A machine for processing textile substrates includes a base configured to receive a substrate support carrying a textile substrate, and may further include a nozzle assembly supported above the base for applying pretreatment liquid to a pretreatment area of the substrate during relative movement between the nozzle assembly and the substrate support along a conveying direction. A forced air assembly is supported above the base for movement transverse to the conveying direction. A controller that controls the relative movement between the substrate support and the nozzle assembly along the conveying direction, or the movement of the forced air assembly along the second axis based on information related to a pretreatment area or a print area of the textile substrate in order to direct heated air from the forced air assembly onto an area of the textile substrate substantially corresponding to the pretreatment area or the print area.

Example aspects of a drying rack, a rotatable drying rack, and a method of drying wet objects are disclosed. The drying rack can comprise a base and a plurality of mounting post assemblies mounted to the base, each of the mounting post assemblies comprising at least one mounting post. The mounting post assemblies can comprise inner post assembly comprising an inner post and an outer post assembly comprising a primary outer post and a secondary outer post, wherein each of the inner post, primary outer post, and secondary outer post are configured to support an object above the base.

Example aspects of a drying rack, a rotatable drying rack, and a method of drying wet objects are disclosed. The drying rack can comprise a base and a plurality of mounting post assemblies mounted to the base, each of the mounting post assemblies comprising at least one mounting post. The mounting post assemblies can comprise inner post assembly comprising an inner post and an outer post assembly comprising a primary outer post and a secondary outer post, wherein each of the inner post, primary outer post, and secondary outer post are configured to support an object above the base.

Proposed is an equipment for reducing specific air pollutants generated from heated asphalt concrete with proportional control, which includes: a dryer for heating and drying aggregates and for burning harmful gases introduced through nozzles mounted thereon; a first dust remover for removing dust from the harmful gases emitted from the dryer; a fine dust remover for filtering fine dust from the remaining gases and dust; a bypass damper for returning some of the gases and dust emitted from the first dust remover to a second dust remover; the second dust remover for filtering the dust in the gases and dust emitted from the first dust remover; and a blower for feeding the gases exhausted from the second dust remover to the dryer, wherein clean gas exhausted from the fine dust remover is emitted to the air through an exhaust fan and a stack.

The present invention relates to a desiccation apparatus, the apparatus comprising: a hollow drum mounted for revolution about a substantially longitudinal axis, the drum comprising a shell having an interior surface and an exterior surface; and a means to generate airflow through the hollow drum.

A tumbler may be used as defluidizer, dryer, coater, classifier, or dynamic filter. The tumbler includes a housing for rotatably supporting a removable screened drum on a plurality of rollers. The drum receives a solid/fluid slurry through an inlet chute. As the slurry travels through the drum, fluid exits the drum through a plurality of apertures in screens attached to the sides of the drum, while the solids continue along the drum's length until they reach one or more openings and exit the drum into an outlet chute. The outlet chute includes ridges that wrap around rings extending from the openings of the drum to prevent solids from escaping the outlet chute. To further dry the solids before they exit the drum, an air tube disposed within the drum is configured to direct air through the screens to an air blower intake positioned outside of the drum.

Example aspects of a drying rack, a rotatable drying rack, and a method of drying wet objects are disclosed. The drying rack can comprise a base and a plurality of mounting post assemblies mounted to the base, each of the mounting post assemblies comprising at least one mounting post. The mounting post assemblies can comprise inner post assembly comprising an inner post and an outer post assembly comprising a primary outer post and a secondary outer post, wherein each of the inner post, primary outer post, and secondary outer post are configured to support an object above the base

Example aspects of a drying rack, a rotatable drying rack, and a method of drying wet objects are disclosed. The drying rack can comprise a base and a plurality of mounting post assemblies mounted to the base, each of the mounting post assemblies comprising at least one mounting post. The mounting post assemblies can comprise inner post assembly comprising an inner post and an outer post assembly comprising a primary outer post and a secondary outer post, wherein each of the inner post, primary outer post, and secondary outer post are configured to support an object above the base

Proposed is an equipment for reducing specific air pollutants generated from heated asphalt concrete with proportional control, which includes: a dryer for heating and drying aggregates and for burning harmful gases introduced through nozzles mounted thereon; a first dust remover for removing dust from the harmful gases emitted from the dryer; a fine dust remover for filtering fine dust from the remaining gases and dust; a bypass damper for returning some of the gases and dust emitted from the first dust remover to a second dust remover; the second dust remover for filtering the dust in the gases and dust emitted from the first dust remover; and a blower for feeding the gases exhausted from the second dust remover to the dryer, wherein clean gas exhausted from the fine dust remover is emitted to the air through an exhaust fan and a stack.

A spin rinse dryer for treating a substrate has an enclosure, a rotatable support for supporting the substrate, a rotatable member located within the enclosure above the rotatable support, and a drive for rotating the rotatable member. During cleaning of the wafer, liquid that splashes up from the wafer will strike the rotatable member, rather than the upper wall of the enclosure, and may form droplets on the rotatable member. After the flow of cleaning liquid has stopped, the drive can rotate the rotatable member at high speed, which tends to throw the liquid droplets off the rotatable member through centrifugal force. The liquid then runs down the walls of the enclosure, away from the wafer, so that there is a much reduced chance of contamination of the cleaned wafer. The rotatable member and support may be integrally formed and rotated together or may be separate members.