Patent classifications
C23C14/044
Mask structure for deposition device, deposition device, and operation method thereof
A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.
VANE COATING APPARATUS
To prevent a height difference from being produced between a metal sheath and a paint layer formed on a vane surface of a vane body. A coating apparatus includes a jig adapted to support a guide vane equipped with a metal sheath for covering a leading edge portion; a nozzle adapted to spray paint onto a vane body; a robot adapted to move the nozzle; and a control unit adapted to control a spraying operation of the nozzle and robot. The jig includes a movable covering body adapted to separably cover the metal sheath and cover an exposed portion of adhesive between a lateral edge portion of the metal sheath and the vane surface of the vane body, and a covering body drive unit adapted to move the movable covering body between a state in which the movable covering body covers the metal sheath and a state in which the movable covering body is separated from the metal sheath while covering the metal sheath. The control unit performs control to make transition from a sheath cladding coating mode to a finish coating mode.
SPUTTERING APPARATUS AND FILM FORMING METHOD
A sputtering apparatus includes a first target and a second target that emit sputter particles, a substrate support configured to support a substrate, and a slit plate disposed between the first and the second targets and the substrate and having a slit unit through which the sputter particles pass. The slit unit includes a first slit to the first and the second target side and a second slit to the substrate side. The second slit has a first protrusion and a second protrusion protruding toward the center of the second slit. When the slit unit is viewed from the first target, the first protrusion is hidden. When the slit unit is viewed from the second target, the second protrusion is hidden.
METHOD OF FABRICATING THIN FILM WITH VARYING THICKNESS
A method of fabricating a thin film with a varying thickness includes the steps of providing a shadow mask with an opening, providing a carrier plate, arranging a substrate on the carrier plate, and coating the substrate through the opening whilst rotating the carrier plate relative to the shadow mask. A plurality of zones of the substrates is swept and exposed from arcuate portions of the opening per each turn by a plurality of predetermined exposure times, respectively. The varying thickness of the thin film corresponds to variation of the predetermined exposure times.
VACUUM EVAPORATION DEVICE AND METHOD THEREOF, AND ORGANIC LIGHT-EMITTING DISPLAY PANEL
A vacuum evaporation device, a vacuum evaporation method, and an organic light-emitting display panel are provided. The vacuum evaporation device comprises at least a first evaporation chamber. The first evaporation chamber includes at least one first organic material evaporation source and at least one first metal evaporation source. The at least one first organic material evaporation source is configured to evaporate a first organic material, and the at least one first metal evaporation source is configured to evaporate a first metal material. The at least one first organic material evaporation source and the at least one first metal evaporation source are controlled to perform evaporation simultaneously to generate blend doping of a first organic material and a first metal material on a substrate disposed within the first evaporation chamber.
EVAPORATION APPARATUS AND EVAPORATION METHOD
An evaporation apparatus comprises an evaporation chamber (2) and a moving device (3); the evaporation chamber (2) is provided with an evaporation source (21) therein and is provided with two regulating plates (22) on a side wall thereof; the moving device (3) is disposed on the bottom of the evaporation chamber (2). An evaporation method by use of the evaporation apparatus is also disclosed.
Systems and Methods for Selectively Coating a Substrate Using Shadowing Features
Systems and methods for producing electromagnetic devices are provided. The systems and methods allow for an electromagnetic device having both a substrate (e.g., polymer) and conductive material (e.g., metal) to be manufactured without using masks or other outside objects disposed over a surface (e.g., the substrate) onto which the conductive material is deposited. In one exemplary embodiment, the method includes performing additive manufacturing using a polymer to produce a device having a plurality of interconnected walls and a plurality of frequency selective surface elements, and then coating portions of the device with a conductive material. A plurality of shadowing features are formed as part of one or more of the walls to protect the frequency selective surface elements from being coated by the conductive material. Other methods, and a variety of systems that can result from the disclosed methods, are also provided.
DEVICE EQUIPPED WITH AN ION BEAM SOURCE FOR COATING A SUBSTRATE IN A VACUUM CHAMBER
A device has an ion beam source for coating at least one substrate in a vacuum chamber, which chamber has an inlet that is closable in a pressure-tight manner using a closure apparatus and through which the at least one substrate can be fixed in the vacuum chamber in a substrate holder in a substrate holder receptacle, and can be removed therefrom once the coating process has finished, wherein the substrate holder, together with the substrate, in the substrate holder receptacle is designed to be reversibly movable in a translational manner inside the vacuum chamber, between turning points that are in particular settable, using a motor-drivable transport apparatus of the device.
DEPOSITION MASK, APPARATUS FOR MANUFACTURING DISPLAY APPARATUS, AND METHOD OF MANUFACTURING DISPLAY APPARATUS
A deposition mask extending in a first direction may include: a pattern portion including a plurality of pattern holes; and a clamping portion including a protrusion portion to be attached to the clamp and an indentation portion formed in a direction toward the pattern portion, wherein the pattern portion may include a blocking portion that at least partially overlaps the protrusion portion in the first direction and has an area gradually decreasing in a second direction from the protrusion portion toward the indentation portion, the second direction crossing the first direction.
Display device
A display device includes: an insulating layer defining a pixel region with a first extending portion and a second extending portion, the first extending portion extending in a direction along a first side of the pixel region, the second extending portion extending in a direction along a second side of the pixel region, the second side crossing the first side; and an organic electroluminescent layer formed in the pixel region, on the first extending portion, and on the second extending portion. A width of the first extending portion in a plan view is smaller than a width of the second extending portion.