Patent classifications
C09D125/18
RESIST MATERIAL AND PATTERNING PROCESS
The present invention is a resist material containing a base polymer and an acid generator, where the resist material contains, as the acid generator, a sulfonium salt or iodonium salt of a sulfonic acid bonded to a maleimide group. In a chemically amplified resist material in which an acid is used as a catalyst, it is desired to develop an acid generator that makes it possible to reduce LWR of line patterns and critical dimension uniformity (CDU) of hole patterns, and to improve sensitivity. For this purpose, it is necessary to reduce image blurs due to acid diffusion considerably. An object of the present invention is to provide: a resist material having high sensitivity and low CDU in both a positive resist material and a negative resist material; and a patterning process using the same.
Resist composition and patterning process
A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition. ##STR00001##
Method for manufacturing solid electrolytic capacitor
A method of manufacturing a solid electrolytic capacitor, including: a step (A) of providing a conjugated conductive polymer-containing dispersion by polymerizing, in a dispersion medium containing seed particles turned into protective colloid by a polyanion or in a dispersion medium containing the polyanion, a monomer for obtaining a conjugated conductive polymer; a step (B) of preparing a dispersion containing a morpholine compound and the conjugated conductive polymer by adding the morpholine compound to the conjugated conductive polymer-containing dispersion; a step (C) of causing the dispersion to adhere to a porous anode body formed of a valve metal having a dielectric film on a surface thereof; and a step (D) of forming a solid electrolyte layer by removing the dispersion medium from the dispersion containing the morpholine compound and the conjugated conductive polymer, the dispersion adhering to the porous anode body.
Method for manufacturing solid electrolytic capacitor
A method of manufacturing a solid electrolytic capacitor, including: a step (A) of providing a conjugated conductive polymer-containing dispersion by polymerizing, in a dispersion medium containing seed particles turned into protective colloid by a polyanion or in a dispersion medium containing the polyanion, a monomer for obtaining a conjugated conductive polymer; a step (B) of preparing a dispersion containing a morpholine compound and the conjugated conductive polymer by adding the morpholine compound to the conjugated conductive polymer-containing dispersion; a step (C) of causing the dispersion to adhere to a porous anode body formed of a valve metal having a dielectric film on a surface thereof; and a step (D) of forming a solid electrolyte layer by removing the dispersion medium from the dispersion containing the morpholine compound and the conjugated conductive polymer, the dispersion adhering to the porous anode body.
Positive resist composition and pattern forming process
A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.
COATING FOR FORMING CONDUCTIVE RELEASE LAYER, METHOD FOR PRODUCING SAME, CONDUCTIVE RELEASE FILM, AND METHOD FOR PRODUCING SAME
Provided is a coating for forming a conductive release layer capable of forming a conductive release layer having high adhesion to a film base material, suppressing deterioration in conductivity over time in the air, and having a sufficient releasing property. The coating for forming a conductive release layer of the present invention contains a conductive composite including a π-conjugated conductive polymer and a polyanion, an epoxy compound having an epoxy group, a curable silicone, a polyester resin, and an organic solvent.
Sound absorption material, method of making the same and speaker box filled with the same
The present invention discloses a sound absorption material including an organic frame material; a binder; a thickener; and a plurality of sound absorption grains attached to the organic frame material via the binder, having a grain size in a range of 10-100 μm. The stability and the sound absorption performance of the sound absorption material have been effectively improved.
Sound absorption material, method of making the same and speaker box filled with the same
The present invention discloses a sound absorption material including an organic frame material; a binder; a thickener; and a plurality of sound absorption grains attached to the organic frame material via the binder, having a grain size in a range of 10-100 μm. The stability and the sound absorption performance of the sound absorption material have been effectively improved.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.
Positive resist composition and patterning process
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of an iodized or brominated phenol, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.