Patent classifications
C11D7/267
Nail polish removing composition
The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.
Cleaning agent composition comprising an alkylamide solvent and a fluorine-containing quaternary ammonium salt
A cleaning agent composition for use in removing an adhesive residue, characterized in that the composition contains a quaternary ammonium salt and a composition solvent including a first organic solvent and a second organic solvent; the first organic solvent is an amide derivative represented by formula (Z) (wherein R.sup.0 represents an ethyl group, a propyl group, or an isopropyl group; and each of R.sup.A and R.sup.B represents a C1 to C4 alkyl group); the second organic solvent is a non-amide organic solvent other than the amide derivative; and the composition has a water content less than 4.0 mass %. ##STR00001##
CLEANING AGENT COMPOSITION AND CLEANING METHOD
A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains a lactam compound represented by formula (1) and a ring-structure-having ether compound including at least one species selected from among a cyclic ether compound, a cycloalkyl (chain alkyl) ether compound, a cycloalkyl (branched alkyl) ether compound, and a di(cycloalkyl) ether compound.
##STR00001##
(in formula (1), R.sup.101 represents a C1 to C6 alkyl group; and R.sup.102 represents a C1 to C6 alkylene group.)
CLEANING AGENT COMPOSITION AND CLEANING METHOD
A cleaning agent composition for use in removal of an adhesive residue, the composition containing a quaternary ammonium salt and a solvent, wherein the solvent consists of an organic solvent, and the organic solvent includes an N,N,N′,N′-tetra(hydrocarbyl)urea.
GREEN SOLVENT, LAUNDRY COMPOSITION COMPRISING SAME, AND WASHING MACHINE
A laundry composition according to the present disclosure includes a solvent selected from the group consisting of solketal and derivatives thereof and a fragrance, wherein the fragrance has a log P value of −1.0 to 4.5, and a washing machine includes a washing unit configured to receive a solvent to wash accommodated fibers; a steam collector configured to condense a gaseous phase discharged from the washing unit and supply the same to a solvent collector; and the solvent collector configured to collect a liquid phase discharged from the washing unit and supply the solvent to a solvent supplier, wherein the solvent collector includes a filter unit configured to remove foreign substances from the solvent supplied from at least one of the steam collector and the washing unit; and a solvent storage configured to store the solvent supplied from the filter unit.
Bleach activator having a cationic group and washing or cleaning agent containing same
The present invention relates to compounds which form, under perhydrolysis conditions, certain cationic organic peracids, to the use of said compounds for activating peroxygen compounds in the context of bleaching stains when washing textiles and cleaning hard surfaces, and to washing and cleaning agents that contain said compounds.
Natural oil based cleaners
A composition suitable for cleaning hard surfaces comprising a natural oil solvent and a natural oil thickener is provided.
Compositions and methods for cleaning urethane molds
Compositions and methods for cleaning surfaces, such as for removing residues or other coatings from molds and other industrial parts, such compositions comprising, for example, a first solvent comprising a pyrrolidone such as 2-pyrrolidone, 1-(2-hydroxyethyl)-2-pyrrolidone, or mixture thereof; and a second solvent selected from the group consisting of an imidazole (such as 1,2-dimethylimidizole), an alkylene glycol ether (such as ethylene glycol monobutyl ether or diethylene glycol monobutyl ether, a terpene (such as d-limonene), and mixtures thereof. In various embodiments, such methods are for removing residues from molds used in forming polyurethane parts, wherein residues comprise polyurethane, urethane reactants, and mold release agents. The compositions may be substantially free of 1-methyl-2-pyrrolidone and of 1-ethyl-2-pyrrolidone.
Solution, method of forming resist pattern, and semiconductor device manufacturing method
A solution including an organic solvent (S), and an antioxidant (A), in which an antioxidant (A) includes a tocopherol compound (A1).
Detergents and cleaning agents having improved performance
The present invention relates to the use of substituted bis-4H-pyranonyl compounds in which the 4H-pyranonyl units are combined with heteroalkyl groups, in detergents and cleaning agents, for improving detergent or cleaning performance with respect to bleachable stains.