Exemplary methods of forming a silicon-and-carbon-containing material may include flowing a silicon-and-carbon-containing precursor into a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region of the semiconductor processing chamber. The methods may include forming a plasma within the processing region of the silicon-and-carbon-containing precursor. The plasma may be formed at a frequency above 15 MHz. The methods may include depositing a silicon-and-carbon-containing material on the substrate. The silicon-and-carbon-containing material as-deposited may be characterized by a dielectric constant below or about 3.0.

A film is provided with void spaces having a porous structure with less cracks and a high proportion of void space as well as having strength. The film with void spaces includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products.

A film is provided with void spaces having a porous structure with less cracks and a high proportion of void space as well as having strength. The film with void spaces includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products.

Provided is an antifouling composition including a polysilazane-based compound (A) and a both terminal carboxy-modified silicone (B), the content of the component (B) being from 0.01 to 10 parts by mass based on 100 parts by mass of the total amount of the component (A), and the antifouling composition serves as a sheet-like antifouling layer-forming material. The antifouling composition is able to form a sheet-like antifouling layer having favorable surface state and curability and also having excellent water repellency such that even when a tilt angle is small, water droplets can be slipped off.

Provided is an antifouling composition including a polysilazane-based compound (A) and a both terminal carboxy-modified silicone (B), the content of the component (B) being from 0.01 to 10 parts by mass based on 100 parts by mass of the total amount of the component (A), and the antifouling composition serves as a sheet-like antifouling layer-forming material. The antifouling composition is able to form a sheet-like antifouling layer having favorable surface state and curability and also having excellent water repellency such that even when a tilt angle is small, water droplets can be slipped off.

The present invention relates to the formation of silazane coatings. The invention provides a polysilazane coating method for limiting fragmentation of polysilazane and an assembly for performing said polysilazane coating method for limiting fragmentation of polysilazane.

The present invention relates to the formation of silazane coatings. The invention provides a polysilazane coating method for limiting fragmentation of polysilazane and an assembly for performing said polysilazane coating method for limiting fragmentation of polysilazane.

Provided are a coating material and a coating method capable of making an antibacterial effect and an antiviral effect of a superficial layer of a coating target compatible for a long period of time. The coating material contains a coating agent in which inorganic polysilazane and an alkyl silicate condensate are dissolved in an inert solvent at a total concentration of 50 to 80 mass%, as a base agent, an inorganic antibacterial agent added to the base agent at a ratio of 0.1 to 5 mass%, and an inorganic antiviral agent added to the base agent at a ratio of 0.1 to 20 mass%.

Steel sheet coating compositions in which polymeric resin or ceramic properties are produced by admixing an aluminum coordinate complex and an anhydrous, encapsulated, aluminum particle paste, a polysilazane as a source of silicon, an organic solvent, an organic synthesis catalyst, and optionally a non-metallic, non-ionic, low-nucleophilic base. The admixed coating is applied to sheet steel prior to hot-stamping in order to inhibit surface formation of iron oxides and to improve steel sheet surface characteristics.

Steel sheet coating compositions in which polymeric resin or ceramic properties are produced by admixing an aluminum coordinate complex and an anhydrous, encapsulated, aluminum particle paste, a polysilazane as a source of silicon, an organic solvent, an organic synthesis catalyst, and optionally a non-metallic, non-ionic, low-nucleophilic base. The admixed coating is applied to sheet steel prior to hot-stamping in order to inhibit surface formation of iron oxides and to improve steel sheet surface characteristics.