Provided is a magnetic recording medium having a large magnetocrystalline anisotropy constant K.sub.u and a high coercivity H.sub.c as well as a sputtering target used for producing such a magnetic recording medium.

A Pt-oxide-based sputtering target consists of 60 vol % or more and less than 100 vol % of a Pt-base alloy phase and more than 0 vol % and 40 vol % or less of an oxide, where the Pt-base alloy phase contains 50 at % or more and 100 at % or less of Pt.

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.

In a surface-coated cutting tool in which a hard coating layer having a total layer thickness of 0.5 to 10 μm is deposited on a surface of a tool body made of WC-based cemented carbide or TiCN-based cermet, the hard coating layer has an alternately laminated structure of A layers and B layers, in a case where the A layer is: (Al.sub.aTi.sub.1-a)N (here, a is in atomic ratio), the A layer satisfies 0.50≦a<0.75, in a case where the B layer is: (Al.sub.bTi.sub.1-b)N (here, b is in atomic ratio), the B layer satisfies 0.75≦b≦0.95, and when a layer thickness per layer of the A layers is represented by x (nm) and a layer thickness per layer of the B layers is represented by y (nm), 5y≧x≧3y and 250 (nm)≧x+y≧100 (nm) are satisfied.

A process for the production of an optically selective coating of a receiver substrate of a suitable material for solar receiver devices particularly suitable for operating at high temperatures, more specifically for receiver tubes of linear parabolic trough, which comprises: deposition of a layer reflecting infrared radiation consisting of a high-melting metal on a heated receiver substrate of a suitable material; annealing under the same temperature and pressure conditions as the deposition of the reflecting layer; deposition on the high-melting metal of one or more layers of metal-ceramic composite materials (CERMET), wherein the metal is W and the ceramic matrix is YPSZ (“Yttria-Partially Stabilized Zirconia”); deposition on the cermet of an antireflection layer; annealing under the same temperature and pressure conditions as the depositions of the cermet and antireflection layers.

A method for coating stainless steel press plates includes preparing the stainless steel press plate for coating and coating the stainless steel press plate with a diboride doped with 1%-5% by weight aluminum to produce a diboride-aluminum coating. The step of coating includes applying the diboride-aluminum coating to a stainless steel press plate using a magnetron sputter coating system.

A solar selective coating includes a substrate, a cermet layer having nanoparticles therein deposited on the substrate, and an anti-reflection layer deposited on the cermet layer. The cermet layer and the anti-reflection layer may each be formed of intermediate layers. A method for constructing a solar-selective coating is disclosed and includes preparing a substrate, depositing a cermet layer on the substrate, and depositing an anti-reflection layer on the cermet layer.

Coated tool comprising a coated surface, the coated surface comprising a substrate having a surface on which a coating is deposited, wherein the substrate is made of a material comprising cobalt, and wherein the coating comprises at least one boron-comprising layer, wherein the at least one boron-comprising layer comprises Al and the boron comprised in this layer is present as boride, thereby the boron-comprising layer is able to form further layers for providing a diffusion barrier layer effect, in particular for stopping diffusion of cobalt from the substrate surface to the coating, when the coated tool or the coated surface is exposed to temperatures in a range between approximately 600 and 1200° C.

The present invention discloses an Er doped Ga.sub.2O.sub.3 film, together with its preparation method and the application in the field of luminescence. The preparation method contains steps of: (1) the films are deposited by means of Radio-Frequency magnetron sputtering onto the heated substrates after the pre-sputtering for at least 5 minutes, selecting Er doped Ga.sub.2O.sub.3 target or Er and Ga.sub.2O.sub.3 targets, with the ambient of Ar and O.sub.2; (2) the films as prepared in step (1) are thermally treated at the temperature higher than 300° C. in the ambient of O.sub.2 or N.sub.2, in order to optically activate Er.sup.3+ and crystalize Ga.sub.2O.sub.3 hosts meanwhile, followed by natural cooling, obtaining the Er doped Ga.sub.2O.sub.3 films as described. The preparation technology of the present invention is simple, with a good process compatibility. It is believed that the present invention will be widely used in the field of silicon-based integrated light sources, semiconductor luminescence, optical communication, with broad application prospects.

The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.

A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is ½ or more, and wherein the sputtering target contains Nb.sub.2O.sub.5 as a metal oxide component.