The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.

The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.

A fluid composition suitable for chemical mechanical polishing a substrate can in include a multi-valent metal borate, at least one oxidizer, and a solvent. The fluid composition can be essentially free of abrasive particles and may achieve a high material removal rate and excellent surface finish.

A chemical polishing bath for polishing a part made of aluminum or of aluminum alloy, or a portion of such a part, which bath includes an oxidizing agent capable of attacking the aluminum, chosen from nitric acid, hydrogen peroxide, permanganate, or a mixture thereof, at a concentration between 1.2 and 3.0 mol/L. The polishing bath also includes a fluoride complexing agent capable of forming a complex with the oxidized aluminum, at a concentration between 0.3 and 1.6 mol/L; a catalyst (Cu); and phosphoric acid at a concentration between 10.10 and 14.30 mol/L and also sulfuric acid at a concentration between 1.50 and 3.60 mol/L. The bath is particularly suitable for polishing parts resulting from additive manufacturing (3D printing).

A chemical polishing bath for polishing a part made of aluminum or of aluminum alloy, or a portion of such a part, which bath includes an oxidizing agent capable of attacking the aluminum, chosen from nitric acid, hydrogen peroxide, permanganate, or a mixture thereof, at a concentration between 1.2 and 3.0 mol/L. The polishing bath also includes a fluoride complexing agent capable of forming a complex with the oxidized aluminum, at a concentration between 0.3 and 1.6 mol/L; a catalyst (Cu); and phosphoric acid at a concentration between 10.10 and 14.30 mol/L and also sulfuric acid at a concentration between 1.50 and 3.60 mol/L. The bath is particularly suitable for polishing parts resulting from additive manufacturing (3D printing).

Provided are a method for etching a metal or metal oxide without using a reagent, etc., that affects the environment, a method for smoothing a surface of a metal or metal oxide on an atomic level, and a method for patterning on an atomic level. Etching of a metal or metal oxide, or smoothing of a surface of a metal or metal oxide is possible using ozone water in which only ozone is dissolved. Patterning can also be performed by providing a metal that does not dissolve in the ozone water as a resist on a metal or metal oxide that can be etched by ozone water in which only ozone is dissolved, and etching using the ozone water.

Provided are a method for etching a metal or metal oxide without using a reagent, etc., that affects the environment, a method for smoothing a surface of a metal or metal oxide on an atomic level, and a method for patterning on an atomic level. Etching of a metal or metal oxide, or smoothing of a surface of a metal or metal oxide is possible using ozone water in which only ozone is dissolved. Patterning can also be performed by providing a metal that does not dissolve in the ozone water as a resist on a metal or metal oxide that can be etched by ozone water in which only ozone is dissolved, and etching using the ozone water.

An aluminum alloy is described and has compositions with mass percentage content consisting of: 5.0%-5.4% Zn; 0.9%-1.2% Mg; Cu<0.05%; Si<0.05%; Fe<0.1%; Mn<0.05%; Zr<0.1%; Ti<0.05%; other impurities <0.15%; and the remaining composition being Al. An anodizing method of the aluminum alloy described above is described and has: a degreasing treatment, a first black-film stripping treatment, a chemical polishing treatment, a second black-film stripping treatment, an anodizing treatment, a hole filling treatment and a drying treatment which are performed in turn. The aluminum alloy has a higher strength while eliminating an influence of a formed compound phase on a material texture.

An aluminum alloy is described and has compositions with mass percentage content consisting of: 5.0%-5.4% Zn; 0.9%-1.2% Mg; Cu<0.05%; Si<0.05%; Fe<0.1%; Mn<0.05%; Zr<0.1%; Ti<0.05%; other impurities <0.15%; and the remaining composition being Al. An anodizing method of the aluminum alloy described above is described and has: a degreasing treatment, a first black-film stripping treatment, a chemical polishing treatment, a second black-film stripping treatment, an anodizing treatment, a hole filling treatment and a drying treatment which are performed in turn. The aluminum alloy has a higher strength while eliminating an influence of a formed compound phase on a material texture.

The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.