Provided are a photosensitive coloring composition including a pigment and a diketopyrrolopyrrole compound A represented by Formula 1, in which, in a case where molar contents of the diketopyrrolopyrrole compound A and a diketopyrrolopyrrole compound B represented by Formula 1 are each denoted by m.sup.A and m.sup.B, a value of m.sup.A/(m.sup.A+m.sup.B) is 10 mol % to 100 mol %, and a content of the pigment is 35% by mass or more with respect to a total solid content of the photosensitive coloring composition; a cured substance of the photosensitive coloring composition, a color filter including the cured substance, a solid-state imaging element or an image display device, and a novel asymmetric diketopyrrolopyrrole compound.

Diketopyrrolopyrrole compound A: A.sup.1 represents a monovalent organic group having an acidic or a basic functional group, and B.sup.1 represents a monovalent organic group not having an acidic or a basic functional group.

Diketopyrrolopyrrole compound B: A.sup.1 and B.sup.1 represent monovalent organic groups having an acidic or a basic functional group.

##STR00001##

Disclosed is a pigment composition which comprises (a) a pigment of formula wherein Ar.sup.1 is phenylene or C.sub.2-C.sub.6-heteroarylene, Ar.sup.2 is C.sub.6-C.sub.10-aryl or C.sub.2-C.sub.6-heteroaryl; and (b) a pigment derivative of formula (PM-C X1). (II), wherein P.sup.1 is a residue of a colorant chromophore, X.sup.1 is a group comprising an aliphatic carboxamide group, an aliphatic sulfonamide group, a carboxylic acid group or salt thereof, and m is 1, 2, 3 or 4. The pigment composition is suitable to color organic material, especially photosensitive resist formulations for use in color filter applications having high contrast ratios.

##STR00001##

A composition includes: an infrared absorbing pigment; an acid or a base that undergoes neutralization or a salt interchange reaction with the infrared absorbing pigment; an acidic or basic resin; and a solvent, in which in a case where the acid is included, the acidic resin is included, in a case where the base is included, the basic resin is included, and in a case where a pKa of the acid is represented by pKa.sup.1A, a conjugate acid pKa of the base is represented by pKa.sup.1B, a pKa of the acidic resin is represented by pKa.sup.2A, and a conjugate acid pKa of the basic resin is represented by pKa.sup.2B, any one of the following Expression A or Expression B is satisfied.

pKa.sup.1A>pKa.sup.2AExpression A

pKa.sup.1B<pKa.sup.2BExpression B