A method for electro-depositing a radioactive material onto a metal substrate is disclosed. This is particularly well-suited for true random number generators. The method includes (a) at least partially masking the metal substrate to expose a metallic surface on the metal substrate; (b) connecting the metal substrate to a cathode of a current source; (c) submersing the exposed metallic surface into a solution containing radioactive metal ions, wherein the solution is connected to an anode of the current source; (d) removing the exposed metallic surface from the solution; (e) removing the solution from the exposed metallic surface; (f) measuring the amount of radioactivity emitted from the exposed metallic surface; and (g) repeating steps (c) through (f) until the amount of radioactivity measured in step (f) stabilizes relative to a previous measurement.

A method for manufacturing appliques on a dial for a timepiece.

Articles prepared by additive manufacturing of preforms that are coated by electrodeposition of nanolaminate materials, and methods of their production are described.

A method for manufacturing a printed wiring board includes forming a seed layer on a surface of a resin insulating layer, applying liquid resist on the seed layer formed on the surface of the resin insulating layer, drying the liquid resist applied on the seed layer such that a resist layer is formed on the seed layer, applying pressure and heat simultaneously to an entire surface of the resist layer formed on the seed layer, forming a plating resist on the seed layer from the resist layer formed on the seed layer using a photographic technology, forming an electrolytic plating film on part of the seed layer exposed from the plating resist, removing the plating resist from the seed layer, and removing part of the seed layer exposed from the electrolytic plating film.

A method for processing a smooth or structured surface of a pressing element is described, the method comprising the steps of: a) chrome-plating said surface of the pressing element so as to form a coating comprising a first layer having chrome grains oriented in a first direction and a second layer overlapping said first layer, said second layer having chrome grains oriented in a second direction which is different from said first direction; b) applying a mask on the chrome-plated surface of the pressing element by means of a digital printing technology; c) chemically treating the chrome-plated surface of the pressing element on which said mask was applied, said chemical treatment being performed so as to partially remove said chrome coating in the exposed areas of said chrome-plated surface, i.e. in the areas not being protected by said mask, and d) removing said mask from the chrome-plated surface of the pressing element, obtaining a smooth or structured surface having a coating with areas having a different grade of gloss and colour.

A pressing element obtained by the above processing method and a method for the production of coated panels, such as panels for furniture or floors, bearing a predetermined decorative pattern which uses such pressing element are also described.

Nanotwinned copper and non-nanotwinned copper may be electroplated to form mixed crystal structures such as 2-in-1 copper via and RDL structures or 2-in-1 copper via and pillar structures. Nanotwinned copper may be electroplated on a non-nanotwinned copper layer by pretreating a surface of the non-nanotwinned copper layer with an oxidizing agent or other chemical reagent. Alternatively, nanotwinned copper may be electroplated to partially fill a recess in a dielectric layer, and non-nanotwinned copper may be electroplated over the nanotwinned copper to fill the recess. Copper overburden may be subsequently removed.

Methods are provided for designing a microchannel layout for a flow field of a bipolar plate. The methods include defining a fluid flow optimization domain with boundary conditions and loads. Using a gradient-based algorithm together with computational fluid dynamics, the domain is then optimized for minimum flow resistance. The methods include setting the minimum inverse permeability to a non-zero value, and obtaining a grayscale design and fluid velocity field. Using Gray-Scott reaction diffusion equations with the grayscale design and fluid velocity field, the method includes obtaining a microchannel layout. The microchannel layout is then incorporated as a pattern for the flow field of the bipolar plate. In various aspects, anisotropic microchannels are provided; they may be formed using at least one of an additive manufacturing technique, a metal inverse opal electroplating technique, and a hybrid combination thereof.

An encapsulated polymeric article is disclosed. The encapsulated polymeric article may include a polymer substrate and a metallic outer shell at least partially encapsulating the polymer substrate. The encapsulated polymeric article may be fabricated by a method comprising: 1) providing a mandrel in a shape of the encapsulated polymeric article, 2) shaping the metallic outer shell on the mandrel, 3) removing the mandrel from the metallic outer shell, and 4) molding the polymeric substrate into the metallic outer shell through a port formed in the metallic outer shell to provide the encapsulated polymeric article.

Various inventions are disclosed in the microchip manufacturing arts. Conductive pattern formation by semi-additive processes are disclosed. Further conductive patterns and methods using activated precursors are also disclosed. Aluminum laminated surfaces and methods of circuit formation therefrom are further disclosed. Circuits formed on an aluminum heat sink are also disclosed. The inventive subject matter further discloses methods of electrolytic plating by controlling surface area of an anode.

Provided is an apparatus for electro-forming. The apparatus for electro-forming includes a plating bath which is a space where a substrate is plated and a clamp disposed within the plating bath and configured to grasp the substrate disposed in a horizontal direction. The apparatus for electro-forming further includes an assembly including an anode spaced above the substrate and connected to an external power supply and a plating solution supply unit spaced above the substrate and configured to supply a plating solution. The apparatus for electro-forming also includes a driving unit configured to reciprocate the assembly in a horizontal direction at a distance from the substrate. The assembly further includes an insulator between the anode and the plating solution supply unit.