Patent classifications
C08G63/6858
HIGH-TEMPERATURE SELF-CROSSLINKING-BASED FLAME-RETARDANT ANTI-DRIPPING COPOLYESTER, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF
A copolyester, comprising structural units represented by [I], [II], [III] and [IV]. The number of structural units represented by [III] is 1-99% of the number of structural units represented by [I], and the number of structural units represented by [IV] is 0-99% of the number of structural units represented by [I]. Also provided are a preparation method therefor and an application thereof. Because an introduced high-temperature self-crosslinking group and an ion group can improve the melt viscosity and the melt intensity during burning of a copolyester, and effectively enhance the char-forming capability of the copolyester, the copolyester exhibits excellent flame retardance and anti-dripping performance. The preparation process for the copolyester is mature, convenient to operate, and easy to control and apply to industrial production.
##STR00001## ##STR00002## ##STR00003## ##STR00004## ##STR00005##
Poly(beta-amino esters) and uses thereof
Provided herein are branched poly(beta-amino esters) (PBAE) useful as vehicles for the delivery of therapeutic agents, such as nucleic acids. The disclosed polymers form stable compositions, and are suitable for the delivery of therapeutic agents via nebulization. Compositions of the disclosed polymers are capable of delivering therapeutic agents such as mRNA to lung epithelial cells.
Functionalized poly (propylene fumarate) polymers made by ring opening polymerization using magnesium catalysts
An end and monomer functionalized poly(propylene fumarate) polymer and methods for preparing this polymer, comprising isomerized residue of a maleic anhydride monomer and a functionalized propylene oxide monomer according to the formula: ##STR00001## where n is an integer from more than 1 to 100; R is the residue of an initiating alcohol having a propargyl, norbornene, ketone or benzyl functional group; and R′ is a second functional group selected from the group consisting of propargyl groups, 2-nitrophenyl groups, and combinations thereof are disclosed. The end and monomer functional groups allow for post-polymerization modification with bioactive materials using “click” chemistries and use of the polymer for a variety of applications in medical fields, including, for example, 3-D printed polymer scaffold.
POLY (BETA-AMINO ESTERS) AND USES THEREOF
Provided herein are branched poly(beta-amino esters) (PBAE) useful as vehicles for the delivery of therapeutic agents, such as nucleic acids. The disclosed polymers form stable compositions, and are suitable for the delivery of therapeutic agents via nebulization. Compositions of the disclosed polymers are capable of delivering therapeutic agents such as mRNA to lung epithelial cells.
Poly (beta-amino esters) and uses thereof
Provided herein are branched poly(beta-amino esters) (PBAE) useful as vehicles for the delivery of therapeutic agents, such as nucleic acids. The disclosed polymers form stable compositions, and are suitable for the delivery of therapeutic agents via nebulization. Compositions of the disclosed polymers are capable of delivering therapeutic agents such as mRNA to lung epithelial cells.
POLYESTER ELASTOMER
A polyester elastomer is provided, which includes a product of reacting (a) amide oligomer, (b) polyalkylene glycol, and (c) poly(alkylene arylate). (a) Amide oligomer has a chemical structure of
##STR00001##
or a combination thereof, wherein R.sup.1 is C.sub.4-8 alkylene group, R.sup.2 is C.sub.4-8 alkylene group, and each of x is independently an integer of 10 to 20. (b) Polyalkylene glycol has a chemical structure of
##STR00002##
wherein R.sup.3 is C.sub.2-10 alkylene group, and y is an integer of 20 to 30. (c) Poly(alkylene arylate) has a chemical structure of
##STR00003##
or a combination thereof, wherein Ar is
##STR00004##
R.sup.4 is C.sub.2-6 alkylene group, and z is an integer of 1 to 10.
EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; a method for producing a resist pattern and producing a semiconductor device, which uses this composition for forming a resist underlayer film. A composition for forming an EUV resist underlayer film, said composition containing an organic solvent and a reaction product of a diepoxy compound and a compound represented by formula (1). (In formula (1), Y1 represents an alkylene group having from 1 to 10 carbon atoms, wherein at least one hydrogen atom is substituted by a fluorine atom; each of T1 and T2 independently represents a hydroxy group or a carboxy group; each of R1 and R2 independently represents an alkyl group having from 1-10 carbon atoms, said alkyl group being optionally substituted by a fluorine atom; and each of n1 and n2 independently represents an integer from 0 to 4.)
HIGH-TEMPERATURE-UP-RESINS (HT-UP RESIN) BASED ON CYCLIC AND NON-CYCLIC RAW MATERIALS (HT-UP)
The present invention relates to a composition comprising (i) an unsaturated dicarboxylic acid, an ester or an anhydride thereof and (ii) aliphatic diol, (iii) dianhydrohexitol, (iv) cycloaliphatic diol and/or aromatic aliphatic diol, and (v) an amide-forming agent. Further, the invention relates to an unsaturated polyesteretheramide obtainable by condensation of the composition of the invention and to an unsaturated polyesteretheramide resin comprising the unsaturated polyesteretheramide and a reactive diluent. The invention further relates to a thermoset with high thermo-mechanical properties.
Polyester resin, water dispersion of polyester resin and method for preparing water dispersion
The present invention provides a polyester resin having a self-emulsifying function which is able to form an aqueous emulsion without using any emulsifier and organic solvent. The present invention also provides a water dispersion, an aqueous adhesive, an aqueous ink, a laminate and a packaging material containing the above polyester resin, as well as a method for preparing the water dispersion.
Low melting and low viscosity thermoset matrix resins from the Z configuration of polyhydroxy stilbenes
The invention generally relates to novel poly-substituted cis stilbenes, their synthesis, their purification, and their use in thermoset resins. These novel cis stilbenes give rise to thermoset resins with greatly improved processing characteristics such as lower melting temperature and lower viscosity; resulting in polymers and composites having greatly improved thermal stability.