Patent classifications
F27B17/0083
Space oven
A space oven operates in microgravity environments by forcing convection towards the center through a unique heating element and airflow design. The space oven includes a tubular chamber, a heating rack, a heating system, a cooling system, a hatch, a user interface, a microcontroller, an enclosure, at least one first vent, at least one second vent and at least one temperature sensor. The tubular chamber is the cooking area. The heating rack holds consumables in place. The heating system heats up consumables. The cooling system prevents any overheating. The hatch closes off and allows access to the inside of the tubular chamber. The user interface allows a user to input commands. The microcontroller manages the electronic components. The enclosure protects the tubular chamber. The at least one first vent and the at least one second vent reduce pressure buildup. The at least one temperature sensor monitors the internal temperature.
SHUTTLE KILN WITH ENHANCED RADIANT HEAT RETENTION
A shuttle kiln according to certain aspects includes at least one flue channel and multiple flue risers in fluid communication with the flue channel, and at least one shuttle defining multiple exhaust shafts arranged above the multiple flue risers, wherein at least one radiation blockers is arranged above outlet ports of the at least one shuttle. Such a configuration blocks line-of-sight radiant heat transfer between (i) heated surfaces above the shuttle within the kiln housing and (ii) outlet ports of the exhaust shafts, thereby enhancing radiant heat retention and reducing temperature variability within a kiln cavity of the shuttle kiln.
Modular industrial energy transfer system
A modular industrial energy transfer system includes a shell and at least one energy transfer unit coupled to the shell. The shell includes a plurality of sidewalls, a ceiling member coupled thereto, and a plurality of mounting structures disposed along the shell. The plurality of sidewalls and the ceiling member cooperate to define an interior volume to accommodate a work product. The at least one energy transfer unit is coupled to the shell via at least one of the plurality of mounting structures and is partially disposed through the shell to generate an airflow pattern through the interior volume of the shell.
DIFFUSION FURNACE
The present application discloses a diffusion furnace, including: a furnace tube structure including a furnace tube body and a furnace bottom, a bottom of the furnace tube body being connected to the furnace bottom to form a reaction chamber; and a carrying structure including a pedestal and a plurality of cassettes disposed on the pedestal, the pedestal being disposed on the furnace bottom. By disposing the plurality of the cassettes, a height of the furnace tube body can be decreased and a width of the furnace tube body can be increased, thus enlarging a space of equipment repair and maintenance, which is favorable for the repair and maintenance of the equipment.
Convection furnace
The present invention relates to a furnace device for heating a plate, in particular a metal plate, by convection. The furnace device has a housing, in which a temperature control region for temperature-controlling a component part and an adjustment region are formed, wherein the adjustment region has a temperature control device for adjusting a temperature of a temperature control fluid. Further, the furnace device has a positioning device for positioning the plate in the temperature control region in a predetermined orientation, and a ventilator, which is arranged in the housing and which is adapted to circulate the temperature control fluid in the housing between the temperature control region and the adjustment region such that the temperature control fluid is flowable in a flow direction along a surface of the plate.
High-pressure tank producing apparatus
A high-pressure tank producing apparatus capable of reducing time for increasing temperature of a tank body. The apparatus that heats the tank body with fibers impregnated with a thermosetting resin wound around its surface includes a heating chamber for housing the tank body and a retaining mechanism for retaining the tank body within the heating chamber, in which the heating chamber has an injection port for injecting heated gas onto the surface of the tank body and an exhaust port for discharging the gas to the outside of the heating chamber, the exhaust port being disposed in a position where the injection port is projected in a gas injecting direction, and the retaining mechanism retains the tank body in a region where the injection and exhaust ports overlap with each other as viewed from the gas injecting direction and in a position between the injection and exhaust ports.
High Pressure Furnace and Methods of Use
A furnace system including an outer shell which comprises a top flange, an elongated body portion, and a bottom flange, wherein the outer shell is a pressure vessel, with no penetrations in the elongated body portion; a heater assembly which comprises (i) a single-piece annular shaped insulation layer, and (ii) a plurality of heaters embedded in the insulation layer, wherein the heater assembly is disposed within the elongated body portion of the outer shell; and an innermost layer disposed within the annular-shaped insulation layer, wherein the innermost layer is a baffle tube configured to force a natural convective flow, wherein each of the plurality of heaters is individually controllable and the plurality of heaters are configured to heat different zones within the furnace to different temperatures and/or at different rates. The system may be used to heat treat magnet materials, such as those formed of Bi-2212, therein.
HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD
A heat treatment apparatus includes a heating unit, a chamber, an exhaust unit, a partition unit and a switching unit. The heating unit supports and heats a substrate on which a film of a processing liquid is formed. The chamber surrounds the substrate supported by the heating unit. The exhaust unit is configured to discharge a gas from an inner space of the chamber through a discharge opening located near the heating unit. The partition unit is configured to partition the inner space of the chamber into a first space where the substrate on the heating unit is exposed and a second space located above the first space. The switching unit is configured to switch between a first state where the gas is discharged by the exhaust unit through the first space and a second state where the gas is discharged by the exhaust unit through the second space.
Modular Industrial Energy Transfer System
A modular industrial energy transfer system includes a shell and at least one energy transfer unit coupled to the shell. The shell includes a plurality of sidewalls, a ceiling member coupled thereto, and a plurality of mounting structures disposed along the shell. The plurality of sidewalls and the ceiling member cooperate to define an interior volume to accommodate a work product. The at least one energy transfer unit is coupled to the shell via at least one of the plurality of mounting structures and is partially disposed through the shell to generate an airflow pattern through the interior volume of the shell.
Substrate processing apparatus, substrate processing method, and storage medium
A substrate processing apparatus includes: a heat processing unit configured to perform a heat process on a substrate having a film formed on the substrate; and a control unit configured to control the heat processing unit, wherein the heat processing unit comprises: a heater configured to support and heat the substrate; a chamber configured to cover the substrate supported on the heater; a gas ejector having a head in which ejection holes are formed, and configured to eject a gas from the ejection holes toward a surface of the substrate; an outer peripheral exhauster configured to evacuate a processing space inside the chamber from an outer peripheral region located further outward than a peripheral edge of the substrate supported on the heater; and a central exhauster configured to evacuate the processing space from a central region located further inward than the peripheral edge of the substrate supported on the heater.