The invention relates to a drying method for polyglycollide warp-knitted support meshes for artificial skin, specifically comprising: pre-drying, deep drying, and fabric stress relaxation, which are performed sequentially. The drying method can completely remove water in polyglycollide warp-knitted support meshes as well as solvents left during the cleaning process, and can effectively maintain the properties such as tensile strength, pore size, and weight of the polyglycollide warp-knitted support meshes, thus being of great significance for the application of the polyglycollide warp-knitted support meshes in the field of medical artificial skin.

Disclosed is a substrate support structure, a vacuum drying apparatus and a method for vacuum drying a substrate. The substrate support structure comprises: a support pin having a top end for supporting a substrate; and an auxiliary support assembly including: a drive device; a support rod driven by the drive device; and a support disc disposed at a top end of the support rod and made of flexible material adapted to support the substrate, wherein the drive device is configured to drive the support rod to move in a direction parallel to an axial direction of the support pin so as to make the support disc positioned below or above the top end of the support pin as the support rod moves, so that the substrate is selectively supported by the support disc or the support pin. The substrate support structure, the vacuum drying apparatus and the method for vacuum drying a substrate can prevent the substrate from being easily scratched and avoid poor quality and uneven brightness of the substrate.

A vacuum drying system includes: a support platform, which is used to support the substrate, wherein the support platform comprises a plurality of sub-platforms which are arranged along a predetermined direction and there are gaps between the adjacent sub-platforms; a mechanical arm which comprises a plurality of strip structures at positions corresponding to the gaps, and is used to place the substrate onto the support platform or move the substrate out of the support platform. Comparing to the prior art wherein the substrate is supported by a plurality of needle-shaped supports in the vacuum drying process, in the technical solution of the present disclosure, the contact area between the support platform and the substrate is much larger, which can reduce the local pressure on the substrate, thereby avoiding the display brightness mura of the substrate caused by the supporting operation in the vacuum drying process.

A vacuum dryer including a chamber configured to provide an interior space, support pins in the interior space proximate to a bottom of the chamber, a power supply configured to supply power to the support pins, and a pump coupled to the interior space in the chamber.

A technique comprising: producing an unencapsulated stack of layers defining one or more electronic devices including an organic semiconductor element; and then subjecting the unencapsulated stack of layers to a water removal treatment in a vacuum oven in the presence of an external water adsorbent; wherein the water removal treatment comprises heating the unencapsulated stack of layers in the vacuum oven for a time period longer than a control time period at which a spike in oven pressure attributable to the release of water from the stack of layers would occur with heating under the same treatment conditions but without the water absorbing material.

A vacuum dryer including a chamber configured to provide an interior space, support pins in the interior space proximate to a bottom of the chamber, a power supply configured to supply power to the support pins, and a pump coupled to the interior space in the chamber.

A vacuum drying system includes: a support platform, which is used to support the substrate, wherein the support platform comprises a plurality of sub-platforms which are arranged along a predetermined direction and there are gaps between the adjacent sub-platforms; a mechanical arm which comprises a plurality of strip structures at positions corresponding to the gaps, and is used to place the substrate onto the support platform or move the substrate out of the support platform. Comparing to the prior art wherein the substrate is supported by a plurality of needle-shaped supports in the vacuum drying process, in the technical solution of the present disclosure, the contact area between the support platform and the substrate is much larger, which can reduce the local pressure on the substrate, thereby avoiding the display brightness mura of the substrate caused by the supporting operation in the vacuum drying process.

A technique comprising: producing an unencapsulated stack of layers (10) defining one or more electronic devices including an organic semiconductor element; and then subjecting the unencapsulated stack of layers to a water removal treatment in a vacuum oven (12) in the presence of an external water adsorbent (14); wherein the water removal treatment comprises heating the unencapsulated stack of layers in the vacuum oven for a time period longer than a control time period at which a spike in oven pressure attributable to the release of water from the stack of layers would occur with heating under the same treatment conditions but without the water absorbing material.

A cleaning device for cleaning a connecting aluminum plate for automobile battery integration and cleaning process thereof, the cleaning device is disposed in a dust-free workshop, which comprises a transfer mechanism which successively transfers the connecting aluminum plate to different workshops; the workshops successively comprise three cleaning workshops, five rinsing workshops, a preheating workshop, a vacuum drying workshop, a baking and sterilizing workshop and an inspection and packaging workshop. The present invention can clean connecting aluminum plate in a pipelined manner and consume less energy, and by which the dyne level of the surface tension of the cleaned products can accord with the packaging requirement.

The invention relates to a drying method for polyglycollide warp-knitted support meshes for artificial skin, specifically comprising: pre-drying, deep drying, and fabric stress relaxation, which are performed sequentially. The drying method can completely remove water in polyglycollide warp-knitted support meshes as well as solvents left during the cleaning process, and can effectively maintain the properties such as tensile strength, pore size, and weight of the polyglycollide warp-knitted support meshes, thus being of great significance for the application of the polyglycollide warp-knitted support meshes in the field of medical artificial skin.