A substrate processing apparatus 1 includes a controller 61 configured to perform a first recipe and a second recipe in parallel. Each of the first recipe and the second recipe includes a first transfer processing of transferring a substrate from a transit unit 14 to a liquid processing unit 17, a liquid processing, a second transfer processing of transferring the substrate from the liquid processing unit 17 to a drying unit 18 and a drying processing. The controller 61 determines, while the first recipe on a first substrate in substrates is being performed, when the second recipe on a second substrate in the substrates is started, a start timing of the first transfer processing of the second substrate such that a time period of the second transfer processing of the first substrate does not overlap with a time period of the second transfer processing of the second substrate.

To provide a solid-liquid separation system in which a stable operation can be continuously conducted and the introduction cost and the running cost can be suppressed, in cases where moisture or oil are separated from a substance containing moisture or oil by using changes in phase of a working fluid having a nature of dissolving moisture or oil in a liquid phase. Provided is a solid-liquid separation system in which a working fluid that dissolves moisture or oil in a liquid phase is liquefied and brought into contact with a solid substance to thereby allow the working fluid to contain moisture or oil that has been contained in the solid substance, and then the working fluid is vaporized to precipitate the moisture or oil, characterized in that the solid-liquid separation system is provided with a fluid circuit in which a high-temperature-side heat exchanger that vaporizes the working fluid by a refrigerant, a low-temperature-side heat exchanger that liquefies the working fluid by the refrigerant are connected to circulate the working fluid, and a refrigerating cycle in which a compressor, a condenser that exchanges heat with a heat source other than the working fluid, the high-temperature-side heat exchanger, an expansion mechanism, and the low-temperature-side heat exchanger are sequentially connected to circulate the refrigerant, and that the solid-liquid separation system includes a recovery operation mode in which the working fluid in a filling tank is vaporized, besides the solid-liquid separation. For performing the recovery operation mode, a second expansion mechanism is provided between the condenser and the high-temperature-side heat exchanger. The system is also characterized in that the fluid circuit is provided with a heating unit that does not use the refrigerant as a heat source.

A polymeric composition for enhancing grip, including a modified solvent phase and a solid phase dispersed within the modified solvent phase. The modified solvent phase may include calcium-based gel, including calcium acetate particles partially dissolved in an alcoholic solution. The solid phase also includes a polymeric matrix and a plurality of desiccant particles encompassed by the polymeric matrix. The polymeric matrix includes polyvinyl acetate (PVAc) and a thickener.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber providing an inner space; a fluid supply unit configured to supply a drying fluid to the inner space; and a fluid exhaust unit configured to exhaust the drying fluid from the inner space, and wherein the fluid exhaust unit includes an exhaust line connected to the chamber; a pressure adjusting member installed at the exhaust line and configured to maintain a pressure of the inner space at a set pressure; and a heating member installed at the pressure adjusting member or a back end of the pressure adjusting member.

Devices and methods related to drying absorbent articles with water reactive materials are generally described.

The present invention provides a substrate treating apparatus, including: a housing including a first body and a second body which are combined with each other to provide a treatment space in which a substrate is treated; an actuator which moves the second body in a vertical direction with respect to the first body to seal or open the treatment space; and a pipe which is coupled with the second body and in which a fluid flows, in which the pipe is a stretchable pipe that is stretchable and contractible according to the vertical movement of the second body.

There is provided a method of cleaning a substrate processing apparatus in which a drying process of drying a substrate whose surface is wet with a liquid is performed by bring the substrate into contact with a supercritical fluid, the method including: diffusing a first cleaning fluid in an interior of the substrate processing apparatus, the first cleaning fluid being obtained by mixing the supercritical fluid with a solvent containing polar molecules and having a lower boiling point than a boiling point of the liquid; and discharging the first cleaning fluid from the interior of the substrate processing apparatus, that occurs after the diffusing the first cleaning fluid.

The present invention provides a substrate treating apparatus. The substrate treating apparatus includes: a liquid treatment chamber configured to treat a substrate with a liquid; a drying chamber configured to dry the liquid-treated substrate; a transfer robot configured to transfer the substrate between the liquid treatment chamber and the drying chamber, and including a hand which is movable along an X-axis, a Y-axis, and a Z-axis and is rotatably driven based on the Z-axis, and on which the substrate is placed; an optical system configured to photograph a form of a liquid film of the substrate, in which when the substrate is transferred from the liquid treatment chamber to the drying chamber, the substrate is wetted with a chemical liquid and is transferred by the transfer robot in a state of being formed with a liquid film formed; and a controller configured to measure the form of the liquid film photographed by the optical system.

A method for drying polyolefin-containing particles includes a drying step of supplying polyolefin-containing particles to a drying container, supplying a drying gas to the drying container, and drying the polyolefin-containing particles in the drying container. In the drying step, a numerical value determined by the following formula (a) is 441 or more and 600 or less.

38.0×[η]CXIS [dL/g]−0.500×CXIS content [% by mass]+1.20×particle temperature during drying [K]+3.29×drying time [hr]  Formula (a):

A fluid supply device configured to supply a processing fluid to a wafer processing device that includes a chamber is provided. The fluid supply device includes a reservoir configured to change the processing fluid into a supercritical fluid state; a wafer protecting device comprising a body configured to prevent a wafer in the chamber of the wafer processing device from being damaged by the processing fluid in the supercritical fluid state by receiving the processing fluid in the supercritical fluid state and limiting a speed of the processing fluid; and a fluid supply line configured to provide a path for the processing fluid between the reservoir and the wafer protecting device and a path for the processing fluid between the wafer protecting device and the wafer processing device.