polyarylene film; patterning the polyarylene film; and transferring the pattern to the semiconductor device substrate.