A siloxane polymer comprising polysiloxane, silphenylene, isocyanuric acid, and polyether skeletons in a backbone and having an epoxy group in a side chain is provided. A photosensitive resin composition comprising the siloxane polymer and a photoacid generator is coated to form a film which can be patterned using radiation of widely varying wavelength. The patterned film has high transparency and light resistance.

Exemplary methods of forming a silicon-and-carbon-containing material may include flowing a silicon-and-carbon-containing precursor into a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region of the semiconductor processing chamber. The methods may include forming a plasma within the processing region of the silicon-and-carbon-containing precursor. The plasma may be formed at a frequency above 15 MHz. The methods may include depositing a silicon-and-carbon-containing material on the substrate. The silicon-and-carbon-containing material as-deposited may be characterized by a dielectric constant below or about 3.0.

There is provided herein a curable polysiloxane composition comprising a reactive polysiloxane having the general structural formula (I):

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as described herein. There is provided a method of making the polysiloxane. In addition, there is provided a curable composition including the polysiloxane.

There is provided herein a curable polysiloxane composition comprising a reactive polysiloxane having the general structural formula (I):

##STR00001##

as described herein. There is provided a method of making the polysiloxane. In addition, there is provided a curable composition including the polysiloxane.

The present invention provides a silicone skeleton-containing polymer including a silicone skeleton shown by the following formula (1) and having a weight average molecular weight of 3,000 to 500,000.

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This can provide a silicone skeleton-containing polymer that can easily form a fine pattern with a large film thickness, and can form a cured material layer (cured film) that is excellent in various film properties such as crack resistance and adhesion properties to a substrate, electronic parts, and a semiconductor device, particularly a base material used for a circuit board, and has high reliability as a film to protect electric and electronic parts and a film for bonding substrates; and a photo-curable resin composition that contains the polymer, a photo-curable dry film thereof, a laminate using these materials, and a patterning process.

Provided is an antifouling composition including a polysilazane-based compound (A) and a both terminal carboxy-modified silicone (B), the content of the component (B) being from 0.01 to 10 parts by mass based on 100 parts by mass of the total amount of the component (A), and the antifouling composition serves as a sheet-like antifouling layer-forming material. The antifouling composition is able to form a sheet-like antifouling layer having favorable surface state and curability and also having excellent water repellency such that even when a tilt angle is small, water droplets can be slipped off.

Provided is an antifouling composition including a polysilazane-based compound (A) and a both terminal carboxy-modified silicone (B), the content of the component (B) being from 0.01 to 10 parts by mass based on 100 parts by mass of the total amount of the component (A), and the antifouling composition serves as a sheet-like antifouling layer-forming material. The antifouling composition is able to form a sheet-like antifouling layer having favorable surface state and curability and also having excellent water repellency such that even when a tilt angle is small, water droplets can be slipped off.

This invention relates to a resin composition for a hard coating, including a siloxane resin configured such that compounds including an alkoxysilane and an alkoxy metal compound are chemically bound, and to a hard coating film including a hard coating layer formed using the resin composition.

An exterior body panel is provided that includes a substrate having a shape of the panel. A clear topcoat is on the panel. A cured composition of polysilazane moisture cured with interspersed disulfide moieties derived from disulfide monomers overlies the topcoat. A ceramic generating composition kit is also provided. A method for creating a ceramic coating on a topcoat overlying an exterior panel includes combining a first part including a polysilazane and a solvent in which said polysilazane is dissolved, with a second part stored separately from said first part that includes a monomer disulfide to form a reactive gel. The reactive gel cure is applied to the topcoat in ambient air. After allowing sufficient time, moisture cure of the reactive gel occurs and with evaporation of the solvent, the ceramic coating forms with disulfide bonds therein.

According to the present invention, a surface treatment agent which contains a coating composition that contains (A) one or more compounds selected from among organosilane or siloxane compounds represented by formula (1) and partial (hydrolysis) condensation products of the compounds and (B) one or more compounds selected from among silane or siloxane compounds represented by formula (2) and partial (hydrolysis) condensation products of the compounds at a mass ratio of from 50:50 to 90:10 is able to form a cured coating film that has excellently low fingerprint visibility. ##STR00001##
(In formula (1), A represents —C(═O)OR.sup.1, —C(═O)NR.sup.1.sub.2, —C(═O)SR.sup.1 or —P(═O)(OR.sup.1).sub.2; R.sup.1 represents H, an alkyl group, an aryl group or an aralkyl group; Y represents a divalent organic group; R represents an alkyl group or a phenyl group; X represents a hydroxyl group or a hydrolyzable group; and n is 1-3.) ##STR00002##
(In formula (2), Rf represents a perfluoroalkylene group or a divalent perfluoropolyether group.)