The purpose of the present invention is to improve surface scratch problems occurring in the manufacturing process and handling of an adherend on which stamping foil is applied, prevent a problem in which a transfer layer of stamping foil is separated at a portion that is bent when the adherend is folded, secure binding force in printing with various inks, and fundamentally prevent powder generated during cutting according to a product standard in a stamping foil manufacturing process. To this end, the stamping foil of the present invention comprises: (a) a base film which is removed after stamping transfer; (b-1) a wear-resistant release layer formed on the base film and containing a polyurethane-based release agent, an acrylic resin, and an ethene-based polymer additive, or (b-2) (i) a polyurethane-based release layer formed on the base film and (ii) a wear-resistant layer formed on the polyurethane-based release layer and containing an acrylic matrix resin and an ethene-based polymer additive; (c) a moisture penetration-preventing and metal-deposited heat-resistant cured coating layer; (d) a metal deposition layer formed on the moisture penetration-preventing cured coating layer; and (e) optionally, a thick film protective layer formed on the metal deposition layer, for preventing the corrosion of the metal deposition layer.

A cutting tool includes a substrate; and a coating film, wherein the coating film includes a multilayer structure layer having first unit layer(s) and second unit layer(s), the first unit layer(s) and the second unit layer(s) are alternately layered, under a condition X-ray diffraction intensities of different planes in the multilayer structure layer are respectively represented by I.sub.(200), I.sub.(111), and I.sub.(220), the following formula 0.6≤I.sub.(200)/{I.sub.(200)+I.sub.(111)+I.sub.(220)}, the first unit layer(s) has a NaCl-like structure in which an interplanar spacing d.sub.1c in a c-axis direction is larger than an interplanar spacing d.sub.1a in an a-axis direction, the second unit layer(s) has a NaCl-like structure in which an interplanar spacing d.sub.2c in the c-axis direction is smaller than an interplanar spacing d.sub.2a in the a-axis direction, and the following formulas are satisfied as well 1≤d.sub.1a/d.sub.2a≤1.02, 1.01≤d.sub.1c/d.sub.2c≤1.05, and d.sub.1a/d.sub.2a<d.sub.1c/d.sub.2c.

Provided is a reflective mask blank which includes an absorber film.

The reflective mask blank of the present invention is a reflective mask blank including a multilayer reflective film and a thin film for pattern formation in this order on a main surface of a substrate, in which the thin film contains tin, tantalum, niobium, and oxygen, and the oxygen deficiency rate of the thin film is 0.15 or more and 0.28 or less.

A hydrogen-free carbon film polymer lubricating material and a preparation method and use thereof are disclosed. In the method, a graphite target is used as the target material, and a magnetron sputtering deposition is performed on a surface of the polymer substrate, thereby physically depositing and forming a hydrogen-free carbon film on the surface of the polymer substrate, thereby obtaining a hydrogen-free carbon film polymer lubricating material.

Thermoregulated multilayer material characterized in that it comprises at least one substrate and one thermoregulated layer, said thermoregulated multilayer material having: for λ radiation of between 0.25 and 2 μm, an absorption coefficient αm≥0.8; and, for incident λ radiation of between 7.5 and 10 μm, a reflection coefficient ρm: ρm≥0.85, when the temperature T of said multilayer material 1 is ≤100° C.; ρm between 0.3 and 0.85, when the temperature T of said multilayer material is between 0 and 400° C.

An ARC evaporator comprising: a cathode assembly comprising a cooling plate (11), a target (1) as cathode element, an electrode arranged for enabling that an arc between the electrode and the front surface (1A) of the target (1) can be established—a magnetic guidance system placed in front of the back surface (1 B) of the target (i) comprising means for generating one or more magnetic whereas: —the borders of the cathode assembly comprise a surrounding shield (15) made of ferromagnetic material, wherein the surrounding shield (15) has a total height (H) in the transversal direction, said total height (H) including a component (C) for causing a shielding effect of magnetic field lines extending in any longitudinal directions, establishing in this manner the borders of the cathode assembly as limit of the extension of the magnetic field lines in any longitudinal direction.

Disclosed is a coating made of an organic material on a mold for glass molding. The coating comprises Cr.sub.xW.sub.yN.sub.(1-x-y), where 0.15<x<0.4, and 0.2≤y≤0.45. The coating has excellent high temperature resistance and anti-adhesion properties, thus being a promising coating material for molds.

Embodiments described herein provide for post deposition anneal of a substrate, having an amorphous carbon layer deposited thereon, to desirably reduce variations in local stresses thereacross. In one embodiment, a method of processing a substrate includes positioning a substrate, having an amorphous carbon layer deposited thereon, in a first processing volume, flowing an anneal gas into the first processing volume, heating the substrate to an anneal temperature of not more than about 450° C., and maintaining the substrate at the anneal temperature for about 30 seconds or more. Herein, the amorphous carbon layer was deposited on the substrate using a method which included positioning the substrate on a substrate support disposed in a second processing volume, flowing a processing gas into the second processing volume, applying pulsed DC power to a carbon target disposed in the second processing volume, forming a plasma of the processing gas, and depositing the amorphous carbon layer on the substrate.

A film forming method includes: providing the substrate into the processing container; forming a metal-based film on the substrate within the processing container; and subsequently, supplying a Si-containing gas into the processing container in a state in which the substrate is provided within the processing container.

A fabrication method of a surface acoustic wave (SAW) filter includes obtaining a piezoelectric substrate, forming a back electrode on a first portion of the piezoelectric substrate, forming a first dielectric layer on the first portion of the piezoelectric substrate, forming a trench in the first dielectric layer, forming a second dielectric layer on the first dielectric layer formed with the trench, forming a third dielectric layer on the second dielectric layer, removing a second portion of the piezoelectric substrate to obtain a piezoelectric layer, forming an interdigital transducer (IDT) on the piezoelectric layer, and etching and releasing a portion of the first dielectric layer surrounded by the trench to form a cavity below the back electrode.