The present invention relates to metals or metal alloys comprising a protective silicate glass-like coating, and methods for coating the metals or metal alloys. The methods comprise removal of any existing oxide layer from the metal or metal alloy, formation of a new oxide layer on the metal or metal alloy using chemical passivation or exposure to a gaseous oxidising environment, coating the oxidised metal or metal alloy with an aqueous silicate solution, and curing the coating.

The present invention aims to provide a metal coating method whereby a paint can be applied directly, easily, with high adhesion, and with cost increases suppressed, to the surface of titanium and other metals that have a hard passivated coating on the surface thereof. This method uses paint to coat a metal that has the surface thereof coated in a passivated coating and comprises: an etching step in which the passivated coating is removed using an etching solution and the surface is exposed; a diluent coating step in which, after the etching step, a diluent capable of diluting the paint is coated on the surface that is in a liquid-coated state; and a painting step in which the surface is coated in paint after the diluent coating step.

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.

This invention provides a liquid composition that removes titanium nitride from a substrate without corroding tungsten or a low-k interlayer dielectric also present on said substrate. Said liquid composition has a pH between 0 and 4, inclusive, and contains the following: at least one oxidizing agent (A) selected from the group consisting of potassium permanganate, ammonium peroxodisulfate, potassium peroxodisulfate, and sodium peroxodisulfate; a fluorine compound (B); and a tungsten-corrosion preventer (C). The tungsten-corrosion preventer (C) either contains at least two different compounds selected from a group of compounds (C1) consisting of alkylamines, salts thereof, fluoroalkylamines, salts thereof, and the like or contains at least one compound selected from said group of compounds (C1) and at least one compound selected from a group of compounds (C2) consisting of polyoxyalkylene alkylamines, polyoxyalkylene fluoroalkylamines, and the like. The mass concentration of potassium permanganate in the abovementioned oxidizing agent (A) is between 0.001% and 0.1%, inclusive, and the mass concentration of the abovementioned fluorine compound (B) is between 0.01% and 1%, inclusive.

A dental implant made of a material comprising titanium. The implant includes a head portion having a non-rotational feature, a lowermost end opposing the head portion, and a threaded bottom portion for engaging bone between the head portion implant and the lowermost end. The implant further includes a nanocrystalline surface formed on at least a portion of the implant. The nanocrystalline surface includes discrete nanocrystals deposited on a roughened surface of the implant. The roughened surface includes at least one of a grit-blasted surface or an acid-etched surface. A portion of the roughened surface is exposed between at least some of the discrete nanocrystals such that the exposed roughened portion between the discrete nanocrystals is capable of contacting bone.

A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises the act of immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce a nanoscale roughened surface consisting of nanopitting superimposed on the microscale roughened surface. The nanoscale roughened surface has a property that promotes osseointegration.

The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one of the used sputtering target and the scrap material after the surface treatment to form an ingot; and manufacturing a sputtering target by subjecting the ingot to forging, rolling, heat treating, and machining.

The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one of the used sputtering target and the scrap material after the surface treatment to form an ingot; and manufacturing a sputtering target by subjecting the ingot to forging, rolling, heat treating, and machining.

A coated titanium material includes a titanium material and a coating film formed on a surface of the titanium material. A Ti-based oxide is included in an interface between the titanium material and the coating film. The Ti-based oxide is one or both rutile type TiO.sub.2 and Ti.sub.2O.sub.3. In a case where a cut surface of the coating film is formed by using a SAICAS method under conditions that a horizontal speed is 2 μm/s and a vertical speed is 0.1 μm/s, on the cut surface, an area percentage of the Ti-based oxide is 30.0% or more in a region having a distance of 15 μm from a reference line specified on the basis of a boundary line, which is an intersection line between the cut surface and the interface, to a coating film side.

An acidic treatment liquid processing apparatus includes: a tank having an interior space; a diaphragm permeable to a metal cation and separating the interior space of the tank into a first chamber and a second chamber; a first electrode disposed in the first chamber; a second electrode disposed in the second chamber; a power supply configured to apply a voltage while using the first electrode as an anode and the second electrode as a cathode; a first liquid passing part configured to pass an acidic treatment liquid containing a dichromate ion and a metal cation into the first chamber; and a second liquid passing part configured to pass an acid aqueous solution into the second chamber.