A product for adsorbing one or more heavy metals from a liquid is disclosed. The product may comprise attapulgite that has been surface functionalized with a surface coating agent that includes one or more mercury affinity functional groups that chemically bond to the attapulgite surface, wherein the weight percentage of components of the product includes: 91-99 wt. % attapulgite and 1-9 wt. % surface coating agent that includes the one or more mercury affinity functional groups. The product has a surface area in the range of 115-145 m.sup.2/g as measured using the BET method. The heavy metal includes mercury and/or lead. Also disclosed is a method of producing the product and a method of adsorbing at least one heavy metal in a liquid using the product.

A product for adsorbing one or more heavy metals from a liquid is disclosed. The product may comprise attapulgite that has been surface functionalized with a surface coating agent that includes one or more mercury affinity functional groups that chemically bond to the attapulgite surface, wherein the weight percentage of components of the product includes: 91-99 wt. % attapulgite and 1-9 wt. % surface coating agent that includes the one or more mercury affinity functional groups. The product has a surface area in the range of 115-145 m.sup.2/g as measured using the BET method. The heavy metal includes mercury and/or lead. Also disclosed is a method of producing the product and a method of adsorbing at least one heavy metal in a liquid using the product.

A resist underlayer film-forming composition includes: a polysiloxane compound including a first structural unit represented by formula (1); and a solvent. X represents a group represented by formula (2); a is an integer of 1 to 3; R.sup.1 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms; and b is an integer of 0 to 2; and a sum of a and b is no greater than 3. R.sup.2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; n is 1 or 2; R.sup.3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; L represents a single bond or a divalent linking group; and * denotes a site bonding to the silicon atom in the formula (1). The composition is suitable for lithography with an electron beam or extreme ultraviolet ray.

##STR00001##

A resist underlayer film-forming composition includes: a polysiloxane compound including a first structural unit represented by formula (1); and a solvent. X represents a group represented by formula (2); a is an integer of 1 to 3; R.sup.1 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms; and b is an integer of 0 to 2; and a sum of a and b is no greater than 3. R.sup.2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; n is 1 or 2; R.sup.3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; L represents a single bond or a divalent linking group; and * denotes a site bonding to the silicon atom in the formula (1). The composition is suitable for lithography with an electron beam or extreme ultraviolet ray.

##STR00001##

A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).

[(R.sup.1).sub.b(R.sup.2).sub.m(OR.sup.3).sub.lSiO.sub.n/2]  (1)

[In the formula, R.sup.1 is a group represented by following formula.]

##STR00001##

[(R.sup.4).sub.pSiO.sub.q/2]  (2)

A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B).

[(R.sup.1).sub.b(R.sup.2).sub.m(OR.sup.3).sub.lSiO.sub.n/2]  (1)

[In the formula, R.sup.1 is a group represented by following formula.]

##STR00001##

[(R.sup.4).sub.pSiO.sub.q/2]  (2)

An inorganic nanomaterial for continuous formaldehyde removal includes the following components in part by mass: 20-30 parts of water, 0.1-0.3 parts of cellulose, 0.1-0.2 parts of a defoamer, 0.3-0.6 parts of a dispersant, 0.3-0.6 parts of a wetting agent, 20-25 parts of titanium dioxide, 5-10 parts of kaolin, 10-15 parts of heavy calcium, 30-40 parts of modified inorganic hybrid resin, 0.1-1 part of a film-forming additive, and 0.1-1 part of propylene glycol. After inorganic hybrid modification, an ammonia group is introduced, which can continuously and effectively decompose formaldehyde in the environment. A coating film not only has good anti-mildew, anti-algae, fire prevention, and heat insulation functions, but also has a continuous formaldehyde removal function. The formaldehyde removal efficiency is greater than 95%. The durability of formaldehyde purification effect is 90%.

An object of the present invention is to provide a coating composition capable of forming a coating film which can maintain its appearance and gloss over a long period and which has high film hardness and high flexibility and exhibits excellent adhesion with respect to an epoxy resin anticorrosive coating film. An acrylic polysiloxane resin coating composition of the invention includes (A) a silicone resin, (B) a compound having one or more functional groups capable of undergoing Michael addition reaction with an unsaturated double bond in an acryloyloxy group, and having one or more alkoxy groups bonded to silicon, (C) a trifunctional or polyfunctional aliphatic urethane acrylate oligomer having a cyclic structure, and (D) a bifunctional acrylate monomer having no ether structures (except an ether structure in an acryloyloxy group) and no aromatic rings, the mass ratio of the total amount of (A) and (B) to the total amount of any acrylate oligomer(s) and any acrylate monomer(s) being 40:60 to 70:30.

An object of the present invention is to provide a coating composition capable of forming a coating film which can maintain its appearance and gloss over a long period and which has high film hardness and high flexibility and exhibits excellent adhesion with respect to an epoxy resin anticorrosive coating film. An acrylic polysiloxane resin coating composition of the invention includes (A) a silicone resin, (B) a compound having one or more functional groups capable of undergoing Michael addition reaction with an unsaturated double bond in an acryloyloxy group, and having one or more alkoxy groups bonded to silicon, (C) a trifunctional or polyfunctional aliphatic urethane acrylate oligomer having a cyclic structure, and (D) a bifunctional acrylate monomer having no ether structures (except an ether structure in an acryloyloxy group) and no aromatic rings, the mass ratio of the total amount of (A) and (B) to the total amount of any acrylate oligomer(s) and any acrylate monomer(s) being 40:60 to 70:30.

The present invention particularly relates to synthesizing photo-initiators having poly-oligo-silsesquioxane (POSS) structure and realizing photo-polymerization by using these photo-initiators and simultaneous and in-situ synthesis of Ag nano-particles in polymer matrix comprising POSS structure and obtaining wrinkled surfaces as a result of self-arranging thereof.