Disclosed are implementations for minimizing substrate contamination during pressure changes in substrate processing systems. Over a duration of a pressure change (increase or decrease) in a chamber of a substrate processing system, a flow rate is adjusted multiple times to reduce occurrence of contaminant particles in an environment of the chamber. In some instances, the flow rate is changed continuously using at least one dynamic valve that enable continuous control over the pressure dynamics of the chamber.

Disclosed are implementations for minimizing substrate contamination during pressure changes in substrate processing systems. Over a duration of a pressure change (increase or decrease) in a chamber of a substrate processing system, a flow rate is adjusted multiple times to reduce occurrence of contaminant particles in an environment of the chamber. In some instances, the flow rate is changed continuously using at least one dynamic valve that enable continuous control over the pressure dynamics of the chamber.

An adjustment device designed to adjust a flow rate of a fluid flowing in a duct, including a body in which an adjustment valve is mounted, movable in rotation about an adjustment axis, the body having an area upstream of the adjustment axis and a downstream area opposite to the upstream area with respect to the adjustment axis, where the adjustment axis is equipped with connecting means which cooperate with at least one first control member positioned in the downstream area and a second control member positioned in the upstream area.

An adjustment device designed to adjust a flow rate of a fluid flowing in a duct, including a body in which an adjustment valve is mounted, movable in rotation about an adjustment axis, the body having an area upstream of the adjustment axis and a downstream area opposite to the upstream area with respect to the adjustment axis, where the adjustment axis is equipped with connecting means which cooperate with at least one first control member positioned in the downstream area and a second control member positioned in the upstream area.

One aspect is directed to a system for controlling airflow in a facility having a ceiling-ducted aisle airflow containment system having a first damper system for controlling airflow. The system includes an input to receive parameters related to airflow in the facility, wherein the parameters include at least one airflow resistance value for a device in the facility, an output to provide output data including at least one setting for one or more controllable devices in the facility, and one or more processors configured to receive the parameters related to airflow, determine airflow values associated with the airflow containment system and based on the airflow values, generate the at least one setting for the one or more controllable devices, including at least one setting for the first damper system.

An air-conditioning apparatus having a refrigerant circuit, in which a compressor, an outdoor heat exchanger, an expansion device, and an indoor heat exchanger are connected by a pipe and refrigerant circulates in the pipe, includes an indoor fan configured to supply an indoor air to the indoor heat exchanger, and a controller configured to control the compressor and the indoor fan. The controller is configured to run the compressor at a start of a cooling operation, start running the indoor fan at less than a set minimum wind velocity after a first set time has elapsed since the compressor started operating, run the indoor fan at the set minimum wind velocity after a second set time has elapsed since the indoor fan started operating at less than the set minimum wind velocity, and run the indoor fan at a set wind velocity after a third set time has elapsed since the indoor fan started operating at the set minimum wind velocity.

An air-conditioning apparatus having a refrigerant circuit, in which a compressor, an outdoor heat exchanger, an expansion device, and an indoor heat exchanger are connected by a pipe and refrigerant circulates in the pipe, includes an indoor fan configured to supply an indoor air to the indoor heat exchanger, and a controller configured to control the compressor and the indoor fan. The controller is configured to run the compressor at a start of a cooling operation, start running the indoor fan at less than a set minimum wind velocity after a first set time has elapsed since the compressor started operating, run the indoor fan at the set minimum wind velocity after a second set time has elapsed since the indoor fan started operating at less than the set minimum wind velocity, and run the indoor fan at a set wind velocity after a third set time has elapsed since the indoor fan started operating at the set minimum wind velocity.

There is presented a heating, ventilation and air conditioning (HVAC) system for conditioning air within a chamber, the system comprising: an inlet, an outlet, and a conditioning unit, the conditioning unit comprising a fan, and a heat exchanger configured to exchange heat with the air within the conditioning unit, wherein during operation, air is urged through conditioning unit by the fan such that heat is exchanged between the air and the heat exchanger, wherein the fan is configured to vary the flow rate of air urged through the conditioning unit to thereby control the amount of heat transferred between the air and the heat exchanger.

There is presented a heating, ventilation and air conditioning (HVAC) system for conditioning air within a chamber, the system comprising: an inlet, an outlet, and a conditioning unit, the conditioning unit comprising a fan, and a heat exchanger configured to exchange heat with the air within the conditioning unit, wherein during operation, air is urged through conditioning unit by the fan such that heat is exchanged between the air and the heat exchanger, wherein the fan is configured to vary the flow rate of air urged through the conditioning unit to thereby control the amount of heat transferred between the air and the heat exchanger.

A ventilation system is provided, the ventilation system comprising at least one air flow generating device, the at least one air flow generating device having a calibrated speed to produce a downward air flow capable of forcing a cloud of infectious bacterial, viral or pathogen particles or droplets out of an ingestion zone of a mouth, a nose and eyes of an individual, at least one ultraviolet C light lamp positioned proximate at least one wall of an area in a pathway of an infected air flow, the infected air flow containing the cloud of infectious bacterial, viral or pathogen particles or droplets, an ultraviolet C radiation field created by the at least one ultraviolet C light lamp, the ultraviolet C radiation field extending throughout the area from the at least one wall near a ceiling of the area and the infected air flow containing the cloud of infectious bacterial, viral or pathogen particles or droplets passing through the ultraviolet C radiation field, wherein the at least one air flow generating device is positioned to enable an upward air flow return to the at least one air flow generating device to force the infected air flow and the cloud of infectious bacterial, viral or pathogen particles or droplets out of an area and through the ultraviolet C radiation field to eradicate the infectious bacteria, virus and pathogens from the infected air flow, and wherein a fresh air flow free of infectious bacteria, viruses and pathogens is reintroduced back into the area by the downward air flow of the at least one air flow generating device.