Patent classifications
C08L83/12
POLYCARBONATE/POLYORGANOSILOXANE COPOLYMER AND RESIN COMPOSITION INCLUDING SAID COPOLYMER
Provided is a polycarbonate-polyorganosiloxane copolymer, which is produced by using a diol monomer (a1) and a polyorganosiloxane (a2) satisfying the following condition, including: a polyorganosiloxane block (A-1) including a specific repeating unit; and a polycarbonate block (A-2) formed of a specific repeating unit: a mixture, which is obtained by bringing the diol monomer (a1), the polyorganosiloxane (a2), a carbonic acid diester, and a basic catalyst present at the same amount ratio as that at a time of production of the polycarbonate-polyorganosiloxane copolymer into contact with each other at from 100° C. to 250° C. for from 0.5 hour to 5 hours, has a haze value of 30 or less measured under conditions of 23° C. and an optical path length of 10 mm in conformity with ISO 14782:1999.
POLYCARBONATE/POLYORGANOSILOXANE COPOLYMER AND RESIN COMPOSITION INCLUDING SAID COPOLYMER
Provided is a polycarbonate-polyorganosiloxane copolymer, which is produced by using a diol monomer (a1) and a polyorganosiloxane (a2) satisfying the following condition, including: a polyorganosiloxane block (A-1) including a specific repeating unit; and a polycarbonate block (A-2) formed of a specific repeating unit: a mixture, which is obtained by bringing the diol monomer (a1), the polyorganosiloxane (a2), a carbonic acid diester, and a basic catalyst present at the same amount ratio as that at a time of production of the polycarbonate-polyorganosiloxane copolymer into contact with each other at from 100° C. to 250° C. for from 0.5 hour to 5 hours, has a haze value of 30 or less measured under conditions of 23° C. and an optical path length of 10 mm in conformity with ISO 14782:1999.
POLYCARBONATE/POLYORGANOSILOXANE COPOLYMER AND RESIN COMPOSITION INCLUDING SAID COPOLYMER
Provided is a polycarbonate-polyorganosiloxane copolymer, which is produced by using a diol monomer (a1) and a polyorganosiloxane (a2) satisfying the following condition, including: a polyorganosiloxane block (A-1) including a specific repeating unit; and a polycarbonate block (A-2) formed of a specific repeating unit: a mixture, which is obtained by bringing the diol monomer (a1), the polyorganosiloxane (a2), a carbonic acid diester, and a basic catalyst present at the same amount ratio as that at a time of production of the polycarbonate-polyorganosiloxane copolymer into contact with each other at from 100° C. to 250° C. for from 0.5 hour to 5 hours, has a haze value of 30 or less measured under conditions of 23° C. and an optical path length of 10 mm in conformity with ISO 14782:1999.
SIDE CHAIN FUNCTIONALIZED ORGANOSILOXANE POLYMERS, COATING COMPOSITIONS AND ICE-PHOBIC COATINGS THEREOF
The disclosure relates to sidechain functionalized organosiloxane compounds comprising polyalkyleneoxide (POA) and/or polyalkyleneoxide coupled zwitterionic moieties with various other modular side chains including reactive and or non-reactive groups. The present disclosure further also pertains to ice-phobic polymer formulations capable of curing on a substrate to form a surface that is ice-phobic, resistant to ice formation, and/or resistant to ice adhesion. The disclosed ice-phobic polymer formulations comprise one or more disclosed sidechain functionalized organosiloxane compound, one or more binder resin, and/or one or more lubricating liquid. The present disclosure further relates to articles comprising the disclosed ice-phobic polymer compositions, thereby providing articles having ice-phobic properties. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.
SIDE CHAIN FUNCTIONALIZED ORGANOSILOXANE POLYMERS, COATING COMPOSITIONS AND ICE-PHOBIC COATINGS THEREOF
The disclosure relates to sidechain functionalized organosiloxane compounds comprising polyalkyleneoxide (POA) and/or polyalkyleneoxide coupled zwitterionic moieties with various other modular side chains including reactive and or non-reactive groups. The present disclosure further also pertains to ice-phobic polymer formulations capable of curing on a substrate to form a surface that is ice-phobic, resistant to ice formation, and/or resistant to ice adhesion. The disclosed ice-phobic polymer formulations comprise one or more disclosed sidechain functionalized organosiloxane compound, one or more binder resin, and/or one or more lubricating liquid. The present disclosure further relates to articles comprising the disclosed ice-phobic polymer compositions, thereby providing articles having ice-phobic properties. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.
POLYCARBONATE/POLYORGANOSILOXANE COPOLYMER AND RESIN COMPOSITION INCLUDING SAID COPOLYMER
Provided is a polycarbonate-polyorganosiloxane copolymer, including a polyorganosiloxane block (A-1) including a specific structural unit and a polycarbonate block (A-2) formed of a specific repeating unit.
POLYCARBONATE/POLYORGANOSILOXANE COPOLYMER AND RESIN COMPOSITION INCLUDING SAID COPOLYMER
Provided is a polycarbonate-polyorganosiloxane copolymer, including a polyorganosiloxane block (A-1) including a specific structural unit and a polycarbonate block (A-2) formed of a specific repeating unit.
Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
A siloxane polymer comprising polysiloxane, silphenylene, isocyanuric acid, and polyether skeletons in a backbone and having an epoxy group in a side chain is provided. A photosensitive resin composition comprising the siloxane polymer and a photoacid generator is coated to form a film which can be patterned using radiation of widely varying wavelength. The patterned film has high transparency and light resistance.
Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
A siloxane polymer comprising polysiloxane, silphenylene, isocyanuric acid, and polyether skeletons in a backbone and having an epoxy group in a side chain is provided. A photosensitive resin composition comprising the siloxane polymer and a photoacid generator is coated to form a film which can be patterned using radiation of widely varying wavelength. The patterned film has high transparency and light resistance.
METHOD FOR OBTAINING SELF-CLEANING AND SELF-SANITIZING SURFACES OF FINISHED LEATHER
A method for obtaining self-cleaning and self-sanitizing surfaces of finished leather, comprising the steps of deposition of two coating layers containing respective active mixtures on the finished leather surface, in which a first active mixture comprises a film-forming compound based on polymers and filler, a flow additive compound, a cross-linking compound, an anti-oxidant compound and an aqueous dispersion, and a second active mixture comprises a water-based auxiliary flow additive compound, a silicone emulsion, a solvent aliphatic prepolymer, a photo-catalyst compound, a water repellent agent, a biocide action powder agent and solvent agents and/or wetting agents and/or dispersing agents and/or anti-foam agents.