Patent classifications
C08G77/24
CURABLE PERFLUOROPOLYETHER ADHESIVE COMPOSITION, AND ADHESIVE AND ADHESIVE TAPE INCLUDING CURED PRODUCT THEREOF
A curable perfluoropolyether adhesive composition containing the following components (A) to (C): (A) 100 parts by mass of a linear perfluoropolyether compound having at least two alkenyl groups per molecule and having a perfluoropolyether structure containing a repeating unit represented by —C.sub.aF.sub.2aO— in a main chain, “a” being an integer of 1 to 6; (B) an effective curing amount of an organosilicon compound having at least two silicon-bonded hydrogen atoms per molecule; and (C) a catalytic amount of a hydrosilylation-reaction catalyst, where a cured product of the curable perfluoropolyether adhesive composition is an adhesive having adhesion of less than 0.5 N/25 mm.
COMPOSITION, COMPOSITION PRECURSOR SOLUTION, PRODUCTION METHOD FOR COMPOSITION, SUBSTRATE WITH MULTILAYER FILM, AND PRODUCTION METHOD FOR PATTERNED SUBSTRATE
A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).
[(R.sup.1).sub.b(R.sup.2).sub.m(OR.sup.3).sub.lSiO.sub.n/2] (1)
[In the formula, R.sup.1 is a group represented by following formula.]
##STR00001##
[(R.sup.4).sub.pSiO.sub.q/2] (2)
COMPOSITION, COMPOSITION PRECURSOR SOLUTION, PRODUCTION METHOD FOR COMPOSITION, SUBSTRATE WITH MULTILAYER FILM, AND PRODUCTION METHOD FOR PATTERNED SUBSTRATE
A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).
[(R.sup.1).sub.b(R.sup.2).sub.m(OR.sup.3).sub.lSiO.sub.n/2] (1)
[In the formula, R.sup.1 is a group represented by following formula.]
##STR00001##
[(R.sup.4).sub.pSiO.sub.q/2] (2)
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM
A new photosensitive resin composition based on a polysiloxane, that is, a negative photosensitive resin composition is provided. A negative photosensitive resin composition includes (A) a polysiloxane compound containing a first structural unit represented by the following general formula (1), (B) a photoinduced curing accelerator, and (C) a solvent.
[(R.sup.x).sub.bR.sup.1.sub.mSiO.sub.n/2] (1)
Coating composition, surface treatment agent containing said composition, and article which is surface-treated with said surface treatment agent
According to the present invention, a surface treatment agent which contains a coating composition that contains (A) one or more compounds selected from among organosilane or siloxane compounds represented by formula (1) and partial (hydrolysis) condensation products of the compounds and (B) one or more compounds selected from among silane or siloxane compounds represented by formula (2) and partial (hydrolysis) condensation products of the compounds at a mass ratio of from 50:50 to 90:10 is able to form a cured coating film that has excellently low fingerprint visibility. ##STR00001##
(In formula (1), A represents —C(═O)OR.sup.1, —C(═O)NR.sup.1.sub.2, —C(═O)SR.sup.1 or —P(═O)(OR.sup.1).sub.2; R.sup.1 represents H, an alkyl group, an aryl group or an aralkyl group; Y represents a divalent organic group; R represents an alkyl group or a phenyl group; X represents a hydroxyl group or a hydrolyzable group; and n is 1-3.) ##STR00002##
(In formula (2), Rf represents a perfluoroalkylene group or a divalent perfluoropolyether group.)
Functionalized F-POSS monomer compositions and uses thereof
Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups.
Functionalized F-POSS monomer compositions and uses thereof
Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups.
Reactive poly(fluoroalkyl-functional siloxane) oligomers, process for forming the same, and compositions using the same
Reactive poly(fluoroalkyl-functional siloxane) oligomers, method of making the same, and compositions comprising the same are shown and described herein. The reactive poly(fluoroalkyl-functional siloxane) oligomers are is derived from a hydrolysable fluoroalkyl-functional silanes. Coating compositions comprising reactive poly(fluoroalkyl-functional siloxane) oligomer(s) may be used to form a coating or a film on a substrate and impart hydrophobic and/or oleophobic properties. The reactive poly(fluoroalkyl-functional siloxane) oligomer are more hydrophobic and oleophobic and show better chemical resistance than the hydrolysable fluoroalkyl-functional silane.
Reactive poly(fluoroalkyl-functional siloxane) oligomers, process for forming the same, and compositions using the same
Reactive poly(fluoroalkyl-functional siloxane) oligomers, method of making the same, and compositions comprising the same are shown and described herein. The reactive poly(fluoroalkyl-functional siloxane) oligomers are is derived from a hydrolysable fluoroalkyl-functional silanes. Coating compositions comprising reactive poly(fluoroalkyl-functional siloxane) oligomer(s) may be used to form a coating or a film on a substrate and impart hydrophobic and/or oleophobic properties. The reactive poly(fluoroalkyl-functional siloxane) oligomer are more hydrophobic and oleophobic and show better chemical resistance than the hydrolysable fluoroalkyl-functional silane.
Heteroleptic Polyhedral Oligomeric Silsesquioxane Compositions and Method
A single vessel process for producing heteroleptic POSS compositions. The process involves the addition of two or more different organosilanes into a reactor containing a solvent. A base catalyst is added to the reactor to hydrolytically assemble the POSS cage core and statistically distribute the organic groups from the organosilanes around the periphery of the POSS cage core. An acid is then added to neutralize or quench the base catalyst. The product is washed and the remaining solvent is removed to recover the heteroleptic POSS. In some alternate embodiments, the product is filtered to recover the heteroleptic POSS. The heteroleptic POSS compositions produced by this process are able to provide an envelope of desirable effects. The heteroleptic POSS compositions may be used as additives for optimizing the performance attributes of coatings, biological materials, thermoplastics, thermoset, and gel polymer systems. The process also produces homoleptic POSS compositions with improved physical characteristics.