A method for treating a textile material web for reducing a gas-permeability of the textile material web. The method includes providing the textile material web with a first side having a planar configuration and a second side having a planar configuration, the first side being opposite to the second side, transporting the textile material web in an advancing direction, and reducing the gas permeability of the textile material web. The gas permeability of the textile material web is reduced by applying water to the first side and/or the second side of the textile material web, guiding the textile web material through a first treatment gap which is formed by a first treatment roller and a first counter tool, and in the first treatment gap, pressure treating the textile material web and thermally treating the first side and/or the second side of the textile material web.

The present invention relates to an applicator apparatus for dyeing and finishing in which diagonal application grooves are formed in a longitudinal direction in an outer circumferential surface of a roller used to apply a chemical and reverse diagonal application grooves are formed to intersect the formed diagonal application grooves to allow the chemical to be evenly discharged to an outer circumferential surface of a pickup roller so that fabric dyeing efficiency is increased. The applicator apparatus for dyeing and finishing includes a storage tank (100) in which a chemical is accommodated, a guide roller (200) configured to guide a fabric (f) to be conveyed, a first pickup roller (300) which is installed at an upper portion of one side of the storage tank (100) and has an outer circumferential surface coming in contact with a surface of the fabric (f) being conveyed along the guide roller (200) and a lower portion dipped in the chemical accommodated in the storage tank (100) so that the chemical is attached to the outer circumferential surface and conveyed due to forward rotation of the first pickup roller (300), and an application roller (400) which is installed at an upper side of the first pickup roller (300), rotates in a reverse direction, and has diagonal application grooves (410) formed along an outer circumferential surface and reverse diagonal application grooves (420) formed to intersect the formed diagonal application grooves (410) so that the chemical conveyed along the first pickup roller (300) enters and passes through the formed diagonal application grooves (410) and reverse diagonal application grooves (420) and is guided to be evenly discharged to the outer circumferential surface of the first pickup roller (300) and applied to the fabric (f).

Methods and apparatuses for masking the edges of a substrate when performing direct or reverse gravure coating using a kiss-coat configuration, particularly useful for in-line coating of biaxially oriented polymeric films. The methods and apparatuses include a masking plate configured to prevent the edge of a portion of a substrate from contacting a gravure roll, the masking plate includes a top portion having a Rockwell B hardness equal to or greater than 80, and a thickness of between 0.03125 inches and 0.375 inches. This masking plate prevents build-up of coating on the edges of the substrate which otherwise can cause film orientation production instabilities such as film breaks, sticking to tenter clips, and/or edge trim recycling incompatibilities. The masking plate provides a masking method that is effective and durable, minimizing production downtime and maintenance.