C11D3/0073

BOOSTER COMPOSITION FOR CLEANING FERMENTATION EQUIPMENT AND METHODS OF USE

Certain booster compositions and methods of using the booster compositions to clean fermentation equipment are disclosed. The booster compositions are useful in environments with variable, changing, unstable, or limited alkalinity sources found within fermentation equipment.

Macromolecular corrosion (McIn) inhibitors: structures, methods of making and using the same
11578285 · 2023-02-14 · ·

Disclosed are multifunctional compounds represented by structural formula (I): ##STR00001##
methods of producing compounds represented by structural formula (I) and their use in inhibiting corrosion in corrodible material.

AUTOMATIC DISHWASHING COMPOSITION

An automatic dishwashing composition comprising polyepoxysuccinic acid (PESA) or derivatives thereof.

Acidic biodegradable formulation and its use as a surface restorative agent
11555126 · 2023-01-17 ·

The present invention provides a biodegradable formulation and its use as a surfaces restoring agent, said formulation allows a substantial savings when restoring the existing paint on different surfaces, since it mainly cleans and restores the surface or paint contaminated by the environment, damaged due to the sun and the processes of the different industries, in addition to being friendly to the environment, making it a useful technology in any industrial branch that involves cleaning and restoring large areas. It is worth noting that the modifications to the original formula were made to optimize the results in the different applications and improve its biodegradability.

Cleaning agent and preparation method and use thereof

Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-κ dielectric materials, and has a good selectivity.

PHOTORESIST STRIPPER COMPOSITION FOR MANUFACTURING DISPLAY

The present invention relates to a photoresist stripper composition for manufacturing a display, and more particularly, to an integrated photoresist stripper composition which can be used in every process for manufacturing a display. More specifically, the photoresist stripper composition for manufacturing a display according to the present invention can be applied to all of transition metals and oxide semiconductor wirings, and has an excellent ability to remove modified photoresist after a hard bake process, and implant process, and a dry etch process have been performed. In particular, the photoresist stripper composition for manufacturing a display according to the present invention exhibits a corrosion inhibitory effect that has been further specialized for copper (Cu) wiring pattern edge portions which are susceptible to corrosion following dry-etching.

CLEANING LIQUID AND CLEANING METHOD
20220403300 · 2022-12-22 · ·

There is provided a cleaning liquid excellent in cleaning performance and corrosion prevention performance in application as a cleaning liquid for semiconductor substrates that contain cobalt-containing matter and that have undergone a chemical mechanical polishing process. There is also provided a method of cleaning a semiconductor substrate having undergone a chemical mechanical polishing process. The cleaning liquid is for a semiconductor substrate having undergone a chemical mechanical polishing process, and contains an amine compound Y0 that is at least one selected from the group consisting of: a compound Y1 represented by a general formula (Y1); and a compound Y0 having a 1,4-butanediamine skeleton. The cleaning liquid has a pH of 8.0 to 11.0.

##STR00001##

SYSTEMS AND METHODS FOR ADDITION OF FUEL ADDITIVES TO CONTROL TURBINE CORROSION

A gas turbine engine system includes a compressor, gas turbine, and combustor including a plurality of late lean fuel injectors supplied with secondary fuel to its interior. The gas turbine engine system includes a wash system in communication with the late lean fuel injectors. The wash system includes a water source; water pump; anti-corrosion agent fluid source with an anti-corrosion agent including a polyamine corrosion inhibitor; anti-corrosion agent supply piping in fluid communication with the anti-corrosion agent fluid source; mixing chamber receiving water and anti-corrosion agent to produce an anti-corrosion mixture in fluid communication with the mixing chamber and the plurality of late lean fuel injectors. Fluid from the mixing chamber including the water, the anti-corrosion agent fluid source, or a mixture thereof is injected, while the gas turbine engine is off-line, into the combustor at at least one of the plurality of late lean fuel injectors.

Corrosion protection for glassware in a dishwasher
11518959 · 2022-12-06 · ·

A gel which is based on polysaccharide and which includes glass protection additives selected from zinc salts, polyvinyl amide, polyvinyl amine, or combinations thereof. The invention additionally relates to the use of the gel for the corrosion protection of glassware during cleaning and/or rinsing processes, in particular in a dishwasher, and to a method for preventing the corrosion of glassware during cleaning and/or rinsing processes, in particular in a dishwasher.

AQUEOUS SOLUTIONS CONTAINING AMINO CARBOXYLIC ACID CHELATORS

A cleaning composition having an aqueous solutions containing amino carboxylic acid chelators comprising (a) trans-1,2-diaminocyclohexane-N,N,N′,N′-tetraacetic acid monohydrate or salt thereof or (b) iminodiacetic acid or salt thereof may be used as an alternative for phosphates, NTA, and/or EDTA. The cleaning composition is used in industrial, commercial, or residential settings.