A system for distributing wireless networking components in a venue. The system includes panels that define a floor surface. The panels each have a planar configuration with an upper surface opposite a lower surface. The panels include a material that is transparent to radio waves, and the panels define a storage space below the panels and the storage space may be used to store and distribute wireless networking component.

A system for distributing wireless networking components in a venue. The system includes panels that define a floor surface. The panels each have a planar configuration with an upper surface opposite a lower surface. The panels include a material that is transparent to radio waves, and the panels define a storage space below the panels and the storage space may be used to store and distribute wireless networking component.

A system for distributing wireless networking components in a venue. The system includes panels that define a floor surface. The panels each have a planar configuration with an upper surface opposite a lower surface. The panels include a material that is transparent to radio waves, and the panels define a storage space below the panels and the storage space may be used to store and distribute wireless networking component.

A system for distributing wireless networking components in a venue. The system includes panels that define a floor surface. The panels each have a planar configuration with an upper surface opposite a lower surface. The panels include a material that is transparent to radio waves, and the panels define a storage space below the panels and the storage space may be used to store and distribute wireless networking component.

A system for distributing wireless networking components in a venue. The system includes panels that define a floor surface. The panels each have a planar configuration with an upper surface opposite a lower surface. The panels include a material that is transparent to radio waves, and the panels define a storage space below the panels and the storage space may be used to store and distribute wireless networking component.

The present disclosure provides a method, system, and fabrication facility that eliminates or substantially reduces process-limiting vibrations within a high-precision device manufacturing facility, wherein an elevated structure supports high-precision device manufacturing equipment and provides vibration reduction spacing between a floor and an upper surface of said elevated structure.

The present disclosure provides a method, system, and fabrication facility that eliminates or substantially reduces process-limiting vibrations within a high-precision device manufacturing facility, wherein an elevated structure supports high-precision device manufacturing equipment and provides vibration reduction spacing between a floor and an upper surface of said elevated structure.

A method to improve vibration isolation in semiconductor process level inhibits vibration frequencies transmitted through building structure from production tools, pumps, compressors, chillers, AHUs (Air Handling Units), and footfalls traffic on raised floor system on to tool pedestals and pads from affecting semiconductor fabrication processes. Rapid advancement and technological evolution in semiconductor industry foresee the imminent requirements for decrease in semiconductor chip node sizes to single digit nanometer. Dealing with such advancements, the tool pedestal systems are also requiring tighter specifications for stiffness and vibration isolation/reduction. Some key tools used in the semiconductor fabrication process require improved barrier from electromagnetic interference (EMI), as the disturbance from EMI degrade the performance of semiconductor processing tools that are key to the fabrication process and production yield rate.

A method to improve vibration isolation in semiconductor process level inhibits vibration frequencies transmitted through building structure from production tools, pumps, compressors, chillers, AHUs (Air Handling Units), and footfalls traffic on raised floor system on to tool pedestals and pads from affecting semiconductor fabrication processes. Rapid advancement and technological evolution in semiconductor industry foresee the imminent requirements for decrease in semiconductor chip node sizes to single digit nanometer. Dealing with such advancements, the tool pedestal systems are also requiring tighter specifications for stiffness and vibration isolation/reduction. Some key tools used in the semiconductor fabrication process require improved barrier from electromagnetic interference (EMI), as the disturbance from EMI degrade the performance of semiconductor processing tools that are key to the fabrication process and production yield rate.

A method to improve vibration isolation in semiconductor process level inhibits vibration frequencies transmitted though building structure from production tools, pumps, compressors, chillers, AHUs (Air Handling Units), and footfalls traffic on raised floor system on to tool pedestals and pads from affecting semiconductor fabrication processes. The tool pedestal/pad for modern semiconductor FABs are required have very small tolerance to ambient vibration. Therefore, reduction and isolation of vibration of tool pedestal/pad is the key requirement for safe, reliable and uninterrupted operation of modern semiconductor FABs. Sound proofing material and foam is injected into hollow steel and/or aluminum support members and sound proofing adhesives and/or caulking are applied at points of connections in conjunction with mechanical fastening. In various applications, placement of shaped wielded rod utilized for dissipating vibration energy in center of hollow member which is surrounded with sound proofing material and/or foam.