Patent classifications
C23F1/28
METHOD OF PROCESSING POLYCRYSTALLINE DIAMOND MATERIAL
A method of processing a polycrystalline diamond (PCD) material having a non- diamond phase with a catalyst/solvent material includes leaching an amount of the catalyst/solvent from the PCD material by exposing at least a portion of the PCD material to a leaching mixture, the leaching mixture comprising hydrofluoric acid at a molar concentration of between 12 M to around 28 M, nitric acid at a molar concentration of between around 3 M to around 10 M, and water.
METAL PLATE
The object of the present invention is to provide a metal plate capable of manufacturing a deposition mask in which dispersion of positions of through-holes is restrained. A thermal recovery rate is defined as parts per million of a difference a distance between to measurement points on a sample before a heat treatment and a distance therebetween after the heat treatment, relative to the distance therebetween before the heat treatment. In this case, an average value of the thermal recovery rates of the respective samples is not less than −10 ppm and not more than +10 ppm, and (2) a dispersion of the thermal recovery rates of the respective samples is not more than 20 ppm.
Metal mask base, metal mask and method for producing metal mask
A metal mask substrate includes a metal obverse surface configured such that a resist is placed on the obverse surface. The obverse surface has a three-dimensional surface roughness Sa of less than or equal to 0.11 μm. The obverse surface also has a three-dimensional surface roughness Sz of less than or equal to 3.17 μm.
Protective leaching mask assemblies and methods of use
Embodiments of the invention relate generally to overmolded protective leaching masks, and methods of manufacturing and using the same for leaching superabrasive elements such as polycrystalline diamond elements. In an embodiment, a protective leaching mask assembly includes a superabrasive element including a central axis and a superabrasive table, and a protective mask overmolded onto at least a portion of the superabrasive element. The protective mask includes a base portion and at least one sidewall extending from the base portion and defining an opening generally opposite the base portion. The at least one sidewall includes an inner surface configured to abut with a selected portion of the superabrasive element being chemically resistant to a leaching agent and an outer surface sloping at an oblique angle relative to the central axis.
Metal plate
The object of the present invention is to provide a metal plate capable of manufacturing a deposition mask in which dispersion of positions of through-holes is restrained. A thermal recovery rate is defined as parts per million of a difference a distance between to measurement points on a sample before a heat treatment and a distance therebetween after the heat treatment, relative to the distance therebetween before the heat treatment. In this case, an average value of the thermal recovery rates of the respective samples is not less than −10 ppm and not more than +10 ppm, and (2) a dispersion of the thermal recovery rates of the respective samples is not more than 20 ppm.
PROTECTIVE LEACHING MASK ASSEMBLIES AND RELATED METHODS
Embodiments of the invention relate generally to protective leaching masks, and methods of manufacturing and using the same for leaching superabrasive elements such as polycrystalline diamond elements. In an embodiment, a protective leaching mask assembly includes a superabrasive element including a central axis and a superabrasive table, and a protective mask formed to protect at least a portion of the superabrasive element. The protective mask includes a base portion and at least one sidewall extending from the base portion and defining an opening generally opposite the base portion. The at least one sidewall includes an inner surface configured to abut with a selected portion of the superabrasive element being chemically resistant to a leaching agent and an outer surface sloping at an oblique angle relative to the central axis.
METAL COATING METHOD
The present invention aims to provide a metal coating method whereby a paint can be applied directly, easily, with high adhesion, and with cost increases suppressed, to the surface of titanium and other metals that have a hard passivated coating on the surface thereof. This method uses paint to coat a metal that has the surface thereof coated in a passivated coating and comprises: an etching step in which the passivated coating is removed using an etching solution and the surface is exposed; a diluent coating step in which, after the etching step, a diluent capable of diluting the paint is coated on the surface that is in a liquid-coated state; and a painting step in which the surface is coated in paint after the diluent coating step.
METAL COATING METHOD
The present invention aims to provide a metal coating method whereby a paint can be applied directly, easily, with high adhesion, and with cost increases suppressed, to the surface of titanium and other metals that have a hard passivated coating on the surface thereof. This method uses paint to coat a metal that has the surface thereof coated in a passivated coating and comprises: an etching step in which the passivated coating is removed using an etching solution and the surface is exposed; a diluent coating step in which, after the etching step, a diluent capable of diluting the paint is coated on the surface that is in a liquid-coated state; and a painting step in which the surface is coated in paint after the diluent coating step.
Chemical solution and method for treating substrate
The present invention provides a chemical solution having excellent storage stability and excellent defect inhibition performance. The present invention also provides a method for treating a substrate. The chemical solution according to an embodiment of the present invention is a chemical solution used for removing a transition metal-containing substance on a substrate. The chemical solution contains one or more kinds of halogen oxoacids selected from the group consisting of a halogen oxoacid and a salt thereof and one or more kinds of specific anions selected from the group consisting of SO.sub.4.sup.2−, NO.sub.3.sup.−, PO.sub.4.sup.3−, and BO.sub.3.sup.3−. In a case where the chemical solution contains one kind of the specific anion, a content of one kind of the specific anion is 5 ppb by mass to 1% by mass with respect to a total mass of the chemical solution. In a case where the chemical solution contains two or more kinds of the specific anions, a content of each of two or more kinds of the specific anions is equal to or lower than 1% by mass with respect to the total mass of the chemical solution, and a content of at least one of two or more kinds of the specific anions is equal to or higher than 5 ppb by mass with respect to the total mass of the chemical solution.
Web support, production method therefor, and patterning method
A web support with a high degree of patterning freedom and excellent durability, a production method therefor, and a patterning method. The web support is used when applying a pattern to a nonwoven substance by jetting a high-pressure water stream on a web. The web support production method comprises: a step of preparing a flat metal base material; a step for forming, by etching, a first water conduction hole and second water conduction hole that pass through the front surface of the base material to the back surface, and a recess on the front surface of the base material that includes the first water conduction hole and that corresponds to the pattern; and a step for forming the base material into a cylindrical main body section by welding the edges of the base material to each other.