Patent classifications
C08G2261/594
RESIN COMPOSITION
Provided is a resin composition that is highly fluid and has good moldability, and that has excellent optical properties. More specifically, provided is a resin composition that contains a thermoplastic resin and a specific compounding agent containing a naphthalene structure and/or a fluorene structure.
Oligomeric Materials for UV Blocking Applications and Methods Thereof
The present invention describes an oligomer for use as a UV stabiliser. In particular, the oligomer is suitable for use as a UV stabiliser in a polymer matrix. The present invention also describes a method of forming said oligomer. The method of forming said oligomer comprises a polymerising step, wherein the polymerising step comprises forming a C—C bond on the hydroxyphenyl ring of a monomer. In preferred embodiments, the oligomer is formed from polymerizing bio-derived monomer such as curcumin, its hydrogenated analogue, and an aldol condensation product of cyclic ketone and vanillin.
Compositions useful for the formation of an antistatic layer or an electromagnetic radiation shield
A liquid composition. The liquid composition comprises (i) particles comprising a complex of a polythiophene and a polyanion, (ii) at least one tetraalkyl orthosilicate, (iii) at least one solvent, and (iv) gallic acid, at least one derivative of gallic acid or a mixture thereof. Also provided are a process for the preparation of a liquid composition, a liquid composition obtainable by such a process, a process for the preparation of a layered body, the layered body obtainable by such a process, a layered body and the use of a liquid composition.
IN SITU POLYMERIZATION OF PARA-XYLENE FOR PRODUCTION OF PARYLENE F-LIKE COATING
A method for depositing coating onto a substrate includes providing a monomer for creation of a protective coating on a substrate, energizing the monomer with a plasma generation system, and polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.
In situ polymerization of para-xylene for production of parylene F-like coating
A method for depositing coating onto a substrate includes providing a monomer for creation of a protective coating on a substrate, energizing the monomer with a plasma generation system, and polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.
COMPOSITIONS USEFUL FOR THE FORMATION OF AN ANTISTATIC LAYER OR AN ELECTROMAGNETIC RADIATION SHIELD
A liquid composition. The liquid composition comprises
(i) particles comprising a complex of a polythiophene and a polyanion,
(ii) at least one tetraalkyl orthosilicate,
(iii) at least one solvent, and
(iv) gallic acid, at least one derivative of gallic acid or a mixture thereof.
Also provided are a process for the preparation of a liquid composition, a liquid composition obtainable by such a process, a process for the preparation of a layered body, the layered body obtainable by such a process, a layered body and the use of a liquid composition.
Oligomeric materials for UV blocking applications and methods thereof
The present invention describes an oligomer for use as a UV stabiliser. In particular, the oligomer is suitable for use as a UV stabiliser in a polymer matrix. The present invention also describes a method of forming said oligomer. The method of forming said oligomer comprises a polymerising step, wherein the polymerising step comprises forming a CC bond on the hydroxyphenyl ring of a monomer. In preferred embodiments, the oligomer is formed from polymerizing bio-derived monomer such as curcumin, its hydrogenated analogue, and an aldol condensation product of cyclic ketone and vanillin.
UV-active chromophore functionalized polysiloxanes and copolymers made therefrom
Disclosed herein is a polyorganosiloxane having the structure of Formula I: ##STR00001##
wherein, R.sub.1 and R.sub.2 are independently a hydrocarbon radical, an unsaturated radical, an alkoxy radical, an aryl radical or an alkenyloxy radical. R.sub.3 is an organic UV absorbing group, R.sub.4 independently is a direct bond, hydrocarbon radical optionally substituted with oxygen and nitrogen, or a group of Formula II(a) or Formula II(b) ##STR00002##
wherein A and B are a hydrocarbon radical, R.sub.5 is independently a hydrogen, a halogen, an aliphatic group having from 1 to 6 carbon atoms, an aromatic group having 6 to 8 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, or an aryloxy group, R.sub.6 is independently a hydroxyl group, an amine group, an acid chloride group, or a sulfonyl halide group, x is from 1 to 300, y is from 0 to 50 and z is from 1 to 50. The polyorganosiloxane is used to make various copolymers or polymer blends. A variety of articles can be made using the polysiloxane described as a polymer blend or copolymer.
Organic semiconductor device and process for its production
An organic semiconductor device selected from organic diodes, organic field effect transistors, and devices comprising an organic diode and/or organic field effect transistor and a method of producing such a device are provided. The organic semiconductor device comprises at least one semiconducting layer based on a diketopyrrolopyrrole (DPP) polymer. The semiconducting layer may effectively be protected against degradation by radiation and/or oxidation by adding at least one stabilizing agent selected from hydroxybenzophenones, hydroxyphenyl benzotriazoles, oxalic acid anilides, hydroxyphenyl triazines, hindered phenols and/or merocyanines to the DPP polymer layer. The stabilization is effective both during production and during usage of the device, while the device's electronic properties are retained. The stabilizing agent is preferably a UV absorbing agent or an antioxidant or anti-radical agent known from the field of organic polymer technology.