A spiral compressor may include a stationary first spiral member and an orbiting second spiral member intermeshing with the first spiral member. The spiral compressor may include a pendulum slide mechanism that may have an inner ring and a stationary outer ring connected to the inner ring via a plurality of pendulums. The pendulum slide mechanism may include an eccentric member disposed on a radial inside of the inner ring with respect to a central access of the inner ring. The inner ring on an inner circumferential side may be drivingly connected to the eccentric member and on an outer circumferential side may be rigidly connected to the second spiral member. The second spiral member may transmit an orbiting motion in relation to the first spiral member via the pendulum slide mechanism when the eccentric member is driven.

Apparatus, e.g., including a pump or rotary device, having a discharge casing and a discharge casing insert. The discharge casing may be configured with a discharge flow pathway for providing a flow of effluent being pumped and discharged, the discharge flow pathway having a discharge flow pathway wall, the discharge casing also configured with a discharge casing insert borehole that passes from an outer surface of the discharge casing through the discharge flow pathway wall. The discharge casing insert may include a discharge casing Venturi plug portion to be received in the discharge casing insert borehole and arranged in the discharge flow pathway, the discharge casing Venturi plug portion configured with a restricted discharge flow pathway for providing a partial obstruction in the discharge flow pathway and the flow of the effluent being pumped and discharged.

A pumping installation includes at least one first positive-displacement machine and one second positive-displacement machine, as well as a control module, in which installation a gas is evacuated from an enclosed volume by means of the first positive-displacement machine and/or the second positive-displacement machine. The pumping installation includes at least one control valve controlled by the control module and a pressure sensor for sensing the value of the pressure at the outlet of the first positive-displacement machine and/or a temperature sensor for sensing the value of the temperature at the outlet of the first positive-displacement machine in order to control the flow of gas between the enclosed volume and the outlet of the pumping installation.

A pumping system is provided, including a rough-vacuum pump; a Roots vacuum pump including a pumping stage having a stator inside which two Roots rotors are configured to rotate synchronously in opposite directions to drive a gas to be pumped between an inlet orifice and an outlet orifice; and a pipeline connecting the outlet orifice to an intake of the rough-vacuum pump, a shortest distance between an edge of the outlet orifice and each of the Roots rotors in the pumping stage being less than 3 cm, and the outlet orifice being situated at the end of an upstream tube of the pipeline that passes into the pumping stage.

A vacuum pumping system includes a plurality of positive displacement vacuum pumps, and more particularly a plurality of positive displacement vacuum pumps working in parallel. The vacuum pumping system includes a management unit that carries out a synchronized control of all the positive displacement vacuum pumps of the vacuum pumping system and thus allows to check possible risk of contamination of the vacuum pumping system and carry out, if needed, the necessary corrective actions without requiring any modification to the construction of the vacuum pumping system.

A gas compressor is disclosed that includes a first rotor having a first rotor body, the first rotor body including a plurality of helical lobes, an infernal volume within the first rotor body defined by a wall, and a turbine disposed within the internal volume, the turbine including a turbine body and a plurality of airfoils extending substantially radially from the turbine body to the wall, where the internal volume is structured to enable a cooling fluid to flow therethrough. The gas compressor further includes a second rotor body including a plurality of helical flutes, an inlet manifold and an outlet manifold, both disposed within the second rotor body, and a body channel within at least one flute extending from and in fluid communication with the inlet manifold to the outlet manifold, where the body channel is structured to enable a cooling fluid to flow therethrough.

Disclosed is a pump system for a semiconductor chamber includes a housing having a front chamber and a rear chamber, a roots-type rotor provided to the front chamber of the housing, a screw-type rotor provided to the rear chamber, a shaft member coupled through the roots-type rotor and the screw-type rotor, and a driving motor provided to the outside of the housing in such a way as to be axially connected to the shaft member to provide power for driving the rotors. A fluid pipe is provided to the outside of the housing to connect the front chamber and the rear chamber. The fluid pipe is provided with a heater and/or a cooler to heat or cool the fluid flowing through the fluid pipe.

A dry pump for gases comprises a first rotor (1) comprising a first lobe portion (1A) and a first screw (16), as well as a second rotor (2) comprising a second lobe portion (2A) and a second screw (2B). A casing delimits an internal volume in which are located together the first and second screws (1B, 2B) and the first and second lobe portions (1A, 2A). Each of the first and second screws (1B, 2B) comprises a threading invariable along its length. The first and second rotors (1, 2) turn in opposite directions and are located in successive configurations. In a first configuration of the rotors, the first and second lobe portions (1A, 2A), a portion of the first screw (16), a portion of the second screw (2B) and the casing together delimit a chamber (30) which is closed. In a second configuration of the rotors, the chamber (30) has a smaller capacity than in the first configuration. In a third configuration of the rotors, the chamber (30) is displaced entirely at the first and second screws (1B, 2B) and isolated from the lobe portions.

A vacuum pumping arrangement comprises a first pump which has a first inlet and a first outlet. The first inlet is fluidly connected to a first common pumping line. The first common pumping line includes a plurality of first pumping line inlets each of which is fluidly connectable to a least one process chamber within a group of process chambers that form a semiconductor fabrication tool. The vacuum pumping arrangement also includes a reserve pump which has a reserve inlet and a reserve outlet. The reserve inlet is selectively fluidly connectable to each process chamber within the group of process chambers that form the semiconductor fabrication tool. The vacuum pumping arrangement additionally includes a controller which is configured to selectively fluidly isolate the pump from one or more given process chambers and selectively fluidly connect the reserve pump with the said one or more given process chambers.

A method for evacuating a chamber employs a pump arrangement composed of a booster pump and of a downstream forepump is connected to the chamber. The booster pump is accelerated, gas from the chamber is introduced into the booster pump, such that from the booster pump there is temporarily extracted an excess power which exceeds the power provided by the drive of the booster pump. The gas is discharged through a bypass valve while the outlet pressure of the booster pump lies above a predefined threshold value, and the gas is directed to the forepump when the outlet pressure of the booster pump has fallen below the threshold value. The gas supplied by the booster pump is compressed by means of the forepump.